Difference between revisions of "Dry Etching Recipes"
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| − | ! width="300" bgcolor="#D0E7FF" align="center" colspan="5" | '''[[RIE Etching Recipes|RIE Etching]]''' |
+ | !height="35" width="300" bgcolor="#D0E7FF" align="center" colspan="5" | '''[[RIE Etching Recipes|RIE Etching]]''' |
! width="300" bgcolor="#D0E7FF" align="center" colspan="4" | '''[[ICP Etching Recipes|ICP Etching]]''' |
! width="300" bgcolor="#D0E7FF" align="center" colspan="4" | '''[[ICP Etching Recipes|ICP Etching]]''' |
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+ | !width="75" bgcolor="#D0E7FF" align="center" | '''Material''' |
| − | | bgcolor="#DAF1FF" | [[RIE 1 (Custom)]] |
+ | |width="65" bgcolor="#DAF1FF" | [[RIE 1 (Custom)|RIE 1<br>(Custom)]] |
| − | | bgcolor="#DAF1FF" | [[RIE 2 (MRC)]] |
+ | |width="65" bgcolor="#DAF1FF" | [[RIE 2 (MRC)|RIE 2<br> (MRC)]] |
| − | | bgcolor="#DAF1FF" | [[RIE 3 (MRC)]] |
+ | |width="65" bgcolor="#DAF1FF" | [[RIE 3 (MRC)|RIE 3<br> (MRC)]] |
| − | | bgcolor="#DAF1FF" | [[RIE 5 (PlasmaTherm)]] |
+ | |width="95" bgcolor="#DAF1FF" | [[RIE 5 (PlasmaTherm)|RIE 5<br>(PlasmaTherm)]] |
| − | | bgcolor="#DAF1FF" | [[Si Deep RIE (PlasmaTherm/Bosch Etch)]] |
+ | |width="160" bgcolor="#DAF1FF" | [[Si Deep RIE (PlasmaTherm/Bosch Etch)|Si Deep RIE<br>(PlasmaTherm/Bosch Etch)]] |
| − | | bgcolor="#DAF1FF" | [[ICP Etch 1 (Panasonic E626I)]] |
+ | |width="120" bgcolor="#DAF1FF" | [[ICP Etch 1 (Panasonic E626I)|ICP Etch 1<br>(Panasonic E626I)]] |
| − | | bgcolor="#DAF1FF" | [[ICP Etch 2 (Panasonic E640)]] |
+ | |width="120" bgcolor="#DAF1FF" | [[ICP Etch 2 (Panasonic E640)|ICP Etch 2<br>(Panasonic E640)]] |
| − | | bgcolor="#DAF1FF" | [[ICP-Etch (Unaxis VLR)]] |
+ | |width="85" bgcolor="#DAF1FF" | [[ICP-Etch (Unaxis VLR)|ICP-Etch<br>(Unaxis VLR)]] |
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! width="100" bgcolor="#D0E7FF" align="center" | Al |
! width="100" bgcolor="#D0E7FF" align="center" | Al |
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Revision as of 10:44, 18 July 2012
Dry Etching Recipes
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|---|---|---|---|---|---|---|---|---|---|
| RIE Etching | ICP Etching | ||||||||
| Material | RIE 1 (Custom) |
RIE 2 (MRC) |
RIE 3 (MRC) |
RIE 5 (PlasmaTherm) |
Si Deep RIE (PlasmaTherm/Bosch Etch) |
ICP Etch 1 (Panasonic E626I) |
ICP Etch 2 (Panasonic E640) |
ICP-Etch (Unaxis VLR) | |
| Al | |||||||||
| Ti | |||||||||
| Cr | |||||||||
| Ge | |||||||||
| Ag | |||||||||
| Ru | |||||||||
| Mo | |||||||||
| Ta | |||||||||
| W | |||||||||
| Al2O3 | |||||||||
| HfO2 | |||||||||
| ITo | |||||||||
| SiO2 | |||||||||
| SiN | |||||||||
| SiOxNy | |||||||||
| Ta2O5 | |||||||||
| TiO2 | |||||||||
| TiN | |||||||||
| ZnO2 | |||||||||
| ZrO2 | |||||||||
| GaAs | |||||||||
| AlGaAs | |||||||||
| InGaAlAs | |||||||||
| InGaAsP | |||||||||
| InP | |||||||||
| GaN | |||||||||
| AlGaN | |||||||||
| AlN | |||||||||
| GaN | |||||||||
| AlGaN | |||||||||
| AlN | |||||||||
| GaSb | |||||||||
| CdTe | |||||||||
| ZnSe | |||||||||
| Si | |||||||||
| SiC | |||||||||
| Sapphire | |||||||||