Difference between revisions of "Lithography Recipes"

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*{{fl|AZnLOF2020-Negative-Resist-Datasheet.pdf|AZnLOF2000 (AZnLOF2020, AZnLOF2035, AZnLOF2070)}}  
 
*{{fl|AZnLOF2020-Negative-Resist-Datasheet.pdf|AZnLOF2000 (AZnLOF2020, AZnLOF2035, AZnLOF2070)}}  
 
*{{fl|UVN2300-Negative-Resist-Datasheet.pdf|UVN2300-0.5}}
 
*{{fl|UVN2300-Negative-Resist-Datasheet.pdf|UVN2300-0.5}}
 +
*{{fl|xxxx.pdf|SU-8-2015 and 2075}}
  
 
;Underlayers
 
;Underlayers
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*{{fl|maN2403-E-Beam-Resist-Datasheet.pdf|maN 2403}}
 
*{{fl|maN2403-E-Beam-Resist-Datasheet.pdf|maN 2403}}
  
|
 
 
;Nanoimprinting
 
;Nanoimprinting
  
 
*{{fl|NX1020-Nanoimprinting-Datasheet.pdf|NX1020}}  
 
*{{fl|NX1020-Nanoimprinting-Datasheet.pdf|NX1020}}  
 
*{{fl|MRI-7020-Nanoimprinting-Datasheet.pdf|MRI-7020}}
 
*{{fl|MRI-7020-Nanoimprinting-Datasheet.pdf|MRI-7020}}
 
+
|
 
;Contrast Enhancement Materials
 
;Contrast Enhancement Materials
  
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*{{fl|AR2-Anti-Reflective-Coating.pdf|AR2}}  
 
*{{fl|AR2-Anti-Reflective-Coating.pdf|AR2}}  
 
*{{fl|DS-K101-Anti-Reflective-Coating.pdf|DS-K101 (developable BARC)}}
 
*{{fl|DS-K101-Anti-Reflective-Coating.pdf|DS-K101 (developable BARC)}}
 +
 +
;Adhesion Promoters
 +
 +
*{{fl|xxxx.pdf|HMDS}}
 +
*{{fl|xxxx.pdf|AP3000 BCB Adhesion Promoter}}
 +
*{{fl|xxxx.pdf|Omnicoat, SU-8 Adhesion Promoter}}
 +
 +
;BCB and SOG
 +
 +
*{{fl|xxxx.pdf|BCB, Cyclotene 3022-46(Not Photosensitive)}}
 +
*{{fl|xxxx.pdf|PhotoBCB, Cyclotene 4022-40(Negative Polarity)}}
 +
*{{fl|xxxx.pdf|Spin-on-Glass, Honeywell 512B (Not Photosensitive)}}
  
 
;Developers
 
;Developers
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*{{fl|AZ400K-Developer-Datasheet.pdf|AZ400K (AZ400K, AZ400K1:4)}}  
 
*{{fl|AZ400K-Developer-Datasheet.pdf|AZ400K (AZ400K, AZ400K1:4)}}  
 
*{{fl|AZ300MIF-Developer-Datasheet.pdf|AZ300MIF}}
 
*{{fl|AZ300MIF-Developer-Datasheet.pdf|AZ300MIF}}
 +
*{{fl|xxxxxx.pdf|DS2100 BCB Developer}}
 +
*{{fl|xxxxxx.pdf|SU-8 Developer}}
 +
*{{fl|xxxxxx.pdf|101A Developer (for DUV Flood Exposed PMGI)}}
  
 
;Photoresist Removers
 
;Photoresist Removers
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*{{fl|AZ300T-Resist-Remover.pdf|AZ300T}}  
 
*{{fl|AZ300T-Resist-Remover.pdf|AZ300T}}  
 
*{{fl|PRX-127-Resist-Remover.pdf|PRX-127}}
 
*{{fl|PRX-127-Resist-Remover.pdf|PRX-127}}
 +
*{{fl|xxxx.pdf|Remover PG, SU-8 stripper}}
  
 
|}
 
|}

Revision as of 15:33, 10 July 2013

Lift-Off Techniques

Chemical Datasheets

Positive Photoresists
Negative Photoresists
Underlayers
E-beam resists
Nanoimprinting
Contrast Enhancement Materials
Anti-Reflection Coatings
Adhesion Promoters
BCB and SOG
Developers
Photoresist Removers

Recipes

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.
Lithography Recipes

Contact Aligners Steppers Flood Expose E-Beam Lithography
Positive Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)


AZ4110 R R A A
AZ4210 R R A A



AZ4330RS R R A A
OCG 825-35CS A A A A



SPR 950-0.8 A A A A
SPR 955 CM-0.9 A A R R



SPR 955 CM-1.8 A A R R
SPR 220-3.0 R R R R



SPR 220-7.0 R R R R
THMR-IP3600 HP D

A A



UV6-0.7 R
UV210-0.3 R
Negative Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)


AZ5214-EIR R R R R
AZnLOF 2020 R R R R
AZnLOF 2035 A A A A
AZnLOF 2070 A A A A
AZnLOF 5510 A A R R
UVN2300-0.5 R
SU-8 2015 A A A A
Underlayers SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)


PMGI SF-11







PMGI SF-15
LOL 2000
XHRIC-11 (i-lineBARC)
AR-2 (DUV BARC)
DS-K101 (DUV BARC)
Overlayers SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)


CEM-365 IS
E-Beam Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)


 ??????
 ???????
Nanoimprint Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)


MR-I 7020
Nanonex NX-1020
SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)