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Revision as of 12:15, 28 November 2017 by John d (talk | contribs) ('how to use...' from H5 --> H3)
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Welcome to the UCSB Nanofab Wiki
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             Equipment & Recipes
Make sure you know the
Lab Rules

Equipment Status


Wifi Maintenance

On Thursday, Oct. 21th, between 6:00-7:00am, the campus wireless networks will experience a service disruption while new software is installed. The new software contains permanent fixes for all the major wireless network defects experienced during the start of the quarter. // John d 07:22, 19 October 2021 (PDT)

GCA Autostep and 6300 October Maintenance

The vendor will be here October 25 until October 28 to service both steppers. The Autostep will be Monday thru Wednesday from 8am until 6pm. The 6300 will be serviced on Thursday from 8am until 6pm. Silva 08:39, 12 October 2021 (PDT)

Oxford ICP Installed

A new ICP etcher for III-V etches (GaAs, InP, GaN) has been installed: Oxford_ICP_Etcher_(PlasmaPro_100_Cobra)

Contact the supervisor for training. // John d 08:00, 30 September 2021 (PDT)

New COVID Protocols

All facility users and visitors are now required to have masks on while indoors in shared spaces. This includes shared offices, hallways/corridors, and all shared laboratory spaces. Masks will be worn in all laboratories at all times and in all shared office spaces at all times.

This direction applies to all vaccinated and non-vaccinated persons.

Outdoor policies remain unchanged

Surgical style masks or KN95 masks are appropriate for cleanroom use. Cloth masks may be used in non-cleanroom spaces.

See the full policies at COVID-19_User_Policies

// Hopkins a 08:14, 6 August 2021 (PDT)

Weekly Testing strongly urged for UCSB Students/Staff

Free weekly COVID testing is available to UCSB Staff, Faculty and Students. UCSB employees are strongly urged to sign up for weekly testing, which takes only minutes, is administered on-campus and is free of charge.

Weekly recurring appointments can be made at the Student Health website:

The Chancellor's memo to campus with details can be found here. // John d 06:20, 16 November 2020 (PST)

NanoFab COVID Protocols

The most recent COVID Protocols can be found at COVID-19_User_Policies.

// John d 15:00, 19 July 2020 (PDT)


How to use this wiki

  • NanoFab Users are responsible for understanding their chemistry, risks and usage of various chemicals. Please read the MSDS sheets for the chemicals you use!
  • Users can add qualified processing data to the Wiki pages; see the Editing_Tutorials for how to do that.
Bay3 v1.jpg
GowningRoom v2.jpg

  • Supervisors of individuals using the facility, e.g., UCSB Principal Investigators and external user managers are ultimately responsible for ensuring that their supervisees have the appropriate knowledge and training to work safely in the facility.
  • They are also responsible for ensuring that all applicable regulatory requirements are met. This includes having a compliant "Chemical Hygiene Plan" per OSHA regulations.
  • The information on this site should be considered as providing "general supporting information" to the Chemical Hygiene Plan of a particular supervisor. Supervisors can reference all or some of this site information within their Plans. UCSB EH&S can provide assistance to supervisors in preparing their Plans.


News & Announcements

News from the U.C. Santa Barbara Nanofabrication Facility.

Oxford PlasmaPro ICP Etcher installed

We have a new ICP etcher in Bay 2: Oxford_ICP_Etcher_(PlasmaPro_100_Cobra)

The tool has been qualified for InP Ridge and InGaAsP Grating etches, and is intended for III-V etching in general (GaAs, GaN, GaSb etc.)

In addition, the tool is capable of Atomic Layer Etching on various materials. Contact the supervisor for training. // John d 11:27, 29 September 2021 (PDT)

SiO2 etching, High-Aspect Ratio

Dr. Bill Mitchell recently published an article detailing high-aspect ratio SiO2 etching (JVST-A, May 2021) in the Plasma-Therm Fluorine ICP etcher, using a novel Ruthenium Hard Mask.

Ruthenium can be deposited using the Oxford ALD or AJA Sputter and etched in one of the Panasonic ICP's.

You can find a full process flow at the FL-ICP's Recipe Page, in this case using a Sputtered Ru hard mask and I-line stepper lithography. // John d 08:05, 27 May 2021 (PDT)

Wafer Polisher available

We have added an Allied Wafer Polish tool to our equipment list. Contact Brian Lingg for more information. // John d 16:49, 10 May 2021 (PDT)

Digital Microscope: Olympus DSX-1000

You'll see a new digital microscope in Bay 4/Metrology, that's our new Olympus DSX-1000. We are currently developing procedures, keep an eye out for training emails. // John d 13:49, 8 April 2021 (PDT)

Raith Velion: FIB/SEM Installation

We have installed a new state-of-the-art focused ion beam/electron beam tool in Bay 1. The Raith Velion enables synchronized interferometric stage, Focused-ion Beam Lithography with ~10nm features or less, live SEM during writing, and Electron-Beam Lithography.

Learn more about the tool's capabilities at the Raith website:

Tool qualification is currently underway. Dr. Dan Read is be the resident expert on this new tool.

// John d 06:53, 30 November 2020 (PST)

For any questions, comments or concerns regarding the wiki, please contact the Wiki Admin.