Difference between revisions of "ICP Etching Recipes"
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=[[ICP Etch 1 (Panasonic E626I)]]= |
=[[ICP Etch 1 (Panasonic E626I)]]= |
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==SiO<sub>2</sub> Etching (Panasonic 1)== |
==SiO<sub>2</sub> Etching (Panasonic 1)== |
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| − | *[[media:Panasonic1-SiO-Etch.pdf|SiO<sub>2</sub> Vertical Etch Recipe Parameters]] |
+ | *[[media:Panasonic1-SiO-Etch.pdf|SiO<sub>2</sub> Vertical Etch Recipe Parameters - CHF<sub>3</sub>]] |
| − | *[[media:Panasonic1-SiO2-Data-Process-Variation-CHF3-revA.pdf|SiO<sub>2</sub> |
+ | *[[media:Panasonic1-SiO2-Data-Process-Variation-CHF3-revA.pdf|SiO<sub>2</sub> CHF<sub>3</sub> Etch Variations]] |
==Al Etch (Panasonic 1)== |
==Al Etch (Panasonic 1)== |
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Revision as of 13:30, 22 October 2013
Back to Dry Etching Recipes.