Difference between revisions of "ICP Etching Recipes"

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=[[ICP-Etch (Unaxis VLR)]]=
 
=[[ICP-Etch (Unaxis VLR)]]=
===GaAs-AlGaAs Etch ===
+
==GaAs-AlGaAs Etch (Unaxis VLR) ==
 
*[[media:15-GaAs_etch-Unaxis_ICP_etcher.pdf|GaAs Etch Recipe (30C)]]
 
*[[media:15-GaAs_etch-Unaxis_ICP_etcher.pdf|GaAs Etch Recipe (30C)]]
 
*[[media:14-AlAs-GR-cal_etch-Unaxis_ICP_etcher.pdf|AlGaAs Etch Recipe (30C)]]
 
*[[media:14-AlAs-GR-cal_etch-Unaxis_ICP_etcher.pdf|AlGaAs Etch Recipe (30C)]]

Revision as of 08:23, 23 October 2013

Back to Dry Etching Recipes.

Si Deep RIE (PlasmaTherm/Bosch Etch)

Single-step Si Etching (not Bosch Process!) (Si Deep RIE)

ICP Etch 1 (Panasonic E626I)

SiO2 Etching (Panasonic 1)

SiNx Etching (Panasonic 1)

Al Etch (Panasonic 1)

Cr Etch (Panasonic 1)

Ti Etch (Panasonic 1)

AlGaAs Etch (Panasonic 1)

GaN Etch (Panasonic 1)

ICP Etch 2 (Panasonic E640)

SiO2 Etching (Panasonic 2)

SiNx Etching (Panasonic 2)

Al Etch (Panasonic 2)

GaAs Etch (Panasonic 2)

ICP-Etch (Unaxis VLR)

GaAs-AlGaAs Etch (Unaxis VLR)

InP-InGaAs-InAlAs Etch (Unaxis VLR)

GaN Etch (Unaxis VLR)