MVD - Wafer Coating - Process Traveler
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Non-stick FDTS coating on the MVD
Used to make the wafer surface hydrophobic, used in nanoimprinting for coating the imprint master.
Use vapor coating in a clean-dry environment process as follows:
- Use Technics PEII etcher for 2 minutes with O2 at 300mT/100W first to “activate” the silicon surface for reaction with the FDTS.
- Use Standard FDTS program on the MVD tool for this.
- Hot plate bake at ~100C for 2 minutes following deposition.
- H2O Contact Angle ~ 110 Degrees (measured with Goniometer)
Removal: of FDTS Coating
Technics PEii O2 etching removes this coating effectively, eg. 2min.