Field Emission SEM 1 (FEI Sirion)

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Field Emission SEM 1 (FEI Sirion)
Location Bay 1
Tool Type Inspection, Test and Characterization
Manufacturer FEI
Description FEI Thermal Field Emission SEM

Sirion with EDAX Falcon EDX system

Primary Supervisor Aidan Hopkins
(805) 893-2343

Secondary Supervisor

Bill Mitchell

Recipes N/A

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This system is a tri-use FESEM imaging and inspection system, EDX elemental analysis system, and small-area electron beam lithography system. The system uses a thermal field emission source to provide a stable high beam current that is necessary for ebeam lithography applications. The accelerating voltage can be adjusted from 200V to 30kV. Using the UHR-mode of the imaging system, less than 5 nm features can be resolved at magnifications up to ~1,000,000 in as little as 10-15 minutes for experienced users. The user interface is extremely user friendly. Elemental analysis and maps linked to the SEM images can be generated with the EDAX-Falcon software. Locally-aligned electron beam lithography can be done to ~15 nm resolution through the integrated Nabity v9 hardware and software. A beam blanker operating at ~1MHz is used to shutter the electron beam on and off for writing applications. Special training, above and beyond SEM training, is required for doing lithography or EDX work. Large area and precision electron-beam writing jobs should be done on our JEOL electron beam writing system.

The Hummer coater is used to deposit a thin AuPd on your samples, to reduce electrical charging of insulating samples (such as SiO2 substrates, or thick >1µm layers of SiO2 or PR).

Control System

  • The microscope is controlled completely by a mouse; optional knob box included
  • Control software is run under MS-Windows Graphic User Interface and allow concentration on the specimen rather than microscope controls
  • Computer-assisted alignment of the software throughout the range of spotsize and high voltage is present

Detailed Specifications

  • Thermal Field Emission Source for stable writing current
  • Resolution down to below 5 nm
  • Very user friendly software for quick, high resolution imaging
  • Nabity v9 lithography system for ~15 nm resolution writing over small areas
  • EDAX Falcon EDX system for elemental analysis and mapping

Thermal Field Emission Source

  • Resolution of 1.5 nm at > 10 kV, 2.5 nm at 1 kV, and 3.5 nm at 500 eV
  • Accelerating voltage is continuously variable between 200 V and 30 kV with automatic adaptation of focus, magnification and image shift
  • Beam current is software adjustable with maximum beam current > 25 nA at 10 kV and > 0.5 pA at 500 eV
  • Beam current stability is less than 0.4% / 10 hours
  • Objective lens with dual mode of operation: High Resolution (HR) mode and Ultra High Resolution (UHR) mode, both operational over a wide range of working distances
  • Focus range is from 0 to 45 mm FWD in the HR mode and 1 to 7 mm FWD at 1 kV and 5 to 7 mm at 20 kV in the UHR mode
  • There is a dedicated mouse function for focus with focus sensitivity automatically adjusted to magnification
  • Dynamic focus up to ±80° of specimen tilt
  • 8-pole electromagnetic stigmator with simultaneous X-Y control and visualization mode. Automatic stigmation standard
  • Continuous electronic image shift up to ±20 µm XY in HR mode and ±5 µm in UHR mode is possible; the image shift's sensitivity is automatically adjusted to magnification and direction consistent and independent of scan rotation
  • Continuous magnification between 40x and 400,000x at eucentric WD and all scan rates in HR mode and 2500x to 1,200,000x in UHR mode
  • 12 selectable line times from 0.21 ms to 240 ms per line; 8 selectable frames from 484 to 3872 lines per picture (total of 96 combinations); TV mode
  • Digital line scan with 3 selections of points per line: 180, 360 or 720 and 6 dwell times from 30 to 1000 ms; Maximum line time 12 min.
  • Scanning modes: full frame, adjustable reduced raster, line X, spot
  • Ion getter pumps for gun and intermediate vacuum with column separation valve and maglev turbomolecular pump for chamber pumping
  • Analytical specimen chamber with inside diameter of 284 mm and 9 ports
  • 50 x 50 mm 5-axes motorized stage; a high precision eucentric tilt specimen stage with motorized X, Y, Z, rotation and tilt; control and readout of these movements is via the XL Graphics User Interface
  • X,Y = 50 mm
  • Z = 25 mm external adjustment range and 25 mm internal adjustment range
  • Tilt = -15° to +75° at 10 mm FWD
  • Graphics includes micron-marker and databar containing user selected microscope parameters; an enhanced graphics editor is available
  • Image transfer in TIFF (8 or 16 bit), BMP, or JPEG format
  • Unit Equipped with EDAX Falcon EDS System for elemental analysis of materials
  • Simultaneous imaging and EDS at 5 mm WD with high EDS TOA of 35 degrees