Difference between revisions of "Dry Etching Recipes"

Revision as of 09:35, 24 September 2013

R = Recipe is available. Clicking this link will take you to the recipe.

Dry Etching Recipes
	RIE Etching				ICP Etching				Oxygen Plasma Systems				Other Dry Etchers
Material	RIE 1 (Custom)	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	Si Deep RIE (PlasmaTherm/Bosch Etch)	ICP Etch 1 (Panasonic E626I)	ICP Etch 2 (Panasonic E640)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)	Plasma Clean (Gasonics 2000)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)
Al
Ti
Cr				A		R	A
Ge
Ag
Ru
Mo
Ta
W
Al₂O₃
HfO₂
ITo
SiO₂						R	R
SiN
SiOxNy
Ta₂O₅
TiO₂
TiN
ZnO₂
ZrO₂
GaAs
AlGaAs
InGaAlAs
InGaAsP
InP		R						R
GaN				R		R
AlGaN
AlN
GaN
AlGaN
AlN
GaSb
CdTe
ZnSe
Si														R
SiC
Sapphire
Material	RIE 1 (Custom)	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	Si Deep RIE (PlasmaTherm/Bosch Etch)	ICP Etch 1 (Panasonic E626I)	ICP Etch 2 (Panasonic E640)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)	Plasma Clean (Gasonics 2000)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)

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-{{rl|ICP Etching Recipes|InP Etch (Unaxis VLR)}}
+| {{rl|Other Dry Etching Recipes|Other Dry Etch (Unaxis VLR)}}
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 ! bgcolor="#D0E7FF" align="center" | SiC