Difference between revisions of "ICP Etching Recipes"

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{{recipes|Dry Etching}}
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=[[XeF2 Etch (Xetch)]]=
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*[[media:06-XeF2-etch-recipe.pdf|Si Etch Recipe]]
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{{recipes|Dry Etching}}
 
{{recipes|Dry Etching}}
 
=[[ICP Etch 1 (Panasonic E626I)]]=
 
=[[ICP Etch 1 (Panasonic E626I)]]=
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===InP Etch (H<sub>2</sub> Ar)===
 
===InP Etch (H<sub>2</sub> Ar)===
 
*[[media:UNAXIS-VLR-InP-Etch-Ar-200C-Recipe.pdf|InP Etch Recipe (H<sub>2</sub> Ar 200C)]]
 
*[[media:UNAXIS-VLR-InP-Etch-Ar-200C-Recipe.pdf|InP Etch Recipe (H<sub>2</sub> Ar 200C)]]
 
=[[XeF2 Etch (Xetch)]]=
 
*[[media:06-XeF2-etch-recipe.pdf|Si Etch Recipe]]
 

Revision as of 08:21, 24 September 2013