Difference between revisions of "Maskless Aligner (Heidelberg MLA150)"

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The software allows for custom drawings and aligment marks to be exposed onto any feature located on the microscope.
 
The software allows for custom drawings and aligment marks to be exposed onto any feature located on the microscope.
  
Greyscale lithography allows for photoresist profiles with repeatable slanted or tapered structures.
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Greyscale lithography allows for photoresist profiles with repeatable slanted or tapered structures, via an 8-bit greyscale bitmap or layer-structured DXF file.
  
 
The high-aspect ratio (variable/long focal length) option enables vertical sidewalls on very thick (~100µm) photoresists.
 
The high-aspect ratio (variable/long focal length) option enables vertical sidewalls on very thick (~100µm) photoresists.
 +
 +
[[File:MLA150 Spatial Light Modulator Description.png|alt=Schematic of spatial light modulator exposure technique.|none|thumb|550x600px|Exposure method using a spatial light modulator, continuously moving stage and continuous autofocus. See [https://heidelberg-instruments.com/key-features/maskless-laser-lithography/ HIMT] for more info.]]
  
 
==Detailed Specifications==
 
==Detailed Specifications==
  
*Substrate size: 9-inch square or 200mm round down to 5-mm pieces  
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*Maximum Writeable Area: 150 x 150mm
 +
*Substrate size: 9-inch square or 200mm round down to 5-mm pieces
 +
**''Contact staff for pieces < 5 mm.''
 
*Wafer / substrate thickness: Max. 9mm / Min. 0.1mm
 
*Wafer / substrate thickness: Max. 9mm / Min. 0.1mm
 
*Exposure optics:
 
*Exposure optics:
**[https://en.wikipedia.org/wiki/Digital_micromirror_device Digital micromirror device (DMD)]  
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**[https://en.wikipedia.org/wiki/Digital_micromirror_device Digital micromirror device (DMD)]
 
**Laser #1: 375nm
 
**Laser #1: 375nm
 
**Laser #2: 405nm
 
**Laser #2: 405nm
* Alignment Accuracy: ≤ 200nm
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**Lens NA = 0.95
* Linewidth variation: ≤100nm
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*Alignment Accuracy: Global ≤ 500nm; Local ("Field") 250nm
 +
*Linewidth variation: ≤100nm (relevant to stitched exposure fields)
 +
*Write Grid (Address Unit):
 +
**High Quality Mode (std.): 40nm
 +
**Fast Mode: 100nm
  
 
*Additional manufacturer options:
 
*Additional manufacturer options:
 
**High-resolution option (Write Mode 1)
 
**High-resolution option (Write Mode 1)
 
**Extended Focus Range
 
**Extended Focus Range
** Variable Focal Depth
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**Variable Focal Depth
** Optical (laser) Autofocus in addition to Pneumatic Autofocus
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**Optical (laser) Autofocus in addition to std. Pneumatic Autofocus
 +
**Greyscale Mode
 +
**(No backside alignment)
 +
 
 
==Documentation==
 
==Documentation==
  
=== Operating Procedures ===
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===Operating Procedures===
*[[Special:FilePath/MLA150 - Standard Operating Procedure.pdf|MLA150 - Standard Operating Procedure]]
+
 
 +
*[https://wiki.nanotech.ucsb.edu/w/images/5/56/MLA150_SOP_Rev_I_%28LS%29.pdf MLA150 - Standard Operating Procedure] - updated Apr 26th 2021
 +
**''Includes File-upload procedure, CAD Conversion, Exposure and Alignment.''
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*[[MLA150 - Large Image GDS Generation|Large Image Patterning]] - one way to generate a GDS file out of an arbitrary image (eg. JPG, BMP, PNG etc.)
 +
 
 +
===[[MLA150 - Troubleshooting|<u>Troubleshooting & Known Bugs</u>]]===
 +
 
 +
*''See the above page for troubleshooting/recovery info and workarounds to known bugs.''
 +
 
 +
===Video Trainings===
 +
'''Important:''' You must be <u>authorized by a supervisor</u> to use the tool!  The video below is provided for reference only, and does not substitute training by NanoFab  staff. Contact [[Biljana Stamenic|the Supervisor]] for authorization.
 +
 
 +
*[https://gauchocast.hosted.panopto.com/Panopto/Pages/Viewer.aspx?id=5813cf18-37cb-48f1-aee6-acd50055c65e Heidelberg MLA150 Training Video (on GauchoSpace/Panopto)]
 +
*UPDATES to the Video Training: please review the addendums below:
 +
**[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Templates] have been updated, which are currently not reflected in the video.
 +
**Numerous solved issues have been added to the [[MLA150 - Troubleshooting|Troubleshooting page]].
  
=== Video Trainings ===
+
==Design Tools/Info==
'''Important:''' You must be <u>authorized by a supervisor</u> to use the tool!  The video below is provided for reference only, and does not substitute training by NanoFab  staff.
 
* [https://gauchocast.hosted.panopto.com/Panopto/Pages/Viewer.aspx?id=7f1b329d-e5c6-47c7-8443-ac6701348af5 Heidelberg MLA150 Training Video (on GauchoSpace/Panopto)]
 
  
=== Documentation from HIMT ===
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*[[MLA150 - Design Guidelines|Design Guidelines + Tips]]
[[File:MLA150 Spatial Light Modulator Description.png|alt=Schematic of spatial light modulator exposure technique.|none|thumb|550x600px|Exposure method using a spatial light modulator and continuously moving stage. See [https://heidelberg-instruments.com/en/features-technologies/key-features/maskless-lithography.html HIMT] for more info.]]
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*[[MLA150 - CAD Files and Templates|CAD Files and Templates]]
 +
*[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Template Guidelines]
  
== Design Tools/Info ==
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==Recipes==
* [[MLA150 - Design Guidelines]]
 
* [[MLA150 - CAD Files and Templates]]
 
  
== Recipes ==
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*'''Recipes > Lithography >''' '''<u>[[Maskless Aligner Recipes#Maskless Aligner .28Heidelberg MLA150.29|Maskless Aligner MLA150]]</u>'''
* '''Recipes > Lithography >''' '''<u>[[Maskless Aligner Recipes#Maskless Aligner .28Heidelberg MLA150.29|Maskless Aligner MLA150]]</u>'''
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**''Starting recipes for various I-Line photoresists''
** ''Starting recipes for various I-Line photoresists''
 

Latest revision as of 07:29, 12 November 2021

Maskless Aligner (Heidelberg MLA150)
MLA150 Heidelberg Bay 6 Photo.jpg
Tool Type Lithography
Location Bay 6
Supervisor Biljana Stamenic
Supervisor Phone (805) 893-4002
Supervisor E-Mail biljana@ece.ucsb.edu
Description Direct-Write (Maskless) I-Line Photolithography
Manufacturer Heidelberg Instruments
Model MLA150
Materials I-Line Photoresists
Sign up for this tool


About

The MLA150 allows for arbitrary direct-write patterning of I-Line photoresists from an uploaded CAD drawing/file (GDS, DXF, CIF etc.). The system uses a digital micromirror device ("DMD", an array of MEMS mirrors) for patterning the exposure light-field, to programmatically expose digitized patterns directly onto the sample - no glass photomasks/reticles are required.

Depending on the exposure options and write area, the MLA is able to expose a 100mm wafer in about 30min, and achieves minimum features sizes around 0.5µm, with overlay/alignment accuracy better than 200nm.

The system has a continuous, automatic autofocus, using pneumatic and optical detection. This potentially enables lithography on non-planar or curved substrates.

The software allows for custom drawings and aligment marks to be exposed onto any feature located on the microscope.

Greyscale lithography allows for photoresist profiles with repeatable slanted or tapered structures, via an 8-bit greyscale bitmap or layer-structured DXF file.

The high-aspect ratio (variable/long focal length) option enables vertical sidewalls on very thick (~100µm) photoresists.

Schematic of spatial light modulator exposure technique.
Exposure method using a spatial light modulator, continuously moving stage and continuous autofocus. See HIMT for more info.

Detailed Specifications

  • Maximum Writeable Area: 150 x 150mm
  • Substrate size: 9-inch square or 200mm round down to 5-mm pieces
    • Contact staff for pieces < 5 mm.
  • Wafer / substrate thickness: Max. 9mm / Min. 0.1mm
  • Exposure optics:
  • Alignment Accuracy: Global ≤ 500nm; Local ("Field") ≤ 250nm
  • Linewidth variation: ≤100nm (relevant to stitched exposure fields)
  • Write Grid (Address Unit):
    • High Quality Mode (std.): 40nm
    • Fast Mode: 100nm
  • Additional manufacturer options:
    • High-resolution option (Write Mode 1)
    • Extended Focus Range
    • Variable Focal Depth
    • Optical (laser) Autofocus in addition to std. Pneumatic Autofocus
    • Greyscale Mode
    • (No backside alignment)

Documentation

Operating Procedures

Troubleshooting & Known Bugs

  • See the above page for troubleshooting/recovery info and workarounds to known bugs.

Video Trainings

Important: You must be authorized by a supervisor to use the tool!  The video below is provided for reference only, and does not substitute training by NanoFab  staff. Contact the Supervisor for authorization.

Design Tools/Info

Recipes