Difference between revisions of "Maskless Aligner (Heidelberg MLA150)"

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(link to MLA150 recipes)
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== Recipes ==
== Recipes ==
* '''Recipes > Lithography >''' [[MLA150 Recipes|'''<u>MLA150</u>''']]
* '''Recipes > Lithography >''' '''<u>[[Maskless Aligner Recipes#Maskless Aligner .28Heidelberg MLA150.29|Maskless Aligner MLA150]]</u>'''
** ''Starting recipes for various I-Line photoresists''
** ''Starting recipes for various I-Line photoresists''

Revision as of 23:33, 13 September 2020


Work In Progress

This article is still under construction. It may contain factual errors. Content is subject to change.

Maskless Aligner (Heidelberg MLA150)
Tool Type Lithography
Location Bay 6
Supervisor Biljana Stamenic
Supervisor Phone (805) 893-4002
Supervisor E-Mail biljana@ece.ucsb.edu
Description Maskless I-Line Photolithography
Manufacturer Heidelberg Instruments
Model MLA150
Materials I-Line Photoresists


The MLA150 allows for arbitrary direct patterning of I-Line photoresists, directly from a CAD drawing/file, and alignment to arbitrary features on the sample. The system uses a optical digital light process (MEMS light-field patterning) to programatically expose digitized patterns directly onto the sample - no glass photomasks/reticles are required.

Detailed Specifications

  • Wafer size:
  • Wafer / substrate thickness:
  • Exposure optics:
    • Laser #1:
    • Laser #2:
  • Focus modes:
  • Alignment:
    • Modes?
    • Accuracy:
    • Repetability
  • Additional manufacturer options (none installed on our systems):
    • Focus option?
    • Dual lasers?
    • High-resolution option?
  • Uniformity:
  • Write speeds:


Design Tools/Info