ICP Etch 1 (Panasonic E626I)

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Revision as of 10:49, 31 May 2018 by John d (talk | contribs) (updates, listed SEMI-std. flats)
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ICP Etch 1 (Panasonic E626I)
ICP2.jpg
Tool Type Dry Etch
Location Bay 2
Supervisor Don Freeborn
Supervisor Phone (805) 893-7975
Supervisor E-Mail dfreeborn@ece.ucsb.edu
Description ?
Manufacturer Panasonic Factory Solutions, Japan
Dry Etch Recipes
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About

This is a three-chamber tool for etching of a variety of materials.

Chamber one is configured as an ICP etching tool with 1000 W ICP power, 500 W RF substrate power, and RT - 80°C operation with back-side He cooling and an electrostatic chuck to maintain controlled surface temperatures during etching.

This chamber has the following gas sources: Cl2, BCl3, N2, and O2 (CHF3 or Ar), (CF4 or SF6), where two of the lines must be manually switched between the two options shown (gasses can't be used simultaneously).

The system can be used to etch a variety of materials from SiO2 to metals to compound semiconductors. The chamber is evacuated with a 2000 lpm Osaka Vacuum magnetically levitated turbo pump, and is load-locked for fast pump down.

Chamber two is a 2000 W ICP chamber configures for plasma "ashing" of photoresist and other materials such as BCB. The substrate is not biased and the chamber has CF4 and O2 for the gases.

Chamber three is a DI rinsing chamber for rinsing off any etch byproducts before removing the sample from the system.

The system accepts 6” wafers with SEMI-std. flats. Users often mount smaller pieces to the wafers, usually with easily removable oil to improve uniform heatsinking. In Automatic mode, multiple wafers can be run through automatically with the cassette-based system.

Detailed Specifications

  • 1000 W ICP source, 500 W RF Sample Bias Source in etching chamber
  • RT - 80°C sample temperature for etching
  • Multiple 6” diameter wafer capable system
  • Pieces possible by mounting to 6” wafer

Etch Chamber:

  • Optimal Emission Monitoring
  • Etch pressure from 0.1 Pa to 5 Pa (0.75 mT - 37.5 mT)
  • Cl2, BCl3, N2, and O2 (CHF3 or Ar), (CF4 or SF6) in etch chamber

Ashing Chamber:

  • 2000 W ICP ashing chamber
  • RT - 250°C sample temperature for ashing
  • Ashing pressures 50 mT - 500 mT
  • O2, N2, CF4, H2O Vapor for ashing chamber

Documentation