Dry Etching Recipes

• R = Recipe is available. Clicking this link will take you to the recipe.
• A = Material is available for use, but no recipes are provided.

Dry Etching Recipes
	RIE Etching			ICP Etching						Oxygen Plasma Systems					Other Dry Etchers
Material	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	DSEIII (PlasmaTherm)	Fluorine ICP (PlasmaTherm)	ICP Etch 1 (Panasonic E626I)	ICP Etch 2 (Panasonic E640)	Oxford ICP (PlasmaPro 100)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)	Plasma Clean (Gasonics 2000)	Plasma Clean (YES EcoClean)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)
Ag																	A
Al			A			R	R										A
Au																	R
Cr			A			R	A										A
Cu																	A
Ge															A		A
Mo																	A
Ni																	R
Pt																	R
Ru						A	R										A
Si				R	R			A							R		A
Ta																	A
Ti						R	A										A
Al2O3							R										A
Al2O3 (Sapphire)						R	A										A
AlGaAs			R			R		A	R								A
AlGaN								A	R								A
AlN									R								A
CdZnTe	R																A
GaAs			R			R	R	A	R								A
GaN			R			R		A	R								A
GaSb							A		R								A
HfO2																	A
InGaAlAs	R							A	R								A
InGaAsP	R							R	R								A
InP	R					A	A	R	R								R
ITO	R																A
Photoresist & ARC		A	R		R	R	R			A	A	A					A
SiC						R	A										A
SiN		R			A	R	R			A							A
SiO2		R			R	R	R									R	A
SiOxNy						A	A										A
Ta2O5							A										A
TiN																	A
TiO2																	A
W-TiW						R	A										A
ZnO2																	A
ZnS	R																A
ZnSe	R																A
ZrO2																	A
Material	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	DSEIII (PlasmaTherm)	Fluorine ICP (PlasmaTherm)	ICP Etch 1 (Panasonic E626I)	ICP Etch 2 (Panasonic E640)	Oxford ICP (PlasmaPro 100)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)	Plasma Clean (Gasonics 2000)	Plasma Clean (YES EcoClean)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)