Difference between revisions of "Mechanical Polisher (Allied)"
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Millerski w (talk | contribs) (Added SOP Link) |
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− | {{ | + | {{tool2|{{PAGENAME}} |
|picture=AlliedPolisher10-1110.jpg | |picture=AlliedPolisher10-1110.jpg | ||
|type = Wet Processing | |type = Wet Processing | ||
− | |super= | + | |super= Bill Millerski |
− | |location=ESB | + | |location=ESB Rm. 1111 |
|description = Mechanical Polisher | |description = Mechanical Polisher | ||
|manufacturer = Allied High Tech Products Inc. | |manufacturer = Allied High Tech Products Inc. | ||
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|toolid=70 | |toolid=70 | ||
}} | }} | ||
− | = About | + | =About= |
The Allied Polisher allows for bulk thinning of substrates, and fine polishing of optical waveguide facets. Various materials are typically lapped/polished, such as Silicon GaAs, InP. | The Allied Polisher allows for bulk thinning of substrates, and fine polishing of optical waveguide facets. Various materials are typically lapped/polished, such as Silicon GaAs, InP. | ||
− | == Detailed Specs == | + | ==Detailed Specs== |
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− | == Operating Procedures == | + | *Max. Substrate Size |
− | * ''To Be Added'' | + | *Lapping Films available: |
+ | **10µm AlOx | ||
+ | **5µm AlOx | ||
+ | **2µm AlOx | ||
+ | **1µm AlOx | ||
+ | **0.5 AlOx | ||
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+ | ==Operating Procedures== | ||
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+ | *[https://wiki.nanotech.ucsb.edu/w/images/f/f2/Mechanical_Polisher_SOP_Rev_A.pdf Mechanical Polisher SOP] | ||
+ | |||
+ | ==Recipes== | ||
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+ | *''To Be Added'' |
Latest revision as of 09:06, 15 May 2023
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About
The Allied Polisher allows for bulk thinning of substrates, and fine polishing of optical waveguide facets. Various materials are typically lapped/polished, such as Silicon GaAs, InP.
Detailed Specs
- Max. Substrate Size
- Lapping Films available:
- 10µm AlOx
- 5µm AlOx
- 2µm AlOx
- 1µm AlOx
- 0.5 AlOx
Operating Procedures
Recipes
- To Be Added