Difference between revisions of "ICP Etching Recipes"
Jump to navigation
Jump to search
| Line 5: | Line 5: | ||
*[[media:Panasonic1-SiO2-Data-Process-Variation-CHF3-revA.pdf|SiO<sub>2</sub> CHF3 Etch Variations]] |
*[[media:Panasonic1-SiO2-Data-Process-Variation-CHF3-revA.pdf|SiO<sub>2</sub> CHF3 Etch Variations]] |
||
| − | ==SiO<sub>2</sub> Pure CHF3 Etch Recipe Variations (Panasonic 1)== |
||
| − | *[[media:==SiO<sub>2</sub> Vertical Etch (Panasonic 1)|SiO<sub>2</sub> Vertical Etch Recipe]] |
||
==Cr Etch (Panasonic 1)== |
==Cr Etch (Panasonic 1)== |
||
Revision as of 11:47, 30 August 2013
Back to Dry Etching Recipes.
ICP Etch 1 (Panasonic E626I)
SiO2 Vertical Etch (Panasonic 1)