Difference between revisions of "Filmetrics F40-UV Quick Start"

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(initial quick start. numbering is kinda messe dup, wrote in 10 min!)
 
(image reflow editing)
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Demis D. John, UCSB NanoFab, Updated: 2018-07-17
Thin-Film Analyzer, microscope mounted
 
[[File:Filmetrics F40-UV - system pic 01.jpg|alt=Photo of the Filmetrics F40-UV Measurement System|none|thumb|300x300px|Photo of the Filmetrics F40-UV Measurement System]]
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Optical Thin-Film Analyzer, microscope mounted[[File:Filmetrics F40-UV - system pic 01.jpg|alt=Photo of the Filmetrics F40-UV Measurement System|none|thumb|300x300px|Photo of the Filmetrics F40-UV Measurement System]]
   
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=== Startup and Calibration ===
# Turn on light source to about 12 o'clock
 
## Optionally wait a few min for light intensity to stabilize. [[File:Filmetrics F40-UV - light source setting 02.jpg|none|thumb|200x200px|Set the light source to 12 o'clock]]
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# Turn on light source to about 12 o'clock [[File:Filmetrics F40-UV - light source setting 02.jpg|thumb|150x150px|Set the light source to 12 o'clock]]
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## Optionally wait a few min for light intensity to stabilize.
# Open Software "FILMeasure". Activate "Live Video" Tab.
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# Open Software "'''FILMeasure'''". Activate "'''Live Video'''" Tab.
# Load "Filmetrics Focus/Reference Wafer" onto stage, avoiding hole
 
# [[File:Filmetrics F40-UV - wafer placement 03.jpg|none|thumb|200x200px|Approximate placement of a 4-inch wafer]]
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# Load "Filmetrics Focus/Reference Wafer" onto stage, avoiding hole [[File:Filmetrics F40-UV - wafer placement 03.jpg|thumb|200x200px|Approximate placement of a 4-inch wafer]]
 
# Rotate uScope turret to desired microscope objective
 
# Rotate uScope turret to desired microscope objective
# Focus on wafer - use edge of blue (SiO2) features.
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# Focus on wafer - use edge of blue (SiO2) features
# In "Live Video" tab, make sure wafer is in focus, and black spot (measurement region) is on grey Silicon region only.
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# In "'''Live Video'''" tab, make sure wafer is in focus, and black spot (measurement region) is on grey Silicon region only. [[File:Filmetrics F40-UV - focus on bare silicon 04.jpg|thumb|200x200px|Focus on the bare silicon in the FILMeasure software, for Si Reference scan|alt="Live Video" tab showing focused wafer]]
# [[File:Filmetrics F40-UV - focus on bare silicon 04.jpg|none|thumb|200x200px|Focus on teh bare silicon in the FILMeasure software]]
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# Set software to use appropriate Objective calibration from dropdown list, eg. "10x" [[File:Filmetrics F40-UV - objective choice 05.jpg|thumb|200x200px|Choose objective calibration in software]]
 
# Click '''[Baseline…]''', set to "'''Si'''" and '''[Take Reflectance Standard]''' & '''[Next-->]'''
# Set software Objective to appropriate dropdown, eg. "10x"
 
 
## If a warning about intensity change pops up, ignore it and hit '''[OK]'''
# [[File:Filmetrics F40-UV - objective choice 05.jpg|none|thumb|200x200px|Choose objective calibration in software]]
 
# Click [Baseline…], set to "Si" and [Take Reflectance Standard] & [Next-->]
 
## If a warning about intensity change pops up, ignore it and hit [OK]
 
 
# Move stage so microscope shoots through hole in stage
 
# Move stage so microscope shoots through hole in stage
 
# Click '''[Take Background]''' & '''[Finish]'''
# [[File:Filmetrics F40-UV - dark meas thru hole 06.jpg|alt=Take Background measurement by aiming objective through the hole in the stage.|none|thumb|200x200px|Take Background measurement by aiming objective through the hole in the stage.]]
 
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# Click [Take Background] & [Finish]
 
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# Focus on your sample/feature of interest & place the black aperture spot on the measurement region. Here we will measure the SiO2 on the Filmetrics Reference Wafer. It is ok to change the objective, just make sure same calibrated objective is chosen before measuring.
 
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=== Sample Measurement ===
# Select a recipe from the Dropdown list (ok to discard changes), and Click [Edit Recipe…] to set the layers to approximately what you expect to measure.
 
 
# Focus on your sample/feature of interest & place the black aperture spot on the measurement region. Here we will measure the SiO<sub>2</sub> on the Filmetrics Reference Wafer.
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## It is ok to change the objective, just make sure same calibrated objective is chosen before measuring.
 
# Select a recipe from the Dropdown list (ok to ''discard changes''), and Click '''[Edit Recipe…]''' to set the layers to approximately what you expect to measure.
 
## Enable the checkbox next to the thicknesses you want it to measure/calculate, and Disable checkboxes next to any values you want the software to use pre-programmed values for.
 
## Enable the checkbox next to the thicknesses you want it to measure/calculate, and Disable checkboxes next to any values you want the software to use pre-programmed values for.
 
## Optionally enable the check box next to n & k - but only if you know what refractive index and extinction you expect.  If you don't know these values, Disable the "Meas" checkbox for n & k.  When enabled, you'll want to make sure the refractive index (n) is close to the expected value.
 
## Optionally enable the check box next to n & k - but only if you know what refractive index and extinction you expect.  If you don't know these values, Disable the "Meas" checkbox for n & k.  When enabled, you'll want to make sure the refractive index (n) is close to the expected value.
# '''Re-Select the correct microscope objective''' & Click [Measure]
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# '''Re-Select the correct microscope objective''' & Click '''[Measure]'''
 
# Make sure the blue (measured) and red (calc'd) curves have reasonably good agreement.  Goodness of fit >90% is pretty good.  Refractive Index (n), if calc'd, should be near the expected value for the film.
 
# Make sure the blue (measured) and red (calc'd) curves have reasonably good agreement.  Goodness of fit >90% is pretty good.  Refractive Index (n), if calc'd, should be near the expected value for the film.
## If fit is bad (low GOF) or refractive index is far off, this measurement is inaccurate.  If Red curve is much too wavy or too smooth, then your guess of thickness was not close enough - [Edit Recipe] & [Analyze] again until you get a good fit.
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## If fit is bad (low GOF) or refractive index is far off, this measurement is inaccurate.  If Red curve is much too wavy or too smooth, then your guess of thickness was not close enough - '''[Edit Recipe]''' & '''[Analyze]''' again until you get a good fit. [[File:Filmetrics F40-UV - spectrum curve fit 07.jpg|alt=example spectrum curve fit|none|thumb|300x300px|A good fit should show the Calculated (red) curve overlay on top of the Measureed (blue) curve.]]
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# [[File:Filmetrics F40-UV - spectrum curve fit 07.jpg|alt=example spectrum curve fit|none|thumb|300x300px|A good fit should show the Calculated (red) curve overlay on top of the Measureed (blue) curve.]]
 
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=== ShutDown ===
 
# Set objective to 10x & Remove Sample
 
# Set objective to 10x & Remove Sample
 
# '''TURN OFF THE LIGHT SOURCE'''
 
# '''TURN OFF THE LIGHT SOURCE'''

Revision as of 18:40, 17 July 2018

Demis D. John, UCSB NanoFab, Updated: 2018-07-17

Optical Thin-Film Analyzer, microscope mounted

Photo of the Filmetrics F40-UV Measurement System
Photo of the Filmetrics F40-UV Measurement System

Startup and Calibration

  1. Turn on light source to about 12 o'clock
    Set the light source to 12 o'clock
    1. Optionally wait a few min for light intensity to stabilize.
  2. Open Software "FILMeasure". Activate "Live Video" Tab.
  3. Load "Filmetrics Focus/Reference Wafer" onto stage, avoiding hole
    Approximate placement of a 4-inch wafer
  4. Rotate uScope turret to desired microscope objective
  5. Focus on wafer - use edge of blue (SiO2) features
  6. In "Live Video" tab, make sure wafer is in focus, and black spot (measurement region) is on grey Silicon region only.
    "Live Video" tab showing focused wafer
    Focus on the bare silicon in the FILMeasure software, for Si Reference scan
  7. Set software to use appropriate Objective calibration from dropdown list, eg. "10x"
    Choose objective calibration in software
  8. Click [Baseline…], set to "Si" and [Take Reflectance Standard] & [Next-->]
    1. If a warning about intensity change pops up, ignore it and hit [OK]
  9. Move stage so microscope shoots through hole in stage
  10. Click [Take Background] & [Finish]


Sample Measurement

  1. Focus on your sample/feature of interest & place the black aperture spot on the measurement region. Here we will measure the SiO2 on the Filmetrics Reference Wafer.
    1. It is ok to change the objective, just make sure same calibrated objective is chosen before measuring.
  2. Select a recipe from the Dropdown list (ok to discard changes), and Click [Edit Recipe…] to set the layers to approximately what you expect to measure.
    1. Enable the checkbox next to the thicknesses you want it to measure/calculate, and Disable checkboxes next to any values you want the software to use pre-programmed values for.
    2. Optionally enable the check box next to n & k - but only if you know what refractive index and extinction you expect.  If you don't know these values, Disable the "Meas" checkbox for n & k.  When enabled, you'll want to make sure the refractive index (n) is close to the expected value.
  3. Re-Select the correct microscope objective & Click [Measure]
  4. Make sure the blue (measured) and red (calc'd) curves have reasonably good agreement.  Goodness of fit >90% is pretty good.  Refractive Index (n), if calc'd, should be near the expected value for the film.
    1. If fit is bad (low GOF) or refractive index is far off, this measurement is inaccurate.  If Red curve is much too wavy or too smooth, then your guess of thickness was not close enough - [Edit Recipe] & [Analyze] again until you get a good fit.
      example spectrum curve fit
      A good fit should show the Calculated (red) curve overlay on top of the Measureed (blue) curve.

ShutDown

  1. Set objective to 10x & Remove Sample
  2. TURN OFF THE LIGHT SOURCE
    1. The halogen light source does die eventually, so prolong the life by turning off when not in use.
    2. If doing repeated measurements, leave a note with date/time.