Difference between revisions of "ICP Etching Recipes"
Jump to navigation
Jump to search
| Line 18: | Line 18: | ||
===InP Etch (H<sub>2</sub> Ar)=== |
===InP Etch (H<sub>2</sub> Ar)=== |
||
*[[media:UNAXIS-VLR-InP-Etch-Ar-200C-Recipe.pdf|InP Etch Recipe (H<sub>2</sub> Ar 200C)]] |
*[[media:UNAXIS-VLR-InP-Etch-Ar-200C-Recipe.pdf|InP Etch Recipe (H<sub>2</sub> Ar 200C)]] |
||
| + | |||
| + | ==Si Etch (XeF2 Etcher)== |
||
| + | *[[media:|Si Etch Recipe]] |
||
Revision as of 11:33, 17 September 2013
Back to Dry Etching Recipes.
ICP Etch 1 (Panasonic E626I)
SiO2 Etching (Panasonic 1)
Cr Etch (Panasonic 1)
ICP Etch 2 (Panasonic E640)
SiO2 Etching (Panasonic 2)
ICP-Etch (Unaxis VLR)
InP Etch (Unaxis VLR)
InP Etch
InP Etch (H2 Ar)
Si Etch (XeF2 Etcher)
- [[media:|Si Etch Recipe]]