Molecular Vapor Deposition

Molecular Vapor Deposition Location Bay 4 Tool Type Vacuum Deposition Manufacturer Applied Microstructures Inc. Description Molecular Vapor Deposition System Primary Supervisor Lee Sawyer (805) 893-2123 lee_sawyer@ucsb.edu Secondary Supervisor Aidan Hopkins Recipes Vacuum Deposition RecipesN/A

About

The Molecular Vapor deposition system is used for deposition of a monolayer-thick fluorocarbon film for producing extremely hydrophobic surfaces used for anti-sticking layers for nanoimprinting or anti-stiction layers for MEMS. The system has integrated Oxygen plasma cleaning for organic removal and surface activation and can be run at temperatures up to 80°C. Multi-step recipes can be created. The system is currently configured for FDTS (perflourodecyltricholorsilane) and water to producing the coatings. Up to 6” wafers can be coated in the system.

Recipes

• Nanoimprinting recipes using FDTS non-stick layer
• MVD Standard Recipes

Documentation

• MVD Standard Operating Procedure
• Wafer Coating - Process Traveler