Difference between revisions of "Lithography Recipes"

From UCSB Nanofab Wiki
Jump to: navigation, search
(Recipes)
(Recipes)
Line 125: Line 125:
 
| {{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}}
 
| {{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}}
 
| {{rl|Stepper Recipes|Positive Resist (GCA 6300)}}
 
| {{rl|Stepper Recipes|Positive Resist (GCA 6300)}}
  +
| {{rl|Stepper Recipes|Positive Resist (AutoStep 200)}}
| <br>
 
 
| <br>
 
| <br>
 
| <br>
 
| <br>
Line 135: Line 135:
 
| bgcolor="EEFFFF" | {{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}}
 
| bgcolor="EEFFFF" | {{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}}
 
| bgcolor="EEFFFF" | {{rl|Stepper Recipes|Positive Resist (GCA 6300)}}
 
| bgcolor="EEFFFF" | {{rl|Stepper Recipes|Positive Resist (GCA 6300)}}
| bgcolor="EEFFFF" |
+
| bgcolor="EEFFFF" | {{rl|Stepper Recipes|Positive Resist (AutoStep 200)}}
 
| bgcolor="EEFFFF" |
 
| bgcolor="EEFFFF" |
 
| bgcolor="EEFFFF" |
 
| bgcolor="EEFFFF" |
Line 168: Line 168:
 
| {{rl|Contact_Alignment_Recipes|Negative Resist (MA-6)}}
 
| {{rl|Contact_Alignment_Recipes|Negative Resist (MA-6)}}
 
| {{rl|Stepper Recipes|Negative Resist (GCA 6300)}}
 
| {{rl|Stepper Recipes|Negative Resist (GCA 6300)}}
  +
| {{rl|Stepper Recipes|Negative Resist (AutoStep 200)}}
|
 
 
|
 
|
 
|
 
|
Line 178: Line 178:
 
| {{rl|Contact_Alignment_Recipes|Negative Resist (MA-6)}}
 
| {{rl|Contact_Alignment_Recipes|Negative Resist (MA-6)}}
 
| {{rl|Stepper Recipes|Negative Resist (GCA 6300)}}
 
| {{rl|Stepper Recipes|Negative Resist (GCA 6300)}}
  +
| {{rl|Stepper Recipes|Negative Resist (AutoStep 200)}}
|
 
 
|
 
|
 
|
 
|

Revision as of 09:47, 9 November 2012

Lift-Off Techniques

Chemical Datasheets

To Do: Ask Brian where these should go...
Positive Photoresists
Negative Photoresists
Underlayers
E-beam resists
Nanoimprinting
Contrast Enhancement Materials
Anti-Reflection Coatings
Developers
Photoresist Removers

Recipes

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.
Lithography Recipes

Contact Aligners Steppers Flood Expose E-Beam Lithography
Positive Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
AZ4110 R R
AZ4210 R R





AZ4330RS R R
OCG 825-35CS







SPR 950-0.8
SPR 955 CM-0.9

R R



SPR 955 CM-1.8 R R
SPR 220-3.0 R R R R



SPR 220-7.0 R R R R
THMR-IP3600 HP D







UV6-0.7
Negative Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
AZ5214-EIR R R R R
AZnLOF 2020 R R R R
AZnLOF 2035
AZnLOF 2070
AZnLOF P5510 R R
UVN30-0.5
SU-8 2015
Underlayers SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
PMGI SF-11







PMGI SF-15
LOL 2000
XHRIC-11 (BARC)
AR-2 (BARC)
DS-K 101-307 (BARC)
Overlayers SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
CEM-365 IS
E-Beam Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
??????
???????
Nanoimprint Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
MR-I 7020
Nanonex NX-1020
SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)