Difference between revisions of "Lithography Recipes"

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== General Information ==
  +
  +
This page contains information and links to recipes/datasheets spin-coated materials used in the facility. In general, the following information is provided for the following materials:
  +
  +
* Photoresists: Links to nominal recipes to provide the user with starting points are found in the Photo Lithography Recipe section. Substrate, surface materials, pattern size can often affect process parameters. Datasheets provided for reference.
  +
* E-beam Lithography Resists: Links to nominal recipes may be provided in the E-Beam Lithography Recipe Section. Substrates and patterns play a large role in process parameters. Datasheets provided for reference.
  +
* Underlayers: These are used beneath resists for both adhesive purposes and to enable bi-layer lift-off profiles for use with photoresist. Datasheets are provided and some recipes are found in the Lift-Off Techniques section.
  +
* Nanoimprinting Resists: Datasheets are provided. Any recipes provided are for use in the Nanonex NX2000 system only and are found in the Nanoimprint section.
  +
* Anti-Reflection Coatings: These are used in the stepper systems, underneath the resists to eliminate substrate reflections that can affect resolution and repeatability for small, near resolution limited, feature sizes. Recipes using these materials are found within the photoresist recipes themselves. Datasheets are provided for reference on use of the materials.
  +
* Contrast Enhancement Materials (CEM): Used for resolution enhancement. Not for use in contact aligners. Recipes using these materials are found within the photoresist recipes themselves. Datasheets also provided.
  +
* Adhesion Promoters: Datasheets are provided on use of these materials.
  +
* Low-K Spin-on Dielectrics: Datasheets are provided for BCB, Phoot-BCB, and SOG for reference on use. Some recipes are provided in the Low-K section.
  +
* Developers and Removers: Datasheets provided for reference.
  +
 
== Lift-Off Techniques ==
  
== Lift-Off Techniques ==
   
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|}
   
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== Recipes ==
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== Photolithography Recipes ==
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{{Recipe Table Explanation}}
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{| border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" class="wikitable"
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|- bgcolor="#D0E7FF"
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! height="45" colspan="9" | <div style="font-size: 150%;">Photolithography Recipes</div>
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|- bgcolor="#D0E7FF"
  +
| <!-- INTENTIONALLY LEFT BLANK --> <br>
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! bgcolor="#D0E7FF" align="center" colspan="2" | '''[[Contact Alignment Recipes|Contact Aligners]]'''
  +
! bgcolor="#D0E7FF" align="center" colspan="3" | '''[[Stepper Recipes|Steppers]]'''
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! width="30" bgcolor="#D0E7FF" align="center" | '''[[Flood Exposure Recipes|Flood Expose]]'''
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! bgcolor="#D0E7FF" align="center" colspan="2" | '''[[E-Beam Lithography Recipes|E-Beam Lithography]]'''
  +
|-
  +
! width="150" bgcolor="#D0E7FF" align="center" | '''Positive Resists'''
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{{LithRecipe Table}}
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|-
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| bgcolor="#D0E7FF" align="center" | AZ4110
  +
| bgcolor="EEFFFF" | {{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}}
  +
| bgcolor="EEFFFF" | {{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}}
  +
| bgcolor="EEFFFF" | A
  +
| bgcolor="EEFFFF" | A
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
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| bgcolor="EEFFFF" |
  +
|-
  +
| bgcolor="#D0E7FF" align="center" | AZ4210
  +
| {{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}}
  +
| {{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}}
  +
| A
  +
| A
  +
| <br>
  +
| <br>
  +
| <br>
  +
| <br>
  +
|-
  +
| bgcolor="#D0E7FF" align="center" | AZ4330RS
  +
| bgcolor="EEFFFF" | {{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}}
  +
| bgcolor="EEFFFF" | {{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}}
  +
| bgcolor="EEFFFF" | A
  +
| bgcolor="EEFFFF" | A
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
|-
  +
| bgcolor="#D0E7FF" align="center" | OCG 825-35CS
  +
| A
  +
| A
  +
| A
  +
| A
  +
| <br>
  +
| <br>
  +
| <br>
  +
| <br>
  +
|-
  +
| bgcolor="#D0E7FF" align="center" | SPR 950-0.8
  +
| bgcolor="EEFFFF" | A
  +
| bgcolor="EEFFFF" | A
  +
| bgcolor="EEFFFF" | A
  +
| bgcolor="EEFFFF" | A
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
|-
  +
| bgcolor="#D0E7FF" align="center" | SPR 955 CM-0.9
  +
| A
  +
| A
  +
| {{rl|Stepper Recipes|Positive Resist (GCA 6300)}}
  +
| {{rl|Stepper Recipes|Positive Resist (AutoStep 200)}}
  +
| <br>
  +
| <br>
  +
| <br>
  +
| <br>
  +
|-
  +
| bgcolor="#D0E7FF" align="center" | SPR 955 CM-1.8
  +
| bgcolor="EEFFFF" | A
  +
| bgcolor="EEFFFF" | A
  +
| bgcolor="EEFFFF" | {{rl|Stepper Recipes|Positive Resist (GCA 6300)}}
  +
| bgcolor="EEFFFF" | {{rl|Stepper Recipes|Positive Resist (AutoStep 200)}}
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
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| bgcolor="EEFFFF" |
  +
|-
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| bgcolor="#D0E7FF" align="center" | SPR 220-3.0
  +
| {{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}}
  +
| {{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}}
  +
| {{rl|Stepper Recipes|Positive Resist (GCA 6300)}}
  +
| {{rl|Stepper Recipes|Positive Resist (AutoStep 200)}}
  +
| <br>
  +
| <br>
  +
| <br>
  +
| <br>
  +
|-
  +
| bgcolor="#D0E7FF" align="center" | SPR 220-7.0
  +
| bgcolor="EEFFFF" | {{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}}
  +
| bgcolor="EEFFFF" | {{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}}
  +
| bgcolor="EEFFFF" | {{rl|Stepper Recipes|Positive Resist (GCA 6300)}}
  +
| bgcolor="EEFFFF" | {{rl|Stepper Recipes|Positive Resist (AutoStep 200)}}
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
|-
  +
| bgcolor="#D0E7FF" align="center" | THMR-IP3600 HP D
  +
| <br>
  +
| <br>
  +
| A
  +
| A
  +
| <br>
  +
| <br>
  +
| <br>
  +
| <br>
  +
|-
  +
| bgcolor="#D0E7FF" align="center" | UV6-0.7
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" | {{rl|Stepper Recipes|Positive Resist (ASML DUV)}}
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
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|-
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| bgcolor="#D0E7FF" align="center" | UV210-0.3
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" | {{rl|Stepper Recipes|Positive Resist (ASML DUV)}}
  +
| bgcolor="EEFFFF" |
  +
| bgcolor="EEFFFF" |
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| bgcolor="EEFFFF" |
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|-
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! bgcolor="#D0E7FF" align="center" | '''Negative Resists'''
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{{LithRecipe Table}}
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|- bgcolor="EEFFFF"
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| bgcolor="#D0E7FF" align="center" | AZ5214-EIR
  +
| {{rl|Contact_Alignment_Recipes|Negative Resist (MJB-3)}}
  +
| {{rl|Contact_Alignment_Recipes|Negative Resist (MA-6)}}
  +
| {{rl|Stepper Recipes|Negative Resist (GCA 6300)}}
  +
| {{rl|Stepper Recipes|Negative Resist (AutoStep 200)}}
  +
|
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|
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|
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|
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|-
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| bgcolor="#D0E7FF" align="center" | AZnLOF 2020
  +
| {{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}}
  +
| {{rl|Contact_Alignment_Recipes|Negative Resist (MA-6)}}
  +
| {{rl|Stepper Recipes|Negative Resist (GCA 6300)}}
  +
| {{rl|Stepper Recipes|Negative Resist (AutoStep 200)}}
  +
|
  +
|
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|
  +
|
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|- bgcolor="EEFFFF"
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| bgcolor="#D0E7FF" align="center" | AZnLOF 2035
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| A
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| A
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| A
  +
| A
  +
|
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|
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|
  +
|
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|-
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| bgcolor="#D0E7FF" align="center" | AZnLOF 2070
  +
| A
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| A
  +
| A
  +
| A
  +
|
  +
|
  +
|
  +
|
  +
|- bgcolor="EEFFFF"
  +
| bgcolor="#D0E7FF" align="center" | AZnLOF 5510
  +
| A
  +
| A
  +
| {{rl|Stepper Recipes|Negative Resist (GCA 6300)}}
  +
| {{rl|Stepper Recipes|Negative Resist (AutoStep 200)}}
  +
|
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|
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|
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|
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|-
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| bgcolor="#D0E7FF" align="center" | UVN2300-0.5
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|
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|
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|
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|
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| {{rl|Stepper Recipes|Negative Resist (ASML DUV)}}
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|
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|
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|
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|- bgcolor="EEFFFF"
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| bgcolor="#D0E7FF" align="center" | SU-8 2015
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| A
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| A
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| A
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| A
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|
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|
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|
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|
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|-
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! bgcolor="#D0E7FF" align="center" | '''Underlayers'''
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{{LithRecipe Table}}
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|- bgcolor="EEFFFF"
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| bgcolor="#D0E7FF" align="center" | PMGI SF-11
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| <br>
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| <br>
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| <br>
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| <br>
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| <br>
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| <br>
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| <br>
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| <br>
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|-
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| bgcolor="#D0E7FF" align="center" | PMGI SF-15
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|
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|
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|
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|
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|
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|
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|
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|
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|- bgcolor="EEFFFF"
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| bgcolor="#D0E7FF" align="center" | LOL 2000
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|
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|
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|
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|
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|
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|
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|
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|
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|-
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| bgcolor="#D0E7FF" align="center" | XHRIC-11 (i-lineBARC)
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|
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|
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|
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|
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|
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|
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|
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|
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|- bgcolor="EEFFFF"
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| bgcolor="#D0E7FF" align="center" | AR-2 (DUV BARC)
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|
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|
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|
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|
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|
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|
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|
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|
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|-
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| bgcolor="#D0E7FF" align="center" | DS-K101 (DUV BARC)
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|
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|
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|
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|
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|
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|
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|
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|
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|-
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! bgcolor="#D0E7FF" align="center" | '''Overlayers'''
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{{LithRecipe Table}}
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|- bgcolor="EEFFFF"
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| bgcolor="#D0E7FF" align="center" | CEM-365 IS
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|
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|
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|
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|
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|
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|
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|
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|
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|-
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! bgcolor="#D0E7FF" align="center" | '''E-Beam Resists'''
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{{LithRecipe Table}}
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|- bgcolor="EEFFFF"
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| bgcolor="#D0E7FF" align="center" | &nbsp;??????
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|
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|
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|
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|-
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| bgcolor="#D0E7FF" align="center" | &nbsp;???????
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|
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|
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|
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|
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|
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|
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|
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|-
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! bgcolor="#D0E7FF" align="center" | '''Nanoimprint Resists'''
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{{LithRecipe Table}}
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|- bgcolor="EEFFFF"
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| bgcolor="#D0E7FF" align="center" | MR-I 7020
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|
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|
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|
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|
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|
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|
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|
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|
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|-
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| bgcolor="#D0E7FF" align="center" | Nanonex NX-1020
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|
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|
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|
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|
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|
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|
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|
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|
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|-
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! bgcolor="#D0E7FF" align="center" |
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{{LithRecipe Table}}
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|}
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== E-Beam Lithography Recipes ==
   
 
{{Recipe Table Explanation}}
 
{{Recipe Table Explanation}}
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{| border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" class="wikitable"
  
{| border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" class="wikitable"
 
|- bgcolor="#D0E7FF"
  
|- bgcolor="#D0E7FF"
−
! height="45" colspan="9" | <div style="font-size: 150%;">Lithography Recipes</div>
 +
! height="45" colspan="9" | <div style="font-size: 150%;">E-Beam Lithography Recipes</div>
 
|- bgcolor="#D0E7FF"
  
|- bgcolor="#D0E7FF"
 
| <!-- INTENTIONALLY LEFT BLANK --> <br>
 
| <!-- INTENTIONALLY LEFT BLANK --> <br>

Revision as of 16:44, 12 July 2013

General Information

This page contains information and links to recipes/datasheets spin-coated materials used in the facility. In general, the following information is provided for the following materials:

  • Photoresists: Links to nominal recipes to provide the user with starting points are found in the Photo Lithography Recipe section. Substrate, surface materials, pattern size can often affect process parameters. Datasheets provided for reference.
  • E-beam Lithography Resists: Links to nominal recipes may be provided in the E-Beam Lithography Recipe Section. Substrates and patterns play a large role in process parameters. Datasheets provided for reference.
  • Underlayers: These are used beneath resists for both adhesive purposes and to enable bi-layer lift-off profiles for use with photoresist. Datasheets are provided and some recipes are found in the Lift-Off Techniques section.
  • Nanoimprinting Resists: Datasheets are provided. Any recipes provided are for use in the Nanonex NX2000 system only and are found in the Nanoimprint section.
  • Anti-Reflection Coatings: These are used in the stepper systems, underneath the resists to eliminate substrate reflections that can affect resolution and repeatability for small, near resolution limited, feature sizes. Recipes using these materials are found within the photoresist recipes themselves. Datasheets are provided for reference on use of the materials.
  • Contrast Enhancement Materials (CEM): Used for resolution enhancement. Not for use in contact aligners. Recipes using these materials are found within the photoresist recipes themselves. Datasheets also provided.
  • Adhesion Promoters: Datasheets are provided on use of these materials.
  • Low-K Spin-on Dielectrics: Datasheets are provided for BCB, Phoot-BCB, and SOG for reference on use. Some recipes are provided in the Low-K section.
  • Developers and Removers: Datasheets provided for reference.

Lift-Off Techniques

Chemical Datasheets

Positive Photoresists
Negative Photoresists
Underlayers
E-beam resists
Nanoimprinting
Contrast Enhancement Materials
Anti-Reflection Coatings
Adhesion Promoters
BCB and SOG
Developers
Photoresist Removers

Photolithography Recipes

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.


Photolithography Recipes

 Contact Aligners Steppers Flood Expose E-Beam Lithography
Positive Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


AZ4110 R R A A
AZ4210 R R A A



AZ4330RS R R A A
OCG 825-35CS A A A A



SPR 950-0.8 A A A A
SPR 955 CM-0.9 A A R R



SPR 955 CM-1.8 A A R R
SPR 220-3.0 R R R R



SPR 220-7.0 R R R R
THMR-IP3600 HP D

A A



UV6-0.7 R
UV210-0.3 R
Negative Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


AZ5214-EIR R R R R
AZnLOF 2020 R R R R
AZnLOF 2035 A A A A
AZnLOF 2070 A A A A
AZnLOF 5510 A A R R
UVN2300-0.5 R
SU-8 2015 A A A A
Underlayers SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


PMGI SF-11







PMGI SF-15
LOL 2000
XHRIC-11 (i-lineBARC)
AR-2 (DUV BARC)
DS-K101 (DUV BARC)
Overlayers SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


CEM-365 IS
E-Beam Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


 ??????
 ???????
Nanoimprint Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


MR-I 7020
Nanonex NX-1020
SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


E-Beam Lithography Recipes

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.


E-Beam Lithography Recipes

 Contact Aligners Steppers Flood Expose E-Beam Lithography
Positive Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


AZ4110 R R A A
AZ4210 R R A A



AZ4330RS R R A A
OCG 825-35CS A A A A



SPR 950-0.8 A A A A
SPR 955 CM-0.9 A A R R



SPR 955 CM-1.8 A A R R
SPR 220-3.0 R R R R



SPR 220-7.0 R R R R
THMR-IP3600 HP D

A A



UV6-0.7 R
UV210-0.3 R
Negative Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


AZ5214-EIR R R R R
AZnLOF 2020 R R R R
AZnLOF 2035 A A A A
AZnLOF 2070 A A A A
AZnLOF 5510 A A R R
UVN2300-0.5 R
SU-8 2015 A A A A
Underlayers SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


PMGI SF-11







PMGI SF-15
LOL 2000
XHRIC-11 (i-lineBARC)
AR-2 (DUV BARC)
DS-K101 (DUV BARC)
Overlayers SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


CEM-365 IS
E-Beam Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


 ??????
 ???????
Nanoimprint Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


MR-I 7020
Nanonex NX-1020
SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


Retrieved from "https://wiki.nanofab.ucsb.edu/w/index.php?title=Lithography_Recipes&oldid=2842"