Difference between revisions of "ICP Etching Recipes"

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==Ti Etch (Panasonic 1)==
 
==Ti Etch (Panasonic 1)==
 
*[[media:Panasonic-1-Ti-Etch-Deep-RevA.pdf|Ti Deep Etch Recipes - Cl<sub>2</sub>Ar]]
 
*[[media:Panasonic-1-Ti-Etch-Deep-RevA.pdf|Ti Deep Etch Recipes - Cl<sub>2</sub>Ar]]
 +
 +
==W-TiW Etch (Panasonic 1)==
 +
*[[media:Panasonic1-TiW-W-Etch-Plasma-RIE-RevA.pdf|Ti-TiW Etch Recipes - SF<sub>6</sub>Ar]]
  
 
==AlGaAs Etch (Panasonic 1)==
 
==AlGaAs Etch (Panasonic 1)==

Revision as of 15:11, 23 October 2013

Back to Dry Etching Recipes.

Si Deep RIE (PlasmaTherm/Bosch Etch)

Single-step Si Etching (not Bosch Process!) (Si Deep RIE)

ICP Etch 1 (Panasonic E626I)

SiO2 Etching (Panasonic 1)

SiNx Etching (Panasonic 1)

Al Etch (Panasonic 1)

Cr Etch (Panasonic 1)

Ti Etch (Panasonic 1)

W-TiW Etch (Panasonic 1)

AlGaAs Etch (Panasonic 1)

GaN Etch (Panasonic 1)

ICP Etch 2 (Panasonic E640)

SiO2 Etching (Panasonic 2)

SiNx Etching (Panasonic 2)

Al Etch (Panasonic 2)

GaAs Etch (Panasonic 2)

ICP-Etch (Unaxis VLR)

GaAs-AlGaAs Etch (Unaxis VLR)

InP-InGaAs-InAlAs Etch (Unaxis VLR)

GaN Etch (Unaxis VLR)