Molecular Vapor Deposition

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Molecular Vapor Deposition
MVD.jpg
Tool Type Vacuum Deposition
Location Bay 4
Supervisor Aidan Hopkins
Supervisor Phone (805) 893-2343
Supervisor E-Mail hopkins@ece.ucsb.edu
Description Molecular Vapor Deposition System
Manufacturer Plasma-Therm
Materials Applied Microstructures Inc.
Vacuum Deposition Recipes


About

The Molecular Vapor deposition system is used for deposition of a monolayer-thick fluorocarbon film for producing extremely hydrophobic surfaces used for anti-sticking layers for nanoimprinting or anti-stiction layers for MEMS. The system has integrated Oxygen plasma cleaning for organic removal and surface activation and can be run at temperatures up to 80°C. Multi-step recipes can be created. The system is currently configured for FDTS (perflourodecyltricholorsilane) and water to producing the coatings. Up to 6” wafers can be coated in the system.

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