Difference between revisions of "Lithography Recipes"

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*{{fl|PMMA-E-Beam-Resist-Datasheet.pdf|PMMA (PMMA, P(MMA-MAA) copolymer)}}
 
*{{fl|PMMA-E-Beam-Resist-Datasheet.pdf|PMMA (PMMA, P(MMA-MAA) copolymer)}}
 
*{{fl|maN2403-E-Beam-Resist-Datasheet.pdf|maN 2403}}
 
*{{fl|maN2403-E-Beam-Resist-Datasheet.pdf|maN 2403}}
 +
;Nanoimprinting
 +
*{{fl|NX1020-Nanoimprinting-Datasheet.pdf|NX1020}}
 +
*{{fl|MRI-7020-Nanoimprinting-Datasheet.pdf|MRI-7020}}
 +
;Contrast Enhancement Materials
 +
*{{fl|CEM365iS-Contrast-Enhancement-Datasheet.pdf|CEM365iS}}
 +
;Anti-Reflection Coatings
 +
*{{fl|XHRiC-Anti-Reflective-Coating.pdf|XHRiC}}
 +
;Developers
 +
*{{fl|AZ400K-Developer-Datasheet.pdf|AZ400K (AZ400K, AZ400K1:4)}}
 +
*{{fl|AZ300MIF-Developer-Datasheet.pdf|AZ300MIF}}
 +
;Photoresist Removers
 +
*{{fl|1165-Resist-Remover.pdf|1165}}
 +
*{{fl|AZ300T-Resist-Remover.pdf|AZ300T}}
 +
*{{fl|PRX-127-Resist-Remover.pdf|PRX-127}}
  
 
==Recipes==
 
==Recipes==

Revision as of 17:10, 8 November 2012

Lift-Off Techniques

Chemical Datasheets

To Do: Ask Brian where these should go...
Positive Photoresists
Negative Photoresists
Underlayers
E-beam resists
Nanoimprinting
Contrast Enhancement Materials
Anti-Reflection Coatings
Developers
Photoresist Removers

Recipes

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.
Lithography Recipes

Contact Aligners Steppers Flood Expose E-Beam Lithography
Positive Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
AZ4110 R R
AZ4210 R R





AZ4330RS R R
OCG 825-35CS







SPR 950-0.8
SPR 955 CM-0.9







SPR 955 CM-1.8
SPR 220-3.0 R R





SPR 220-7.0 R R
THMR-IP3600 HP D







UV6-0.7
Negative Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
AZ5214-EIR R R
AZnLOF 2020 R R
AZnLOF 2035
AZnLOF 2070
AZnLOF P5510
UVN30-0.5
SU-8 2015
Underlayers SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
PMGI SF-11







PMGI SF-15
LOL 2000
XHRIC-11 (BARC)
AR-2 (BARC)
DS-K 101-307 (BARC)
Overlayers SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
CEM-365 IS
E-Beam Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
??????
???????
Nanoimprint Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
MR-I 7020
Nanonex NX-1020
SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)