Difference between revisions of "E-Beam 2 (Custom)"

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|type = Vacuum Deposition
|type = Vacuum Deposition
|super= Lee Sawyer
|super= Don Freeborn
|location=Bay 3
|location=Bay 3

Latest revision as of 10:24, 15 April 2020

E-Beam 2 (Custom)
IMG 5388.JPG
Tool Type Vacuum Deposition
Location Bay 3
Supervisor Don Freeborn
Supervisor Phone (805) 893-7975
Supervisor E-Mail dfreeborn@ece.ucsb.edu
Description Electron-Beam Evaporation System
Manufacturer Temescal
Vacuum Deposition Recipes
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This electron-beam evaporation system is used for the controlled deposition of thin dielectric films. The films are evaporated from a wide variety of solid sources. The most common dielectrics deposited are: SiO2, SiO, TiO2, Ta2O5, ITO and SrF2. Other materials may be evaporated upon request. Oxygen gas can be bled into the system during deposition to try to maintain the stoichiometry during deposition. Fixturing for heating the substrate can also be used. A crystal thickness monitor is used to control the deposition thickness. The dielectrics deposited by this system are typically used for optical coatings (anti-reflective), electrical insulators, and reactive ion etching masks. Samples up to ~ 5" diameter can be placed into this system for evaporation. Typical deposition rates are several Angstroms/second.

Detailed Specifications

  • Temescal 10kV power supply
  • Temescal 4-pocket series 260 e-beam source
  • Temescal Electron beam controller with sweep rate and amplitude control
  • Cryo-pumped system with ~ 4.0E-7 ultimate base pressure
  • Automatic vacuum sequencing
  • Crystal thickness monitoring
  • Sample size: up to 5” diameter pieces without heat, 4" diameter heated
  • Oxygen bleed for maintaining oxide stoichiometry


Materials Table

For the materials tables, please visit the E-Beam Recipe Page.