https://wiki.nanofab.ucsb.edu/w/index.php?title=E-Beam_Lithography_System_(JEOL_JBX-6300FS)&feed=atom&action=history
E-Beam Lithography System (JEOL JBX-6300FS) - Revision history
2024-03-29T02:20:12Z
Revision history for this page on the wiki
MediaWiki 1.35.13
https://wiki.nanofab.ucsb.edu/w/index.php?title=E-Beam_Lithography_System_(JEOL_JBX-6300FS)&diff=160201&oldid=prev
John d: added "JBX-" to model #
2022-08-15T06:28:12Z
<p>added "JBX-" to model #</p>
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<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 06:28, 15 August 2022</td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|description = Vector Scan Electron Beam Lithography System</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|manufacturer = JEOL USA Inc</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|manufacturer = JEOL USA Inc</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>|model = 6300FS</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>|model = <ins class="diffchange diffchange-inline">JBX-</ins>6300FS</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|materials = </div></td>
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John d
https://wiki.nanofab.ucsb.edu/w/index.php?title=E-Beam_Lithography_System_(JEOL_JBX-6300FS)&diff=158586&oldid=prev
John d: added wafer load size
2020-11-05T17:52:21Z
<p>added wafer load size</p>
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<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 17:52, 5 November 2020</td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Maximum deflector scan speed = 25MHz (=> 40ns/pixel minimum dwell time)</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Maximum deflector scan speed = 25MHz (=> 40ns/pixel minimum dwell time)</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*150x150 mm writable area; stage position control to 0.6nm accuracy (λ/1024); 10mm/s maximum stage speed</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*150x150 mm writable area<ins class="diffchange diffchange-inline"> and wafer load size</ins>; stage position control to 0.6nm accuracy (λ/1024); 10mm/s maximum stage speed</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Dynamic Focus and Stigmation Control for improved writing performance across the entire scan field.</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Dynamic Focus and Stigmation Control for improved writing performance across the entire scan field.</div></td>
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John d
https://wiki.nanofab.ucsb.edu/w/index.php?title=E-Beam_Lithography_System_(JEOL_JBX-6300FS)&diff=158382&oldid=prev
John d: deleted erroneous fiels in {tool} template
2020-09-14T04:08:34Z
<p>deleted erroneous fiels in {tool} template</p>
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<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 04:08, 14 September 2020</td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|type = Lithography</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|type = Lithography</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|super= Bill Mitchell</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|super= Bill Mitchell</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>|phone= (805)893-4974</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|location=Bay 7</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|location=Bay 7</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>|email=mitchell@ece.ucsb.edu</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|description = Vector Scan Electron Beam Lithography System</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|description = Vector Scan Electron Beam Lithography System</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|manufacturer = JEOL USA Inc</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|manufacturer = JEOL USA Inc</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>|model = 6300FS</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|materials = </div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|materials = </div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|toolid=34</div></td>
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John d
https://wiki.nanofab.ucsb.edu/w/index.php?title=E-Beam_Lithography_System_(JEOL_JBX-6300FS)&diff=154506&oldid=prev
Mitchell b: /* Detailed Specifications */
2017-10-31T17:43:00Z
<p><span dir="auto"><span class="autocomment">Detailed Specifications</span></span></p>
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<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 17:43, 31 October 2017</td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Dynamic Focus and Stigmation Control for improved writing performance across the entire scan field.</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Dynamic Focus and Stigmation Control for improved writing performance across the entire scan field.</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*UNIX computer controlled</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*UNIX computer controlled</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Advanced Fracturing software available (Layout BEAMER from GeniSys, Inc)</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Advanced Fracturing software available (Layout BEAMER from GeniSys, Inc)</div></td>
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Mitchell b
https://wiki.nanofab.ucsb.edu/w/index.php?title=E-Beam_Lithography_System_(JEOL_JBX-6300FS)&diff=154505&oldid=prev
Mitchell b: /* Detailed Specifications */
2017-10-31T17:41:34Z
<p><span dir="auto"><span class="autocomment">Detailed Specifications</span></span></p>
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<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 17:41, 31 October 2017</td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Utilizes a “Hi-brightness” thermal field emission electron source (ZnO/W) with a minimum spot-size at the substrate of 2nm; operates at 100kV only</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Utilizes a “Hi-brightness” thermal field emission electron source (ZnO/W) with a minimum spot-size at the substrate of 2nm; operates at 100kV only</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Unique two lens/deflector scanning system:</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Unique two lens/deflector scanning system:</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>**<u>4th lens</u> => <del class="diffchange diffchange-inline"> 7</del>-<del class="diffchange diffchange-inline">8 nm</del> minimum <del class="diffchange diffchange-inline">linewidth</del>, <del class="diffchange diffchange-inline">0</del>.<del class="diffchange diffchange-inline">125nm</del> scan step resolution, <del class="diffchange diffchange-inline">62.5x62.5um</del> scan field</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>**<u>4th lens</u> => <ins class="diffchange diffchange-inline">20</ins>-<ins class="diffchange diffchange-inline">25nm</ins> minimum <ins class="diffchange diffchange-inline">line-width</ins>, <ins class="diffchange diffchange-inline">1</ins>.<ins class="diffchange diffchange-inline">000nm</ins> scan step resolution, <ins class="diffchange diffchange-inline">500 x 500um</ins> scan field</div></td>
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<tr>
<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>**<u>5th lens</u> => <del class="diffchange diffchange-inline">20</del>-<del class="diffchange diffchange-inline">25nm</del> minimum <del class="diffchange diffchange-inline">linewidth</del>, <del class="diffchange diffchange-inline">1</del>.<del class="diffchange diffchange-inline">000nm</del> scan step resolution, <del class="diffchange diffchange-inline">500 x 500um</del> scan field</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>**<u>5th lens</u> => <ins class="diffchange diffchange-inline"> 7</ins>-<ins class="diffchange diffchange-inline">8 nm</ins> minimum <ins class="diffchange diffchange-inline">line-width</ins>, <ins class="diffchange diffchange-inline">0</ins>.<ins class="diffchange diffchange-inline">125nm</ins> scan step resolution, <ins class="diffchange diffchange-inline">62.5x62.5um</ins> scan field</div></td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Maximum deflector scan speed = 25MHz (=> 40ns/pixel minimum dwell time)</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Maximum deflector scan speed = 25MHz (=> 40ns/pixel minimum dwell time)</div></td>
</tr>
</table>
Mitchell b
https://wiki.nanofab.ucsb.edu/w/index.php?title=E-Beam_Lithography_System_(JEOL_JBX-6300FS)&diff=154504&oldid=prev
Mitchell b: /* Detailed Specifications */
2017-10-31T17:37:52Z
<p><span dir="auto"><span class="autocomment">Detailed Specifications</span></span></p>
<table class="diff diff-contentalign-left diff-editfont-monospace" data-mw="interface">
<col class="diff-marker" />
<col class="diff-content" />
<col class="diff-marker" />
<col class="diff-content" />
<tr class="diff-title" lang="en">
<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">← Older revision</td>
<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 17:37, 31 October 2017</td>
</tr><tr>
<td colspan="2" class="diff-lineno">Line 33:</td>
<td colspan="2" class="diff-lineno">Line 33:</td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>**<u>4th lens</u> => 7-8 nm minimum linewidth, 0.125nm scan step resolution, 62.5x62.5um scan field</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>**<u>4th lens</u> => 7-8 nm minimum linewidth, 0.125nm scan step resolution, 62.5x62.5um scan field</div></td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>**<u>5th lens</u> => 20-25nm minimum linewidth, 1.000nm scan step resolution, 500 x 500um scan field</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>**<u>5th lens</u> => 20-25nm minimum linewidth, 1.000nm scan step resolution, 500 x 500um scan field</div></td>
</tr>
<tr>
<td colspan="2" class="diff-empty"> </td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"></td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Maximum deflector scan speed = 25MHz (=> 40ns/pixel minimum dwell time)</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Maximum deflector scan speed = 25MHz (=> 40ns/pixel minimum dwell time)</div></td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*150x150 mm writable area; stage position control to 0.6nm accuracy (λ/1024); 10mm/s maximum stage speed</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*150x150 mm writable area; stage position control to 0.6nm accuracy (λ/1024); 10mm/s maximum stage speed</div></td>
</tr>
</table>
Mitchell b
https://wiki.nanofab.ucsb.edu/w/index.php?title=E-Beam_Lithography_System_(JEOL_JBX-6300FS)&diff=154503&oldid=prev
Mitchell b: /* Electron Beam Resists */
2017-10-31T17:36:50Z
<p><span dir="auto"><span class="autocomment">Electron Beam Resists</span></span></p>
<table class="diff diff-contentalign-left diff-editfont-monospace" data-mw="interface">
<col class="diff-marker" />
<col class="diff-content" />
<col class="diff-marker" />
<col class="diff-content" />
<tr class="diff-title" lang="en">
<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">← Older revision</td>
<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 17:36, 31 October 2017</td>
</tr><tr>
<td colspan="2" class="diff-lineno">Line 48:</td>
<td colspan="2" class="diff-lineno">Line 48:</td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>Currently available at UCSB are:</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>Currently available at UCSB are:</div></td>
</tr>
<tr>
<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*'''PMMA''': (950K in anisole, 950K in MIBK, 495K in anisole, 50K in anisole): very high-resolution positive resist with relatively poor sensitivity (resolution scales directly and sensitivity scales inversely with molecular weight); very poor plasma etch resistance, hence used primarily to fabricate metal lines via liftoff processes (via a bi-layer resist scheme...low MW on bottom, high MW on top for single lines, or vice-versa for T-gate fabrication); utilizes an inert solvent developer (<del class="diffchange diffchange-inline">1:3</del> MIBK:IPA) </div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*'''PMMA''': (950K in anisole, 950K in MIBK, 495K in anisole, 50K in anisole): very high-resolution positive<ins class="diffchange diffchange-inline"> polymer-based</ins> resist with relatively poor sensitivity (resolution scales directly and sensitivity scales inversely with molecular weight); very poor plasma etch resistance, hence used primarily to fabricate metal lines via liftoff processes (via a bi-layer resist scheme...low MW on bottom, high MW on top for single lines, or vice-versa for T-gate fabrication); utilizes an inert solvent developer (<ins class="diffchange diffchange-inline">usually</ins> MIBK:IPA<ins class="diffchange diffchange-inline"> mixtures</ins>) </div></td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
</tr>
<tr>
<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*'''P(MMA-MAA) copolymer''': (low MW methyl-methacrylate (MMA) and methacrylic acid (MAA) copolymers in ethyl lactate): a positive resist with poor resolution but with significantly higher sensitivity than the higher MW PMMA resists above; used primarily as the top layer in a bi-layer resist scheme for T-Gate fabrication, and utilizes<del class="diffchange diffchange-inline"> an</del> inert solvent developer (<del class="diffchange diffchange-inline">1:3 </del>MIBK:IPA) </div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*'''P(MMA-MAA) copolymer''': (low MW methyl-methacrylate (MMA) and methacrylic acid (MAA) copolymers in ethyl lactate): a positive<ins class="diffchange diffchange-inline"> polymer-based</ins> resist with poor resolution but with significantly higher sensitivity than the higher MW PMMA resists above; used primarily as the top layer in a bi-layer resist scheme for T-Gate fabrication, and utilizes inert solvent developer (MIBK:IPA<ins class="diffchange diffchange-inline"> mixtures</ins>) </div></td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
</tr>
<tr>
<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*'''<del class="diffchange diffchange-inline">ZEP520</del>''': very high-resolution positive resist with very good sensitivity and excellent etch resistance; can be used in both metal lift-off processes (slight overexposure results in an excellent undercut profile) and various dry-etch processes for pattern transfer to the underlying substrate; utilizes<del class="diffchange diffchange-inline"> an</del> inert solvent <del class="diffchange diffchange-inline">developer</del> (<del class="diffchange diffchange-inline">100%</del> n-amyl acetate) </div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*'''<ins class="diffchange diffchange-inline">CSAR-62</ins>''':<ins class="diffchange diffchange-inline"> ZEP-equivalent resist manufactured in Germany at much more competitive pricing!;</ins> very high-resolution<ins class="diffchange diffchange-inline"> polymer-based</ins> positive resist with very good sensitivity and excellent etch resistance; can be used in both metal lift-off processes (slight overexposure results in an excellent undercut profile) and various dry-etch processes for pattern transfer to the underlying substrate; utilizes inert solvent <ins class="diffchange diffchange-inline">developers</ins> (<ins class="diffchange diffchange-inline">e.g.,</ins> n-amyl acetate<ins class="diffchange diffchange-inline"> for higher sensitivity and good resolution or MIBK:IPA mixtures for increased LER performance</ins>) </div></td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
</tr>
<tr>
<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*'''maN-2403''': negative resist (that is NOT chemically amplified) with very good resolution (<del class="diffchange diffchange-inline">sub</del>-<del class="diffchange diffchange-inline">100</del> <del class="diffchange diffchange-inline">nm</del>) and sensitivity; exhibits excellent dry-etch resistance; developed using a dilute basic solution (e.g., metal-ion-free developers such as <del class="diffchange diffchange-inline">Shipley CD-26 or LDD</del>-<del class="diffchange diffchange-inline">26W</del>) </div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*'''maN-2403''': negative<ins class="diffchange diffchange-inline"> polymer-based</ins> resist (that is NOT chemically amplified) with very good resolution (<ins class="diffchange diffchange-inline">down to the 40</ins>-<ins class="diffchange diffchange-inline">50nm</ins> <ins class="diffchange diffchange-inline">range</ins>) and sensitivity; exhibits excellent dry-etch resistance; developed using a dilute basic solution (e.g., metal-ion-free developers such as <ins class="diffchange diffchange-inline">AZ</ins>-<ins class="diffchange diffchange-inline">300MIF</ins>) </div></td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
</tr>
<tr>
<td colspan="2" class="diff-empty"> </td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*'''HSQ''': negative resist that is based on spin-on glass material (ie, not polymer-based) with extremely good resolution (features below 10nm can be resolved); etch resistance is high in Cl-based chemistries since HSQ reduces to a porous SiOx structure after exposure and development; sensitivity and contrast are very dependent on developer solution used and are usually poor - standard AZ300MIF developer solutions have decent sensitivity (100's of uC/cm2 at 100kV) but extremely poor contrast, stronger (and toxic!) 25%TMAH solutions have much better contrast but poor sensitivity (1000's of uC/cm2 at 100kV), "salty" developer solutions using 1wt% NaCl dissolved in either 4wt% NaOH or AZ300MIF solutions have the best contrast but reduce sensitivity significantly (10,000's of uC/cm2 at 100kV) </div></td>
</tr>
<tr>
<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*'''UV5/UVIII''': chemically amplified positive resists with very high resolution and excellent sensitivity; exhibits poor stability in cleanroom environments and has a short (< 6 months) shelf-life; currently under development at UCSB</div></td>
<td colspan="2" class="diff-empty"> </td>
</tr>
<tr>
<td colspan="2" class="diff-empty"> </td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"></td>
</tr>
<tr>
<td colspan="2" class="diff-empty"> </td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*'''UV6/UVN-210''': chemically amplified polymer-based resists with high resolution and excellent sensitivity (clearing doses below 100uC/cm2 at 100kV); UV6 used mostly in optimized t-gate resist structures; developed using a dilute basic solution (e.g., metal-ion-free developers such as AZ-300MIF)</div></td>
</tr>
</table>
Mitchell b
https://wiki.nanofab.ucsb.edu/w/index.php?title=E-Beam_Lithography_System_(JEOL_JBX-6300FS)&diff=154502&oldid=prev
Mitchell b: /* Detailed Specifications */
2017-10-31T17:10:47Z
<p><span dir="auto"><span class="autocomment">Detailed Specifications</span></span></p>
<table class="diff diff-contentalign-left diff-editfont-monospace" data-mw="interface">
<col class="diff-marker" />
<col class="diff-content" />
<col class="diff-marker" />
<col class="diff-content" />
<tr class="diff-title" lang="en">
<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">← Older revision</td>
<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 17:10, 31 October 2017</td>
</tr><tr>
<td colspan="2" class="diff-lineno">Line 41:</td>
<td colspan="2" class="diff-lineno">Line 41:</td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Advanced Fracturing software available (Layout BEAMER from GeniSys, Inc)</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Advanced Fracturing software available (Layout BEAMER from GeniSys, Inc)</div></td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>** automated proximity correction of patterns possible </div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>** automated proximity correction of patterns possible </div></td>
</tr>
<tr>
<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>** ability to manually position write fields within a pattern for optimum writing performance</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>** ability to manually position write fields within a pattern for optimum<ins class="diffchange diffchange-inline"> inter-field</ins> writing performance</div></td>
</tr>
<tr>
<td colspan="2" class="diff-empty"> </td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>** ability to adjust beam scanning strategy within a write field for optimum intra-field writing performance</div></td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>** fine tuning of line-edge roughness by shot pitch correction</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>** fine tuning of line-edge roughness by shot pitch correction</div></td>
</tr>
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Mitchell b
https://wiki.nanofab.ucsb.edu/w/index.php?title=E-Beam_Lithography_System_(JEOL_JBX-6300FS)&diff=153601&oldid=prev
Mitchell: /* Detailed Specifications */
2015-04-07T21:20:11Z
<p><span dir="auto"><span class="autocomment">Detailed Specifications</span></span></p>
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<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 21:20, 7 April 2015</td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>=Detailed Specifications=</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>=Detailed Specifications=</div></td>
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<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*“Hi-brightness” <del class="diffchange diffchange-inline">Thermal</del> <del class="diffchange diffchange-inline">Field</del> <del class="diffchange diffchange-inline">Emitter</del> <del class="diffchange diffchange-inline">Source</del> (ZnO/W)</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*<ins class="diffchange diffchange-inline">Utilizes a </ins>“Hi-brightness” <ins class="diffchange diffchange-inline">thermal</ins> <ins class="diffchange diffchange-inline">field</ins> <ins class="diffchange diffchange-inline">emission</ins> <ins class="diffchange diffchange-inline">electron source</ins> (ZnO/W)<ins class="diffchange diffchange-inline"> with a minimum spot-size at the substrate of 2nm; operates at 100kV only</ins></div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*Unique two lens/deflector scanning system:</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*hi-resolution writing at nA’s</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>**<u>4th lens</u> => 7-8 nm minimum linewidth, 0.125nm scan step resolution, 62.5x62.5um scan field</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*25, 50, and 100 kV operation</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>**<u>5th lens</u> => 20-25nm minimum linewidth, 1.000nm scan step resolution, 500 x 500um scan field</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*Minimum Spotsize ~ 2nm @ 100kV</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*Maximum scan speed = <del class="diffchange diffchange-inline">12 MHz</del> (<del class="diffchange diffchange-inline">0.083us</del>/pixel)</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*Maximum<ins class="diffchange diffchange-inline"> deflector</ins> scan speed = <ins class="diffchange diffchange-inline">25MHz</ins> (<ins class="diffchange diffchange-inline">=> 40ns</ins>/pixel<ins class="diffchange diffchange-inline"> minimum dwell time</ins>)</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*150x150 mm writable area <del class="diffchange diffchange-inline">(but</del> <del class="diffchange diffchange-inline">can</del> <del class="diffchange diffchange-inline">load</del> <del class="diffchange diffchange-inline">200mm</del> <del class="diffchange diffchange-inline">wafers</del>)</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*150x150 mm writable area<ins class="diffchange diffchange-inline">;</ins> <ins class="diffchange diffchange-inline">stage</ins> <ins class="diffchange diffchange-inline">position</ins> <ins class="diffchange diffchange-inline">control</ins> <ins class="diffchange diffchange-inline">to</ins> <ins class="diffchange diffchange-inline">0.6nm accuracy (λ/1024</ins>)<ins class="diffchange diffchange-inline">; 10mm/s maximum stage speed</ins></div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*Stage control to 0.6 nm accuracy (λ/1024)</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*Dynamic Focus and Stigmation Control for improved writing performance across the entire scan field.</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*Two deflector/objective lens system:</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>**5th Lens (8nm) and 4th Lens modes (25-40nm)</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*Dynamic Focus and Stigmation Control</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*10 mm/sec maximum stage speed</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*UNIX computer controlled</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*UNIX computer controlled</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*Advanced Fracturing software available (Layout BEAMER from GeniSys, Inc)</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>** automated proximity correction of patterns possible </div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>** ability to manually position write fields within a pattern for optimum writing performance</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>** fine tuning of line-edge roughness by shot pitch correction</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>=Electron Beam Resists=</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>=Electron Beam Resists=</div></td>
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Mitchell
https://wiki.nanofab.ucsb.edu/w/index.php?title=E-Beam_Lithography_System_(JEOL_JBX-6300FS)&diff=832&oldid=prev
Zwarburg at 13:55, 11 July 2012
2012-07-11T13:55:30Z
<p></p>
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<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 13:55, 11 July 2012</td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|manufacturer = JEOL USA Inc</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>|materials = </div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>}} </div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>}} </div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>= About =</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>= About =</div></td>
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Zwarburg