Difference between revisions of "Molecular Vapor Deposition"
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|description = Molecular Vapor Deposition System |
|description = Molecular Vapor Deposition System |
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+ | |manufacturer = [http://www.appliedmst.com/ Applied Microstructures Inc.] |
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| − | |materials = [http://www.appliedmst.com/ Applied Microstructures Inc.] |
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= About = |
= About = |
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Revision as of 08:20, 10 July 2012
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About
The Molecular Vapor deposition system is used for deposition of a monolayer-thick fluorocarbon film for producing extremely hydrophobic surfaces used for anti-sticking layers for nanoimprinting or anti-stiction layers for MEMS. The system has integrated Oxygen plasma cleaning for organic removal and surface activation and can be run at temperatures up to 80°C. Multi-step recipes can be created. The system is currently configured for FDTS (perflourodecyltricholorsilane) and water to producing the coatings. Up to 6” wafers can be coated in the system.