Difference between revisions of "Film Stress (Tencor Flexus)"

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|super=Mike Silva
|super=Mike Silva
|location=Bay 5
|location=Bay 4
|description = Film Stress Measurement system
|description = Film Stress Measurement system

Revision as of 10:03, 22 August 2012

Film Stress (Tencor Flexus)
Tool Type Inspection, Test and Characterization
Location Bay 4
Supervisor Mike Silva
Supervisor Phone (805) 893-3096
Supervisor E-Mail silva@ece.ucsb.edu
Description Film Stress Measurement system
Manufacturer Tencor


The Flexus instrument is used to measure the stress introduced onto a wafer after thin-film deposition by measuring local curvature of a wafer. The system uses a scanning laser detector configuration to measure the surface position of a wafer across its diameter. With automatic rotational control, a 3-D map can also be obtained. By comparing before and after measurements of the sample, the local stress of the sample can be calculated from the local curvature. The stage can also be heated up to 500°C to measure thermal mismatch of the thin films with the substrate.

Equipment Specifications

  • RT to 500°C operation
  • Windows 3.xx control and file storing
  • 3-D mapping
  • 4" wafers
  • Laser/Detector Scanning Configuration