Difference between revisions of "ICP Etching Recipes"

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==SiN<sub>x</sub> Etching (Panasonic 1)==
 
==SiN<sub>x</sub> Etching (Panasonic 1)==
*[[media:Panasonic1-SiN-Etch-Plasma-CF4-O2-ICP-revA.pdf|SiN<sub>x</sub> Etch Rates and Variations - CF<sub>4</sub>]-O<sub>2</sub>]
+
*[[media:Panasonic1-SiN-Etch-Plasma-CF4-O2-ICP-revA.pdf|SiN<sub>x</sub> Etch Rates and Variations - CF<sub>4</sub>-O<sub>2</sub>]]
  
 
==Al Etch (Panasonic 1)==
 
==Al Etch (Panasonic 1)==

Revision as of 14:05, 22 October 2013

Back to Dry Etching Recipes.

Si Deep RIE (PlasmaTherm/Bosch Etch)

Single-step Si Etching (not Bosch Process!) (Si Deep RIE)

ICP Etch 1 (Panasonic E626I)

SiO2 Etching (Panasonic 1)

SiNx Etching (Panasonic 1)

Al Etch (Panasonic 1)

Cr Etch (Panasonic 1)

Ti Etch (Panasonic 1)

AlGaAs Etch (Panasonic 1)

GaN Etch (Panasonic 1)

ICP Etch 2 (Panasonic E640)

SiO2 Etching (Panasonic 2)

SiNx Etching (Panasonic 2)

Al Etch (Panasonic 2)

GaAs Etch (Panasonic 2)

ICP-Etch (Unaxis VLR)

GaAs Etch

AlGaAs Etch

InP Etch (Unaxis VLR)

InP Etch

InP Etch (H2 Ar)

GaN Etch (Unaxis VLR)