Difference between revisions of "Molecular Vapor Deposition"

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*[https://wiki.nanotech.ucsb.edu/wiki/index.php?title=Lithography_Recipes#Nanoimprinting_Recipes Nanoimprinting recipes] using FDTS non-stick layer
*[https://wiki.nanotech.ucsb.edu/w/index.php?title=Lithography_Recipes#Nanoimprinting_Recipes Nanoimprinting recipes] using FDTS non-stick layer
*[https://signupmonkey.ece.ucsb.edu/wiki/images/3/3c/MVD_Standard_Recipes.pdf MVD Standard Recipes]
*[https://signupmonkey.ece.ucsb.edu/wiki/images/3/3c/MVD_Standard_Recipes.pdf MVD Standard Recipes]

Latest revision as of 12:52, 4 September 2021

Molecular Vapor Deposition
Tool Type Vacuum Deposition
Location Bay 4
Supervisor Lee Sawyer
Supervisor Phone (805) 893-2123
Supervisor E-Mail lee_sawyer@ucsb.edu
Description Molecular Vapor Deposition System
Manufacturer Applied Microstructures Inc.
Vacuum Deposition Recipes


The Molecular Vapor deposition system is used for deposition of a monolayer-thick fluorocarbon film for producing extremely hydrophobic surfaces used for anti-sticking layers for nanoimprinting or anti-stiction layers for MEMS. The system has integrated Oxygen plasma cleaning for organic removal and surface activation and can be run at temperatures up to 80°C. Multi-step recipes can be created. The system is currently configured for FDTS (perflourodecyltricholorsilane) and water to producing the coatings. Up to 6” wafers can be coated in the system.