InP Etch Rate and Selectivity (InP/SiO2)

1.4 mT, 125/800W, Cl2/H2/Ar flow-rate=6.3/12.7/2 sccm, chuck temperature=200 C, and etch time=90s (Prior to the etch, do O2 plasma chamber clean for 15 minutes, then, chamber coating with the same recipe and a quarter dummy InP on carrier for 15 minutes.
Date	Sample#	InP Etch Rate (um/min)	Selectivity (InP/SiO2)	Profile SEM Picture
10/4/2016	InP#1613	0.92	8.9
12/1/2016	InP#1614	0.96	12.1
12/15/2016	InP#1615	0.91	9.3
1/23/2017	InP#1701	0.93	9.4	[1]
2/7/2017	InP#1702	0.75	7.7	[2]
2/21/2017	InP#1703	0.91	11.3	[3]
3/21/2017	InP#1704	1.01	11.3	[4]
4/20/2017	inP#1705	0.88	10.2	[5]
5/4/2017	InP#1706	0.84	11	[6]
5/19/2017	InP#1707	0.82	9.9	[7]
7/6/2017	InP#1708	0.98	12.1
8/16/2017	InP#1709	0.76	8
8/28/2017	InP#1710	1	11.7
10/11/2017	InP#1711	1	11
10/23/2017	InP#1712	1.11	13.1
11/21/2017	InP#1713	1.04	12.1
12/7/2017	InP#1714	0.96	10.4
1/2/2018	InP#1801	1.44	14.3	[8]
3/1/2018	InP#1802	0.96	9	[9]
4/5/2018	InP#1803	1.05	11.9	[10]
4/10/2018	InP#1804	1.12	12.8	[11]
4/26/2018	InP#1805	1.29	13.6	[12]
5/22/2018	InP#1806	0.88	8.4	[13]
8/7/2018	InP#1807	0.81	8.0	[14]
10/3/2018	InP#1808	1.01	13.7	[15]
12/10/2018	InP#1809	1.01	11.4	[16]
1/31/2019	InP#1901	0.88	9.7	[17][18]