Difference between revisions of "ICP Etching Recipes"

From UCSB Nanofab Wiki
Jump to navigation Jump to search
Line 39: Line 39:
==GaAs Etch (Panasonic 2)==
==GaAs Etch (Panasonic 2)==
*[[media:16-GaAs_etch-ICP-2.pdf|GaAs Etch Recipes - Panasonic 2 ]]
*[[media:16-GaAs_etch-ICP-2.pdf|GaAs Etch Recipes - Panasonic 2 - Cl<sub>2</sub>N<sub>2</sub>]]
=[[ICP-Etch (Unaxis VLR)]]=
=[[ICP-Etch (Unaxis VLR)]]=

Revision as of 08:25, 23 October 2013

Back to Dry Etching Recipes.

Si Deep RIE (PlasmaTherm/Bosch Etch)

Single-step Si Etching (not Bosch Process!) (Si Deep RIE)

ICP Etch 1 (Panasonic E626I)

SiO2 Etching (Panasonic 1)

SiNx Etching (Panasonic 1)

Al Etch (Panasonic 1)

Cr Etch (Panasonic 1)

Ti Etch (Panasonic 1)

AlGaAs Etch (Panasonic 1)

GaN Etch (Panasonic 1)

ICP Etch 2 (Panasonic E640)

SiO2 Etching (Panasonic 2)

SiNx Etching (Panasonic 2)

Al Etch (Panasonic 2)

GaAs Etch (Panasonic 2)

ICP-Etch (Unaxis VLR)

GaAs-AlGaAs Etch (Unaxis VLR)

InP-InGaAs-InAlAs Etch (Unaxis VLR)

GaN Etch (Unaxis VLR)