Difference between revisions of "ICP Etching Recipes"

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==GaAs-AlGaAs Etch (Panasonic 1)==
 
==GaAs-AlGaAs Etch (Panasonic 1)==
 +
*[[media:Panasonic1-GaAs-PhotonicCrystal-RIE-Plasma-Nanoscale-Etch-RevA.pdf|GaAs-Nanoscale Etch Recipe - PR mask - Cl<sub>2</sub>-BCl<sub>3</sub>-Ar]]
 
*[[media:12-Plasma_Etching_of_AlGaAs-Panasonic_ICP-1-Etcher.pdf|AlGaAs Etch Recipes - Cl<sub>2</sub>N<sub>2</sub>]]
 
*[[media:12-Plasma_Etching_of_AlGaAs-Panasonic_ICP-1-Etcher.pdf|AlGaAs Etch Recipes - Cl<sub>2</sub>N<sub>2</sub>]]
 
*[[media:Panasonic1-GaAs-Via-Etch-Plasma-RIE-Fast-DRIE-RevA.pdf|GaAs DRIE via Etch Recipes - Cl<sub>2</sub>-BCl<sub>3</sub>-Ar PR passivation]]
 
*[[media:Panasonic1-GaAs-Via-Etch-Plasma-RIE-Fast-DRIE-RevA.pdf|GaAs DRIE via Etch Recipes - Cl<sub>2</sub>-BCl<sub>3</sub>-Ar PR passivation]]

Revision as of 12:40, 24 October 2013

Back to Dry Etching Recipes.

Si Deep RIE (PlasmaTherm/Bosch Etch)

Single-step Si Etching (not Bosch Process!) (Si Deep RIE)

ICP Etch 1 (Panasonic E626I)

SiO2 Etching (Panasonic 1)

SiNx Etching (Panasonic 1)

Al Etch (Panasonic 1)

Cr Etch (Panasonic 1)

Ti Etch (Panasonic 1)

W-TiW Etch (Panasonic 1)

GaAs-AlGaAs Etch (Panasonic 1)

GaN Etch (Panasonic 1)

ICP Etch 2 (Panasonic E640)

SiO2 Etching (Panasonic 2)

SiNx Etching (Panasonic 2)

Al Etch (Panasonic 2)

GaAs Etch (Panasonic 2)

ICP-Etch (Unaxis VLR)

GaAs-AlGaAs Etch (Unaxis VLR)

InP-InGaAs-InAlAs Etch (Unaxis VLR)

GaN Etch (Unaxis VLR)