Difference between revisions of "Molecular Vapor Deposition"
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==Recipes== |
==Recipes== |
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+ | *[https://wiki.nanotech.ucsb.edu/w/index.php?title=Lithography_Recipes#Nanoimprinting_Recipes Nanoimprinting recipes] using FDTS non-stick layer |
*[https://signupmonkey.ece.ucsb.edu/wiki/images/3/3c/MVD_Standard_Recipes.pdf MVD Standard Recipes] |
*[https://signupmonkey.ece.ucsb.edu/wiki/images/3/3c/MVD_Standard_Recipes.pdf MVD Standard Recipes] |
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*[https://signupmonkey.ece.ucsb.edu/wiki/images/f/f4/MVD_SOP.pdf MVD Standard Operating Procedure] |
*[https://signupmonkey.ece.ucsb.edu/wiki/images/f/f4/MVD_SOP.pdf MVD Standard Operating Procedure] |
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| + | *[[MVD - Wafer Coating - Process Traveler|Wafer Coating - Process Traveler]] |
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Revision as of 12:52, 4 September 2021
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About
The Molecular Vapor deposition system is used for deposition of a monolayer-thick fluorocarbon film for producing extremely hydrophobic surfaces used for anti-sticking layers for nanoimprinting or anti-stiction layers for MEMS. The system has integrated Oxygen plasma cleaning for organic removal and surface activation and can be run at temperatures up to 80°C. Multi-step recipes can be created. The system is currently configured for FDTS (perflourodecyltricholorsilane) and water to producing the coatings. Up to 6” wafers can be coated in the system.
Recipes
- Nanoimprinting recipes using FDTS non-stick layer
- MVD Standard Recipes