Difference between revisions of "Lithography Recipes"

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! bgcolor="#D0E7FF" align="center" colspan="2" | '''[[E-Beam Lithography Recipes|E-Beam Lithography]]'''
 
! bgcolor="#D0E7FF" align="center" colspan="2" | '''[[E-Beam Lithography Recipes|E-Beam Lithography]]'''
 
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! width="50" bgcolor="#D0E7FF" align="center" | '''Positive Resists'''  
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! width="150" bgcolor="#D0E7FF" align="center" | '''Positive Resists'''  
 
{{LithRecipe Table}}  
 
{{LithRecipe Table}}  
 
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Revision as of 07:00, 21 August 2012

Lithography Recipes

Contact Aligners Steppers Flood Expose E-Beam Lithography
Positive Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
AZ4110
AZ4210







AZ4330RS
OCG 825-35CS







SPR 950-0.8
SPR 955 CM-0.9







SPR 955 CM-1.8
SPR 220-3.0







SPR 220-7.0
THMR-IP3600 HP D







UV6-0.7
Negative Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
AZ5214-EIR







AZnLOF 2020
AZnLOF 2035







AZnLOF 2070
AZnLOF P5510
UVN30-0.5
SU-8 2015
SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)