Difference between revisions of "Molecular Vapor Deposition"

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*[https://www.nanotech.ucsb.edu/wiki/index.php/Lithography_Recipes#Nanoimprinting_Recipes Nanoimprinting recipes] using FDTS non-stick layer
 
*[https://www.nanotech.ucsb.edu/wiki/index.php/Lithography_Recipes#Nanoimprinting_Recipes Nanoimprinting recipes] using FDTS non-stick layer
*MVD Standard Recipes
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*[https://signupmonkey.ece.ucsb.edu/wiki/images/3/3c/MVD_Standard_Recipes.pdf MVD Standard Recipes]
  
 
==Documentation==
 
==Documentation==
  
 
*[https://signupmonkey.ece.ucsb.edu/wiki/images/f/f4/MVD_SOP.pdf MVD Standard Operating Procedure]
 
*[https://signupmonkey.ece.ucsb.edu/wiki/images/f/f4/MVD_SOP.pdf MVD Standard Operating Procedure]

Revision as of 14:18, 11 September 2019

Molecular Vapor Deposition
MVD.jpg
Tool Type Vacuum Deposition
Location Bay 4
Supervisor Lee Sawyer
Supervisor Phone (805) 893-2123
Supervisor E-Mail lee_sawyer@ucsb.edu
Description Molecular Vapor Deposition System
Manufacturer Applied Microstructures Inc.
Vacuum Deposition Recipes


About

The Molecular Vapor deposition system is used for deposition of a monolayer-thick fluorocarbon film for producing extremely hydrophobic surfaces used for anti-sticking layers for nanoimprinting or anti-stiction layers for MEMS. The system has integrated Oxygen plasma cleaning for organic removal and surface activation and can be run at temperatures up to 80°C. Multi-step recipes can be created. The system is currently configured for FDTS (perflourodecyltricholorsilane) and water to producing the coatings. Up to 6” wafers can be coated in the system.

Recipes

Documentation