Difference between revisions of "ICP Etching Recipes"

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==SiO<sub>2</sub> Etching (Panasonic 2)==
 
==SiO<sub>2</sub> Etching (Panasonic 2)==
 
*[[media:Panasonic2-SiOx-Recipe.pdf|SiO<sub>2</sub> Vertical Etch Recipe]]
 
*[[media:Panasonic2-SiOx-Recipe.pdf|SiO<sub>2</sub> Vertical Etch Recipe]]
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==Al Etch (Panasonic 2)==
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*[[media:Panasonic-1-Al-Etch-RevA.pdf|Al Etch Recipes - use panasonic 1 parameters, etch rate 50% higher]]
  
 
=[[ICP-Etch (Unaxis VLR)]]=
 
=[[ICP-Etch (Unaxis VLR)]]=

Revision as of 13:03, 27 September 2013