Difference between revisions of "Dry Etching Recipes"

Revision as of 13:59, 22 September 2017

R = Recipe is available. Clicking this link will take you to the recipe.

A = Material is available for use, but no recipes are provided.

Dry Etching Recipes
	RIE Etching				ICP Etching				Oxygen Plasma Systems				Other Dry Etchers
Material	RIE 1 (Retired)	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	Si Deep RIE (PTI/Bosch)	ICP Etch 1 (Panasonic 1)	ICP Etch 2 (Panasonic 2)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)	Plasma Clean (Gasonics 2000)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)
Ag
Al				A		R	R
Au															R
Cr				A		R	A
Cu
Ge
Mo
Ni															R
Pt															R
Ru
Ta
Ti						R	A
Al₂O₃
AlGaAs				R		R		R
AlGaN								R
AlN								R
GaAs				R		R	R	R
GaN				R		R		R
HfO₂
InGaAlAs		R						R
InGaAsP		R						R
InP		R						R
ITO		R
SiO₂			R			R	R							R
SiN			R			R	R
SiOxNy
Ta₂O₅
TiO₂
TiN
W-TiW						R	A
ZnO₂
ZrO₂
GaSb								R
CdZnTe		R
Si					R								R
SiC						R	A
Sapphire						R	A
ZnS		R
ZnSe		R
Material	RIE 1 (Retired)	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	Si Deep RIE (PlasmaTherm/Bosch Etch)	ICP Etch 1 (Panasonic E626I)	ICP Etch 2 (Panasonic E640)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)	Plasma Clean (Gasonics 2000)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)

Difference between revisions of "Dry Etching Recipes"

Revision as of 13:59, 22 September 2017

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+! bgcolor="#D0E7FF" align="center" | Al<sub>2</sub>O<sub>3</sub>
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-! bgcolor="#D0E7FF" align="center" | W-TiW
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-| {{rl|ICP Etching Recipes|W-TiW Etch(Panasonic 1)}}
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-! bgcolor="#D0E7FF" align="center" | Al<sub>2</sub>O<sub>3</sub>
+! bgcolor="#D0E7FF" align="center" | AlGaAs
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+|{{rl|RIE Etching Recipes|AlGaAs Etch (RIE 5)}}
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+|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
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+|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|AlGaAs Etch (Unaxis VLR)}}
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-! bgcolor="#D0E7FF" align="center" | HfO<sub>2</sub>
+! bgcolor="#D0E7FF" align="center" | AlGaN
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+| {{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}}
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-! bgcolor="#D0E7FF" align="center" | ITO
+! bgcolor="#D0E7FF" align="center" | AlN
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-| {{rl|RIE Etching Recipes|ITO Etch (RIE 2)}}
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-! bgcolor="#D0E7FF" align="center" | SiO<sub>2</sub>
+! bgcolor="#D0E7FF" align="center" | GaAs
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-| {{rl|RIE Etching Recipes|RIE 3 (MRC)|SiO<sub>2</sub> Etching (RIE 3)}}
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+| {{rl|RIE Etching Recipes|AlGaAs Etch (RIE 5)}}
+|
+|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
+|{{rl|ICP Etching Recipes|GaAs Etch (Panasonic 2)}}
+|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|GaAs Etch (Unaxis VLR)}}
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-| {{rl|ICP Etching Recipes|SIO2Etch(Panasonic 1)}}
-| {{rl|ICP Etching Recipes|SIO2Etch(Panasonic 2)}}
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-| {{rl|Other Dry Etching Recipes|Other Dry Etch (Vapor HF Etcher)}}
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-! bgcolor="#D0E7FF" align="center" | SiN
+! bgcolor="#D0E7FF" align="center" | GaN
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-|{{rl|RIE Etching Recipes|RIE 3 (MRC)|SiN<sub>x</sub> Etching (RIE 3)}}
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+|{{rl|RIE Etching Recipes|RIE 5 (PlasmaTherm)|GaN Etch (RIE 5)}}
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-| {{rl|ICP Etching Recipes|SINxEtch(Panasonic 1)}}
+| {{rl|ICP Etching Recipes|GaN Etch (Panasonic 1)}}
-| {{rl|ICP Etching Recipes|SINxEtch(Panasonic 2)}}
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+| {{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}}
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-! bgcolor="#D0E7FF" align="center" | SiOxNy
+! bgcolor="#D0E7FF" align="center" | HfO<sub>2</sub>
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-! bgcolor="#D0E7FF" align="center" | TiO<sub>2</sub>
+! bgcolor="#D0E7FF" align="center" | InGaAlAs
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+| {{rl|RIE Etching Recipes|RIE 2 (MRC)|InP-InGaAsP-InGaAlAs Etching (RIE 2)|InP Etch (RIE 2)}}
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+| {{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
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-! bgcolor="#D0E7FF" align="center" | TiN
+! bgcolor="#D0E7FF" align="center" | InGaAsP
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-! bgcolor="#D0E7FF" align="center" | ZnO<sub>2</sub>
+! bgcolor="#D0E7FF" align="center" | InP
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-! bgcolor="#D0E7FF" align="center" | ZrO<sub>2</sub>
+! bgcolor="#D0E7FF" align="center" | ITO
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+! bgcolor="#D0E7FF" align="center" | SiO<sub>2</sub>
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+| {{rl|RIE Etching Recipes|RIE 3 (MRC)|SiO<sub>2</sub> Etching (RIE 3)}}
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-| {{rl|RIE Etching Recipes|AlGaAs Etch (RIE 5)}}
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-|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
-|{{rl|ICP Etching Recipes|GaAs Etch (Panasonic 2)}}
-|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|GaAs Etch (Unaxis VLR)}}
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+| {{rl|Other Dry Etching Recipes|Other Dry Etch (Vapor HF Etcher)}}
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+! bgcolor="#D0E7FF" align="center" | SiN
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+|{{rl|RIE Etching Recipes|RIE 3 (MRC)|SiN<sub>x</sub> Etching (RIE 3)}}
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-|{{rl|RIE Etching Recipes|AlGaAs Etch (RIE 5)}}
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-|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
+| {{rl|ICP Etching Recipes|SINxEtch(Panasonic 1)}}
+| {{rl|ICP Etching Recipes|SINxEtch(Panasonic 2)}}
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-| {{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
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+! bgcolor="#D0E7FF" align="center" | Ta<sub>2</sub>O<sub>5</sub>
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+! bgcolor="#D0E7FF" align="center" | TiO<sub>2</sub>
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-! bgcolor="#D0E7FF" align="center" | GaN
+! bgcolor="#D0E7FF" align="center" | TiN
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-|{{rl|RIE Etching Recipes|RIE 5 (PlasmaTherm)|GaN Etch (RIE 5)}}
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+! bgcolor="#D0E7FF" align="center" | W-TiW
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+| {{rl|ICP Etching Recipes|W-TiW Etch(Panasonic 1)}}
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-! bgcolor="#D0E7FF" align="center" | ZnS
+! bgcolor="#D0E7FF" align="center" | Si
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-| {{rl|RIE Etching Recipes|ZnS Etching (RIE 2)}}
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+| {{rl|ICP Etching Recipes|Si Etch (PlasmaTherm/Bosch Etch)}}
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+| {{rl|Other Dry Etching Recipes|Other Dry Etch (XeF2 Etcher)}}
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-! bgcolor="#D0E7FF" align="center" | ZnSe
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-| {{rl|RIE Etching Recipes|ZnS Etching (RIE 2)}}
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+| {{rl|ICP Etching Recipes|SiC Etch(Panasonic 1)}}
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+! bgcolor="#D0E7FF" align="center" | Sapphire
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-| {{rl|ICP Etching Recipes|Si Etch (PlasmaTherm/Bosch Etch)}}
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+| {{rl|ICP Etching Recipes|Sapphire Etch(Panasonic 1)}}
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-| {{rl|Other Dry Etching Recipes|Other Dry Etch (XeF2 Etcher)}}
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-! bgcolor="#D0E7FF" align="center" | SiC
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-| {{rl|ICP Etching Recipes|SiC Etch(Panasonic 1)}}
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