Difference between revisions of "Mechanical Polisher (Allied)"
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|picture=AlliedPolisher10-1110.jpg |
|picture=AlliedPolisher10-1110.jpg |
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|type = Wet Processing |
|type = Wet Processing |
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| − | |super= |
+ | |super= Bill Millerski |
| − | |location=ESB |
+ | |location=ESB Rm. 1111 |
|description = Mechanical Polisher |
|description = Mechanical Polisher |
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|manufacturer = Allied High Tech Products Inc. |
|manufacturer = Allied High Tech Products Inc. |
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+ | =About= |
The Allied Polisher allows for bulk thinning of substrates, and fine polishing of optical waveguide facets. Various materials are typically lapped/polished, such as Silicon GaAs, InP. |
The Allied Polisher allows for bulk thinning of substrates, and fine polishing of optical waveguide facets. Various materials are typically lapped/polished, such as Silicon GaAs, InP. |
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| − | == |
+ | ==Detailed Specs== |
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| − | == Operating Procedures == |
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| − | == |
+ | ==Operating Procedures== |
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| − | * ''To Be Added'' |
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| + | *[https://wiki.nanotech.ucsb.edu/w/images/f/f2/Mechanical_Polisher_SOP_Rev_A.pdf Mechanical Polisher SOP] |
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| + | ==Recipes== |
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Latest revision as of 09:06, 15 May 2023
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About
The Allied Polisher allows for bulk thinning of substrates, and fine polishing of optical waveguide facets. Various materials are typically lapped/polished, such as Silicon GaAs, InP.
Detailed Specs
- Max. Substrate Size
- Lapping Films available:
- 10µm AlOx
- 5µm AlOx
- 2µm AlOx
- 1µm AlOx
- 0.5 AlOx
Operating Procedures
Recipes
- To Be Added