Difference between revisions of "Lithography Recipes"

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==Chemical Datasheets==
 
==Chemical Datasheets==
{{todo|Ask Brian where these should go...}}
+
{|
 +
|-valign="top"
 +
|width=400|
 
;Positive Photoresists
 
;Positive Photoresists
 
*{{fl|AXP4000pb-Datasheet.pdf|AZP4000 (AZ4110, AZ4210, AZ4330)}}
 
*{{fl|AXP4000pb-Datasheet.pdf|AZP4000 (AZ4110, AZ4210, AZ4330)}}
 
*{{fl|OCG825-Positive-Resist-Datasheet.pdf|OCG825}}
 
*{{fl|OCG825-Positive-Resist-Datasheet.pdf|OCG825}}
*{{fl|SPR220-Positive-Resist-Datasheet.pdf|SPR220 (SPR220-2, SPR220-7)}}
+
*{{fl|SPR220-Positive-Resist-Datasheet.pdf|SPR220 (SPR220-3, SPR220-7)}}
 
*{{fl|SPR950-Positive-Resist-Datasheet.pdf|SPR950-0.8}}
 
*{{fl|SPR950-Positive-Resist-Datasheet.pdf|SPR950-0.8}}
 
*{{fl|SPR955-Positive-Resist-Datasheet.pdf|SPR955CM (SPR955CM-0.9, SPR955CM-1.8)}}
 
*{{fl|SPR955-Positive-Resist-Datasheet.pdf|SPR955CM (SPR955CM-0.9, SPR955CM-1.8)}}
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*{{fl|AZ5214-Negative-Resist-Datasheet.pdf|AZ5214}}
 
*{{fl|AZ5214-Negative-Resist-Datasheet.pdf|AZ5214}}
 
*{{fl|AZnLOF5510-Negative-Resist-Datasheet.pdf|AZnLOF5510}}
 
*{{fl|AZnLOF5510-Negative-Resist-Datasheet.pdf|AZnLOF5510}}
*{{fl|AZnLOF2020-Negative-Resist-Datasheet.pdf|AZnLOF2020}}
+
*{{fl|AZnLOF2020-Negative-Resist-Datasheet.pdf|AZnLOF2000 (AZnLOF2020, AZnLOF2035, AZnLOF2070)}}
 
;Underlayers
 
;Underlayers
 
*{{fl|PMGI-Underlayer-Datasheet.pdf|PMGI (PMGI SF-11, PMGI SF-13, PMGI SF-15)}}
 
*{{fl|PMGI-Underlayer-Datasheet.pdf|PMGI (PMGI SF-11, PMGI SF-13, PMGI SF-15)}}
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*{{fl|PMMA-E-Beam-Resist-Datasheet.pdf|PMMA (PMMA, P(MMA-MAA) copolymer)}}
 
*{{fl|PMMA-E-Beam-Resist-Datasheet.pdf|PMMA (PMMA, P(MMA-MAA) copolymer)}}
 
*{{fl|maN2403-E-Beam-Resist-Datasheet.pdf|maN 2403}}
 
*{{fl|maN2403-E-Beam-Resist-Datasheet.pdf|maN 2403}}
 +
|
 
;Nanoimprinting
 
;Nanoimprinting
 
*{{fl|NX1020-Nanoimprinting-Datasheet.pdf|NX1020}}
 
*{{fl|NX1020-Nanoimprinting-Datasheet.pdf|NX1020}}
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*{{fl|AZ300T-Resist-Remover.pdf|AZ300T}}
 
*{{fl|AZ300T-Resist-Remover.pdf|AZ300T}}
 
*{{fl|PRX-127-Resist-Remover.pdf|PRX-127}}
 
*{{fl|PRX-127-Resist-Remover.pdf|PRX-127}}
 +
|}
  
 
==Recipes==
 
==Recipes==

Revision as of 17:47, 13 November 2012

Lift-Off Techniques

Chemical Datasheets

Positive Photoresists
Negative Photoresists
Underlayers
E-beam resists
Nanoimprinting
Contrast Enhancement Materials
Anti-Reflection Coatings
Developers
Photoresist Removers

Recipes

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.
Lithography Recipes

Contact Aligners Steppers Flood Expose E-Beam Lithography
Positive Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
AZ4110 R R
AZ4210 R R





AZ4330RS R R
OCG 825-35CS







SPR 950-0.8
SPR 955 CM-0.9

R R



SPR 955 CM-1.8 R R
SPR 220-3.0 R R R R



SPR 220-7.0 R R R R
THMR-IP3600 HP D







UV6-0.7
Negative Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
AZ5214-EIR R R R R
AZnLOF 2020 R R R R
AZnLOF 2035
AZnLOF 2070
AZnLOF P5510 R R
UVN30-0.5
SU-8 2015
Underlayers SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
PMGI SF-11







PMGI SF-15
LOL 2000
XHRIC-11 (BARC)
AR-2 (BARC)
DS-K 101-307 (BARC)
Overlayers SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
CEM-365 IS
E-Beam Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
??????
???????
Nanoimprint Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
MR-I 7020
Nanonex NX-1020
SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)