Difference between revisions of "ICP Etching Recipes"

From UCSB Nanofab Wiki
Jump to navigation Jump to search
Line 2: Line 2:
 
=[[Si Deep RIE (PlasmaTherm/Bosch Etch)]]=
 
=[[Si Deep RIE (PlasmaTherm/Bosch Etch)]]=
 
==Single-step Si Etching (not Bosch Process!) (Si Deep RIE)==
 
==Single-step Si Etching (not Bosch Process!) (Si Deep RIE)==
*[[media:10-Si_Etch_using_DRIE_(single-step).pdf|Single-step Si Vertical Etch Recipe - SF<sub>6</sub>C<sub>4</sub>F<sub>8</sub>Ar]]
+
*[[media:10-Si_Etch_using_DRIE_(single-step).pdf|Single-step Si Vertical Etch Recipe - SF<sub>6</sub>-C<sub>4</sub>F<sub>8</sub>-Ar]]
  
 
=[[ICP Etch 1 (Panasonic E626I)]]=
 
=[[ICP Etch 1 (Panasonic E626I)]]=

Revision as of 08:30, 23 October 2013

Back to Dry Etching Recipes.

Si Deep RIE (PlasmaTherm/Bosch Etch)

Single-step Si Etching (not Bosch Process!) (Si Deep RIE)

ICP Etch 1 (Panasonic E626I)

SiO2 Etching (Panasonic 1)

SiNx Etching (Panasonic 1)

Al Etch (Panasonic 1)

Cr Etch (Panasonic 1)

Ti Etch (Panasonic 1)

AlGaAs Etch (Panasonic 1)

GaN Etch (Panasonic 1)

ICP Etch 2 (Panasonic E640)

SiO2 Etching (Panasonic 2)

SiNx Etching (Panasonic 2)

Al Etch (Panasonic 2)

GaAs Etch (Panasonic 2)

ICP-Etch (Unaxis VLR)

GaAs-AlGaAs Etch (Unaxis VLR)

InP-InGaAs-InAlAs Etch (Unaxis VLR)

GaN Etch (Unaxis VLR)