Difference between revisions of "Filmetrics F40-UV Microscope-Mounted"
Jump to navigation
Jump to search
(added measurement screenshot) |
(→Screenshots + Examples: Added example of inspecting for SiO2 dry-etch completion.) |
||
| Line 23: | Line 23: | ||
== Screenshots + Examples == |
== Screenshots + Examples == |
||
| − | [[File:Filmetrics_F40-UV_-_Measurement_screenshot_on_metal_pad_01.PNG|alt=example spectrum curve fit|none|thumb|500x500px|Screenshot showing microscope view and optical spectrum/curve fitting of the film thickness.]] |
+ | [[File:Filmetrics_F40-UV_-_Measurement_screenshot_on_metal_pad_01.PNG|alt=example spectrum curve fit|none|thumb|500x500px|Screenshot showing 10x microscope view and optical spectrum/curve fitting of the SiO2 film thickness on top of Platinum contact metal.]] |
[[File:Filmetrics F40-UV - spectrum curve fit 07.jpg|alt=example spectrum curve fit|none|thumb|300x300px|A good fit should show the Calculated (red) curve overlay on top of the Measureed (blue) curve.]] |
[[File:Filmetrics F40-UV - spectrum curve fit 07.jpg|alt=example spectrum curve fit|none|thumb|300x300px|A good fit should show the Calculated (red) curve overlay on top of the Measureed (blue) curve.]] |
||
| + | {| class="wikitable" |
||
| + | |+Using the F40-UV to check whether a dry etch is complete. |
||
| + | ![[File:Filmetrics F40-UV - SiO Etch 4m+4m - Incomplete Etch.png|alt=Example Screenshot of incomplete SiO2 etch|none|thumb|400x400px|Incomplete Dry-Etch, showing some residual SiO2 left.]] |
||
| + | ![[File:Filmetrics F40-UV - 2018-11-08 - SiO Etch 4m+4m+1m - Fully Removed.png|alt=Example screenshot of fully removed SiO2 etch|none|thumb|400x400px|After re-etching, measurement shows bad fit (red and blue curves), indicating the SiO2 film has been fully removed.]] |
||
| + | |} |
||
Revision as of 21:39, 23 May 2019
|
About
The Filmetrics F40-UV is a microscope-mounted thin-film measurement system, allowing you to non-destructively measure thin-film thicknesses in small (patterned) areas on your sample. It is an optical reflectometer, acquiring reflection spectra between 400-900nm optical wavelengths (Vis to Near-IR) with a regular halogen microscope light source. The Filmetrics software then performs curve-fitting to determine the thickness and/or refractive index of the measured films.
Capabilities
- Measure optically transparent thin-films down to ~30nm thickness.
- Microscope Objectives: 10x, 20x, 50x, 100x, 150x
- Acquire Optical Reflection Spectra from 400-900nm
- Spectrometer/Detector is capable of detecting down to UV ~190nm, but light source does not support this wavelength.
- Reflectivity curve-fitting for thin-film thickness analysis, supporting many common materials (Si3N4, SiO2 dielectrics, Si, GaAs, InP semiconductors, metals, photoresists etc.)
