Difference between revisions of "ICP Etching Recipes"

From UCSB Nanofab Wiki
Jump to navigation Jump to search
Line 1: Line 1:
  +
{{recipes|Dry Etching}}
  ⚫
=[[XeF2 Etch (Xetch)]]=
  ⚫
*[[media:06-XeF2-etch-recipe.pdf|Si Etch Recipe]]
  +
  +
  +
  +
  +
 
{{recipes|Dry Etching}}
  
{{recipes|Dry Etching}}
 
=[[ICP Etch 1 (Panasonic E626I)]]=
  
=[[ICP Etch 1 (Panasonic E626I)]]=
Line 21: Line 29:
 
===InP Etch (H<sub>2</sub> Ar)===
  
===InP Etch (H<sub>2</sub> Ar)===
 
*[[media:UNAXIS-VLR-InP-Etch-Ar-200C-Recipe.pdf|InP Etch Recipe (H<sub>2</sub> Ar 200C)]]
  
*[[media:UNAXIS-VLR-InP-Etch-Ar-200C-Recipe.pdf|InP Etch Recipe (H<sub>2</sub> Ar 200C)]]
−  
⚫
=[[XeF2 Etch (Xetch)]]=
  
⚫
*[[media:06-XeF2-etch-recipe.pdf|Si Etch Recipe]]
  

Revision as of 09:21, 24 September 2013

Back to Dry Etching Recipes.

XeF2 Etch (Xetch)



Back to Dry Etching Recipes.

ICP Etch 1 (Panasonic E626I)

SiO2 Etching (Panasonic 1)

Cr Etch (Panasonic 1)

GaN Etch (Panasonic 1)

ICP Etch 2 (Panasonic E640)

SiO2 Etching (Panasonic 2)

ICP-Etch (Unaxis VLR)

InP Etch (Unaxis VLR)

InP Etch

InP Etch (H2 Ar)

Retrieved from "https://wiki.nanofab.ucsb.edu/w/index.php?title=ICP_Etching_Recipes&oldid=3015"