OLD - PECVD2 Recipes

PECVD 2 (Advanced Vacuum)

Photos

• Dirty platen

SiN deposition (PECVD #2)

• Nitride2 Standard Recipe
• Nitride2 Data 2014
• Nitride2 Thickness uniformity 2014

SiO₂ deposition (PECVD #2)

• Oxide Standard Recipe
• Oxide Data 2014
• Oxide Thickness uniformity 2014

LS SiN deposition (PECVD #2)

• LS Nitride2 Standard Recipe
• LS Nitride2 Data December 2014
• LS Nitride2 Thickness uniformity 2014

• Deposition Rate: ≈ 7.87 nm/min (users must calibrate this prior to critical deps)
• Refractive Index: ≈ 1.938
• Stress ≈ 1.76MPa
• HF etch rate~47nm/min

Amorphous-Si deposition (PECVD #2)

• Amorphous Si Deposition Recipe