Lithography Recipes

Lift-Off Techniques

• Description/Tutorial
• Bi-Layer Process with PMGI Underlayer and Contact Aligner

Chemical Datasheets

Positive Photoresists AZP4000 (AZ4110, AZ4210, AZ4330) OCG825 SPR220 (SPR220-3, SPR220-7) SPR950-0.8 SPR955CM (SPR955CM-0.9, SPR955CM-1.8) UV6-0.7 UV210-0.3 Negative Photoresists AZ5214 AZnLOF5510 AZnLOF2000 (AZnLOF2020, AZnLOF2035, AZnLOF2070) UVN2300-0.5 Underlayers PMGI (PMGI SF-11, PMGI SF-13, PMGI SF-15) Shipley LOL2000 E-beam resists PMMA (PMMA, P(MMA-MAA) copolymer) maN 2403

Nanoimprinting NX1020 MRI-7020 Contrast Enhancement Materials CEM365iS Anti-Reflection Coatings XHRiC AR2 DS-K101 (developable BARC) Developers AZ400K (AZ400K, AZ400K1:4) AZ300MIF Photoresist Removers 1165 AZ300T PRX-127

Recipes

• R = Recipe is available. Clicking this link will take you to the recipe.
• A = Material is available for use, but no recipes are provided.

Lithography Recipes
	Contact Aligners		Steppers			Flood Expose	E-Beam Lithography
Positive Resists	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
AZ4110	R	R	A	A
AZ4210	R	R	A	A
AZ4330RS	R	R	A	A
OCG 825-35CS	A	A	A	A
SPR 950-0.8	A	A	A	A
SPR 955 CM-0.9	A	A	R	R
SPR 955 CM-1.8	A	A	R	R
SPR 220-3.0	R	R	R	R
SPR 220-7.0	R	R	R	R
THMR-IP3600 HP D			A	A
UV6-0.7					A
UV210-0.3					A
Negative Resists	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
AZ5214-EIR	R	R	R	R
AZnLOF 2020	R	R	R	R
AZnLOF 2035	A	A	A	A
AZnLOF 2070	A	A	A	A
AZnLOF 5510	A	A	R	R
UVN30-0.5					A
SU-8 2015	A	A	A	A
Underlayers	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
PMGI SF-11
PMGI SF-15
LOL 2000
XHRIC-11 (i-lineBARC)
AR-2 (DUV BARC)
DS-K101 (DUV BARC)
Overlayers	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
CEM-365 IS
E-Beam Resists	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
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Nanoimprint Resists	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
MR-I 7020
Nanonex NX-1020
	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)