Difference between revisions of "Dry Etching Recipes"

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{{Recipe Table Explanation}}
 
{{Recipe Table Explanation}}
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{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center; font-size: 95%" border="1"
 
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center; font-size: 95%" border="1"
 
|- bgcolor="#d0e7ff"
 
|- bgcolor="#d0e7ff"
! colspan="17" width="725" height="45" |<div style="font-size: 150%;">Dry Etching Recipes</div>
+
! colspan="18" width="725" height="45" |<div style="font-size: 150%;">Dry Etching Recipes</div>
 
|- bgcolor="#d0e7ff"
 
|- bgcolor="#d0e7ff"
 
|<!-- INTENTIONALLY LEFT BLANK -->
 
|<!-- INTENTIONALLY LEFT BLANK -->
 
! colspan="3" |'''[[RIE Etching Recipes|RIE Etching]]'''
 
! colspan="3" |'''[[RIE Etching Recipes|RIE Etching]]'''
! colspan="5" |'''[[ICP Etching Recipes|ICP Etching]]'''
+
! colspan="6" |'''[[ICP Etching Recipes|ICP Etching]]'''
 
! colspan="5" bgcolor="#d0e7ff" align="center" |'''[[Oxygen Plasma System Recipes|Oxygen Plasma Systems]]'''
 
! colspan="5" bgcolor="#d0e7ff" align="center" |'''[[Oxygen Plasma System Recipes|Oxygen Plasma Systems]]'''
 
! colspan="3" bgcolor="#d0e7ff" align="center" |'''[[Other Dry Etching Recipes|Other Dry Etchers]]'''
 
! colspan="3" bgcolor="#d0e7ff" align="center" |'''[[Other Dry Etching Recipes|Other Dry Etchers]]'''
 
|-
 
|-
! width="65" bgcolor="#d0e7ff" align="center" |'''Material'''
+
! bgcolor="#d0e7ff" align="center" |'''Material'''
| width="65" bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_2_.28MRC.29|RIE 2<br> (MRC)]]
+
| bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_2_.28MRC.29|RIE 2<br> <span style="font-size: 88%;">(MRC)</span>]]
| width="65" bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_3_.28MRC.29|RIE 3<br> (MRC)]]
+
| bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_3_.28MRC.29|RIE 3<br> <span style="font-size: 88%;">(MRC)</span>]]
| width="100" bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_5_.28PlasmaTherm.29|RIE 5<br>(PlasmaTherm)]]
+
| bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_5_.28PlasmaTherm.29|RIE 5<br><span style="font-size: 88%;">(PlasmaTherm)</span>]]
| width="100" bgcolor="#daf1ff" |[[ICP_Etching_Recipes#DSEIII_.28PlasmaTherm.2FDeep_Silicon_Etcher.29|DSEIII<br>(PlasmaTherm)]]
+
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#DSEIII_.28PlasmaTherm.2FDeep_Silicon_Etcher.29|DSEIII<br><span style="font-size: 88%;">(PlasmaTherm)</span>]]
| width="100" bgcolor="#daf1ff" |[https://wiki.nanotech.ucsb.edu/wiki/index.php/ICP_Etching_Recipes#PlasmaTherm.2FSLR_Fluorine_Etcher SLR Fluorine ICP (PlasmaTherm)]
+
| bgcolor="#daf1ff" |[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|Fluorine ICP <span style="font-size: 88%;">(PlasmaTherm)</span>]]
| width="120" bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP_Etch_1_.28Panasonic_E626I.29|ICP Etch 1<br>(Panasonic 1)]]
+
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP_Etch_1_.28Panasonic_E626I.29|ICP Etch 1<br><span style="font-size: 88%;">(Panasonic E626I)</span>]]
| width="120" bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP_Etch_2_.28Panasonic_E640.29|ICP Etch 2<br>(Panasonic 2)]]
+
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP_Etch_2_.28Panasonic_E640.29|ICP Etch 2<br><span style="font-size: 88%;">(Panasonic E640)</span>]]
| width="85" bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP-Etch_.28Unaxis_VLR.29|ICP-Etch<br>(Unaxis VLR)]]
+
| bgcolor="#daf1ff" |[[ICP Etching Recipes#Oxford ICP Etcher .28PlasmaPro 100 Cobra.29|Oxford ICP <span style="font-size: 88%;">(PlasmaPro 100)</span>]]
| width="85" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Ashers_.28Technics_PEII.29|Ashers<br>(Technics PEII)]]
+
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP-Etch_.28Unaxis_VLR.29|ICP-Etch<br><span style="font-size: 88%;">(Unaxis VLR)</span>]]
| width="95" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Clean_.28Gasonics_2000.29|Plasma Clean<br>(Gasonics 2000)]]
+
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Ashers_.28Technics_PEII.29|Ashers<br><span style="font-size: 88%;">(Technics PEII)</span>]]
| width="95" bgcolor="#daf1ff" |[[Oxygen Plasma System Recipes#Plasma Clean .28YES EcoClean.29|Plasma Clean (YES EcoClean)]]
+
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Clean_.28Gasonics_2000.29|Plasma Clean<br><span style="font-size: 88%;">(Gasonics 2000)</span>]]
| width="85" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]]
+
| bgcolor="#daf1ff" |[[Oxygen Plasma System Recipes#Plasma Clean .28YES EcoClean.29|Plasma Clean <span style="font-size: 88%;">(YES EcoClean)</span>]]
| width="85" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Activation_.28EVG_810.29|Plasma Activation<br>(EVG 810)]]
+
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]]
| width="85" bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#XeF2_Etch_.28Xetch.29|XeF2 Etch<br>(Xetch)]]
+
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Activation_.28EVG_810.29|Plasma Activation<br><span style="font-size: 88%;">(EVG 810)</span>]]
| width="85" bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#Vapor_HF_Etch_.28uETCH.29|Vapor HF Etch<br>(uETCH)]]
+
| bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#XeF2_Etch_.28Xetch.29|XeF2 Etch<br><span style="font-size: 88%;">(Xetch)</span>]]
| width="85" bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29|CAIBE<br>(Oxford)]]
+
| bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#Vapor_HF_Etch_.28uETCH.29|Vapor HF Etch<br><span style="font-size: 88%;">(uETCH)</span>]]
 +
| bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29|CAIBE<br><span style="font-size: 88%;">(Oxford)</span>]]
 
|- bgcolor="#eeffff"
 
|- bgcolor="#eeffff"
 
! bgcolor="#d0e7ff" align="center" |Ag
 
! bgcolor="#d0e7ff" align="center" |Ag
 +
|
 
|
 
|
 
|
 
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|
 
|
 
|A
 
|A
|- bgcolor="#eeffff"
+
|- bgcolor="#ffffff"
 
! bgcolor="#d0e7ff" align="center" |Al
 
! bgcolor="#d0e7ff" align="center" |Al
 
|
 
|
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|{{rl|ICP Etching Recipes|Al Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|Al Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|Al Etch (Panasonic 2)}}
 
|{{rl|ICP Etching Recipes|Al Etch (Panasonic 2)}}
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|
 
|
 
|
 
|
 
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|- bgcolor="#eeffff"
 
|- bgcolor="#eeffff"
 
! bgcolor="#d0e7ff" align="center" |Au
 
! bgcolor="#d0e7ff" align="center" |Au
 +
|
 
|
 
|
 
|
 
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|
 
|
 
|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}}
 
|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}}
|- bgcolor="#eeffff"
+
|- bgcolor="#ffffff"
 
! bgcolor="#d0e7ff" align="center" |Cr
 
! bgcolor="#d0e7ff" align="center" |Cr
 
|
 
|
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|{{rl|ICP Etching Recipes|Cr Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|Cr Etch (Panasonic 1)}}
 
|A
 
|A
 +
|
 
|
 
|
 
|
 
|
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|- bgcolor="#eeffff"
 
|- bgcolor="#eeffff"
 
! bgcolor="#d0e7ff" align="center" |Cu
 
! bgcolor="#d0e7ff" align="center" |Cu
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|
 
|
 
|
 
|
 
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|
 
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|A
 
|A
|-
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|- bgcolor="#ffffff"
 
! bgcolor="#d0e7ff" align="center" |Ge
 
! bgcolor="#d0e7ff" align="center" |Ge
 +
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|- bgcolor="#eeffff"
 
|- bgcolor="#eeffff"
 
! bgcolor="#d0e7ff" align="center" |Mo
 
! bgcolor="#d0e7ff" align="center" |Mo
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|A
 
|A
|-
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|- bgcolor="#ffffff"
 
! bgcolor="#d0e7ff" align="center" |Ni
 
! bgcolor="#d0e7ff" align="center" |Ni
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|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}}
 
|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}}
|-
+
|- bgcolor="#eeffff"
 
! bgcolor="#d0e7ff" align="center" |Pt
 
! bgcolor="#d0e7ff" align="center" |Pt
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|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}}
 
|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}}
|-
+
|- bgcolor="#ffffff"
 
! bgcolor="#d0e7ff" align="center" |Ru
 
! bgcolor="#d0e7ff" align="center" |Ru
 
|
 
|
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|A
 
|A
 
|{{Rl|ICP Etching Recipes|Ru (Ruthenium) Etch (Panasonic 2)}}
 
|{{Rl|ICP Etching Recipes|Ru (Ruthenium) Etch (Panasonic 2)}}
 +
|
 
|
 
|
 
|
 
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|
 
|
 
|
 
|
 +
|A
 
|
 
|
 
|
 
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|
 
|
 
|A
 
|A
|-
+
|- bgcolor="#ffffff"
 
! bgcolor="#d0e7ff" align="center" |Ta
 
! bgcolor="#d0e7ff" align="center" |Ta
 +
|
 
|
 
|
 
|
 
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|
 
|
 
|A
 
|A
|-
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|- bgcolor="#eeffff"
 
! bgcolor="#d0e7ff" align="center" |Ti
 
! bgcolor="#d0e7ff" align="center" |Ti
 
|
 
|
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|{{rl|ICP Etching Recipes|Ti Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|Ti Etch (Panasonic 1)}}
 
|A
 
|A
 +
|
 
|
 
|
 
|
 
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|
 
|
 
|A
 
|A
|-
+
|- bgcolor="#ffffff"
 
! bgcolor="#d0e7ff" align="center" |Al<sub>2</sub>O<sub>3</sub>
 
! bgcolor="#d0e7ff" align="center" |Al<sub>2</sub>O<sub>3</sub>
 
|
 
|
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|
 
|
 
|
 
|
|[https://wiki.nanotech.ucsb.edu/wiki/index.php/ICP_Etching_Recipes#Al2O3_Etching_.28Panasonic_2.29 R]
+
|[https://wiki.nanotech.ucsb.edu/w/index.php?title=ICP_Etching_Recipes#Al2O3_Etching_.28Panasonic_2.29 R]
 +
|
 
|
 
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|{{rl|ICP Etching Recipes|Sapphire Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|Sapphire Etch (Panasonic 1)}}
 
|A
 
|A
 +
|
 
|
 
|
 
|
 
|
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|
 
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|A
 
|A
|-
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|- bgcolor="#ffffff"
 
! bgcolor="#d0e7ff" align="center" |AlGaAs
 
! bgcolor="#d0e7ff" align="center" |AlGaAs
 
|
 
|
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|
 
|
 
|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
 +
|
 
|
 
|
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|AlGaAs Etch (Unaxis VLR)}}
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|AlGaAs Etch (Unaxis VLR)}}
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|- bgcolor="#eeffff"
 
|- bgcolor="#eeffff"
 
! bgcolor="#d0e7ff" align="center" |AlGaN
 
! bgcolor="#d0e7ff" align="center" |AlGaN
 +
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|
 
|
 
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|
 
|
 
|A
 
|A
|-
+
|- bgcolor="#ffffff"
 
! bgcolor="#d0e7ff" align="center" |AlN
 
! bgcolor="#d0e7ff" align="center" |AlN
 +
|
 
|
 
|
 
|
 
|
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! bgcolor="#d0e7ff" align="center" |CdZnTe
 
! bgcolor="#d0e7ff" align="center" |CdZnTe
 
|{{rl|RIE Etching Recipes|CdZnTe Etch (RIE 2)}}
 
|{{rl|RIE Etching Recipes|CdZnTe Etch (RIE 2)}}
 +
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|
 
|
 
|
 
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|
 
|
 
|A
 
|A
|- bgcolor="#eeffff"
+
|- bgcolor="#ffffff"
 
! bgcolor="#d0e7ff" align="center" |GaAs
 
! bgcolor="#d0e7ff" align="center" |GaAs
 
|
 
|
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|{{rl|ICP Etching Recipes|GaAs-AlGaAs_Etch_.28Panasonic_1.29}}
 
|{{rl|ICP Etching Recipes|GaAs-AlGaAs_Etch_.28Panasonic_1.29}}
 
|{{rl|ICP Etching Recipes|GaAs Etch (Panasonic 2)}}
 
|{{rl|ICP Etching Recipes|GaAs Etch (Panasonic 2)}}
 +
|A
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|GaAs Etch (Unaxis VLR)}}
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|GaAs Etch (Unaxis VLR)}}
 
|
 
|
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|
 
|
 
|A
 
|A
|-
+
|- bgcolor="#eeffff"
 
! bgcolor="#d0e7ff" align="center" |GaN
 
! bgcolor="#d0e7ff" align="center" |GaN
 
|
 
|
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|{{rl|ICP Etching Recipes|GaN Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|GaN Etch (Panasonic 1)}}
 
|
 
|
 +
|A
 
|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}}
 
|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}}
 
|
 
|
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|
 
|
 
|A
 
|A
|- bgcolor="#eeffff"
+
|- bgcolor="#ffffff"
 
! bgcolor="#d0e7ff" align="center" |GaSb
 
! bgcolor="#d0e7ff" align="center" |GaSb
 
|
 
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|A
 
|A
 +
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|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaSb Etch Unaxis VLR)}}
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaSb Etch Unaxis VLR)}}
 
|
 
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|- bgcolor="#eeffff"
 
|- bgcolor="#eeffff"
 
! bgcolor="#d0e7ff" align="center" |HfO<sub>2</sub>
 
! bgcolor="#d0e7ff" align="center" |HfO<sub>2</sub>
 +
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|
 
|
 
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|
 
|
 
|A
 
|A
|- bgcolor="#eeffff"
+
|- bgcolor="#ffffff"
 
! bgcolor="#d0e7ff" align="center" |InGaAlAs
 
! bgcolor="#d0e7ff" align="center" |InGaAlAs
 
|{{rl|RIE Etching Recipes|RIE 2 (MRC)|InP-InGaAsP-InGaAlAs Etching (RIE 2)|InP Etch (RIE 2)}}
 
|{{rl|RIE Etching Recipes|RIE 2 (MRC)|InP-InGaAsP-InGaAlAs Etching (RIE 2)|InP Etch (RIE 2)}}
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|
 
|
 
|
 
|
 +
|A
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
 
|
 
|
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|
 
|
 
|A
 
|A
|-
+
|- bgcolor="#eeffff"
 
! bgcolor="#d0e7ff" align="center" |InGaAsP
 
! bgcolor="#d0e7ff" align="center" |InGaAsP
 
|{{rl|RIE Etching Recipes|RIE 2 (MRC)|InP-InGaAsP-InGaAlAs Etching (RIE 2)|InP Etch (RIE 2)}}
 
|{{rl|RIE Etching Recipes|RIE 2 (MRC)|InP-InGaAsP-InGaAlAs Etching (RIE 2)|InP Etch (RIE 2)}}
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|
 
|
 
|
 
|
 +
|R
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
 
|
 
|
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|
 
|
 
|A
 
|A
|- bgcolor="#eeffff"
+
|- bgcolor="#ffffff"
 
! bgcolor="#d0e7ff" align="center" |InP
 
! bgcolor="#d0e7ff" align="center" |InP
 
|{{rl|RIE Etching Recipes|RIE 2 (MRC)|InP-InGaAsP-InGaAlAs Etching (RIE 2)|InP Etch (RIE 2)}}
 
|{{rl|RIE Etching Recipes|RIE 2 (MRC)|InP-InGaAsP-InGaAlAs Etching (RIE 2)|InP Etch (RIE 2)}}
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|A
 
|A
 
|A
 
|A
 +
|R
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
 
|
 
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|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}}
 
|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}}
|-
+
|- bgcolor="#eeffff"
 
! bgcolor="#d0e7ff" align="center" |ITO
 
! bgcolor="#d0e7ff" align="center" |ITO
 
|{{rl|RIE Etching Recipes|ITO Etch (RIE 2)}}
 
|{{rl|RIE Etching Recipes|ITO Etch (RIE 2)}}
 +
|
 
|
 
|
 
|
 
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|A
 
|A
|- bgcolor="#eeffff"
+
|- bgcolor="#ffffff"
 
!Photoresist
 
!Photoresist
 
& ARC
 
& ARC
 
|
 
|
 
|A
 
|A
|[https://wiki.nanotech.ucsb.edu/wiki/index.php/RIE_Etching_Recipes#Photoresist_and_ARC R]
+
|[https://wiki.nanotech.ucsb.edu/wiki/RIE_Etching_Recipes#Photoresist_and_ARC_.28RIE_5.29 R]
 
|
 
|
 +
|[https://wiki.nanotech.ucsb.edu/wiki/ICP_Etching_Recipes#Photoresist_.26_ARC_.28Fluorine_ICP_Etcher.29 R]
 +
|[https://wiki.nanotech.ucsb.edu/wiki/ICP_Etching_Recipes#Photoresist_and_ARC_Etching_.28Panasonic_1.29 R]
 +
|[https://wiki.nanotech.ucsb.edu/wiki/ICP_Etching_Recipes#Photoresist_and_ARC_etching_.28Panasonic_2.29 R]
 
|
 
|
|[https://wiki.nanotech.ucsb.edu/wiki/index.php/ICP_Etching_Recipes#Photoresist_and_ARC_Etching R]
 
|[https://wiki.nanotech.ucsb.edu/wiki/index.php/ICP_Etching_Recipes#Photoresist_and_ARC_etching_2 R]
 
 
|
 
|
 
|A
 
|A
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|
 
|A
 
|A
|-
+
|- bgcolor="#eeffff"
 
! bgcolor="#d0e7ff" align="center" |SiC
 
! bgcolor="#d0e7ff" align="center" |SiC
 
|
 
|
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|{{rl|ICP Etching Recipes|SiC Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|SiC Etch (Panasonic 1)}}
 
|A
 
|A
 +
|
 
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|
 
|
 
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|
 
|A
 
|A
|-
+
|- bgcolor="#ffffff"
 
! bgcolor="#d0e7ff" align="center" |SiN
 
! bgcolor="#d0e7ff" align="center" |SiN
 
|
 
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|A
 
|{{rl|ICP Etching Recipes|SiNx Etching (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|SiNx Etching (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|SiNx Etching (Panasonic 2)}}
 
|{{rl|ICP Etching Recipes|SiNx Etching (Panasonic 2)}}
 +
|
 
|
 
|
 
|A
 
|A
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|{{rl|ICP Etching Recipes|SiO2 Etching (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|SiO2 Etching (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|SiO2 Etching (Panasonic 2)}}
 
|{{rl|ICP Etching Recipes|SiO2 Etching (Panasonic 2)}}
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|{{rl|Other Dry Etching Recipes|Other Dry Etch (Vapor HF Etcher)}}
 
|{{rl|Other Dry Etching Recipes|Other Dry Etch (Vapor HF Etcher)}}
 
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|[https://www.osapublishing.org/optica/abstract.cfm?uri=optica-4-5-532 A]
 
|[https://www.osapublishing.org/optica/abstract.cfm?uri=optica-4-5-532 A]
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|- bgcolor="#eeffff"
 
! bgcolor="#d0e7ff" align="center" |'''Material'''
 
! bgcolor="#d0e7ff" align="center" |'''Material'''
| bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_2_.28MRC.29|RIE 2<br> (MRC)]]
+
| bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_2_.28MRC.29|RIE 2<br> <span style="font-size: 88%;">(MRC)</span>]]
| bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_3_.28MRC.29|RIE 3<br> (MRC)]]
+
| bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_3_.28MRC.29|RIE 3<br> <span style="font-size: 88%;">(MRC)</span>]]
| bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_5_.28PlasmaTherm.29|RIE 5<br>(PlasmaTherm)]]
+
| bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_5_.28PlasmaTherm.29|RIE 5<br><span style="font-size: 88%;">(PlasmaTherm)</span>]]
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#DSEIII_.28PlasmaTherm.2FDeep_Silicon_Etcher.29|DSEIII<br>(PlasmaTherm)]]
+
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#DSEIII_.28PlasmaTherm.2FDeep_Silicon_Etcher.29|DSEIII<br><span style="font-size: 88%;">(PlasmaTherm)</span>]]
| bgcolor="#daf1ff" |[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|SLR Fluorine ICP (PlasmaTherm)]]
+
| bgcolor="#daf1ff" |[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|Fluorine ICP <span style="font-size: 88%;">(PlasmaTherm)</span>]]
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP_Etch_1_.28Panasonic_E626I.29|ICP Etch 1<br>(Panasonic E626I)]]
+
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP_Etch_1_.28Panasonic_E626I.29|ICP Etch 1<br><span style="font-size: 88%;">(Panasonic E626I)</span>]]
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP_Etch_2_.28Panasonic_E640.29|ICP Etch 2<br>(Panasonic E640)]]
+
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP_Etch_2_.28Panasonic_E640.29|ICP Etch 2<br><span style="font-size: 88%;">(Panasonic E640)</span>]]
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP-Etch_.28Unaxis_VLR.29|ICP-Etch<br>(Unaxis VLR)]]
+
| bgcolor="#daf1ff" |[[ICP Etching Recipes#Oxford ICP Etcher .28PlasmaPro 100 Cobra.29|Oxford ICP <span style="font-size: 88%;">(PlasmaPro 100)</span>]]
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Ashers_.28Technics_PEII.29|Ashers<br>(Technics PEII)]]
+
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP-Etch_.28Unaxis_VLR.29|ICP-Etch<br><span style="font-size: 88%;">(Unaxis VLR)</span>]]
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Clean_.28Gasonics_2000.29|Plasma Clean<br>(Gasonics 2000)]]
+
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Ashers_.28Technics_PEII.29|Ashers<br><span style="font-size: 88%;">(Technics PEII)</span>]]
| width="95" bgcolor="#daf1ff" |[[Oxygen Plasma System Recipes#Plasma Clean .28YES EcoClean.29|Plasma Clean (YES EcoClean)]]
+
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Clean_.28Gasonics_2000.29|Plasma Clean<br><span style="font-size: 88%;">(Gasonics 2000)</span>]]
 +
| bgcolor="#daf1ff" |[[Oxygen Plasma System Recipes#Plasma Clean .28YES EcoClean.29|Plasma Clean <span style="font-size: 88%;">(YES EcoClean)</span>]]
 
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]]
 
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]]
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Activation_.28EVG_810.29|Plasma Activation<br>(EVG 810)]]
+
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Activation_.28EVG_810.29|Plasma Activation<br><span style="font-size: 88%;">(EVG 810)</span>]]
| bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#XeF2_Etch_.28Xetch.29|XeF2 Etch<br>(Xetch)]]
+
| bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#XeF2_Etch_.28Xetch.29|XeF2 Etch<br><span style="font-size: 88%;">(Xetch)</span>]]
| bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#Vapor_HF_Etch_.28uETCH.29|Vapor HF Etch<br>(uETCH)]]
+
| bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#Vapor_HF_Etch_.28uETCH.29|Vapor HF Etch<br><span style="font-size: 88%;">(uETCH)</span>]]
| bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29|CAIBE<br>(Oxford)]]
+
| bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29|CAIBE<br><span style="font-size: 88%;">(Oxford)</span>]]
 
|}
 
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[[Category:Processing]]
 
[[Category:Processing]]

Latest revision as of 14:18, 11 September 2021

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.
Dry Etching Recipes
RIE Etching ICP Etching Oxygen Plasma Systems Other Dry Etchers
Material RIE 2
(MRC)
RIE 3
(MRC)
RIE 5
(PlasmaTherm)
DSEIII
(PlasmaTherm)
Fluorine ICP (PlasmaTherm) ICP Etch 1
(Panasonic E626I)
ICP Etch 2
(Panasonic E640)
Oxford ICP (PlasmaPro 100) ICP-Etch
(Unaxis VLR)
Ashers
(Technics PEII)
Plasma Clean
(Gasonics 2000)
Plasma Clean (YES EcoClean) UV Ozone Reactor Plasma Activation
(EVG 810)
XeF2 Etch
(Xetch)
Vapor HF Etch
(uETCH)
CAIBE
(Oxford)
Ag A
Al A R R A
Au R
Cr A R A A
Cu A
Ge A A
Mo A
Ni R
Pt R
Ru A R A
Si R R A R A
Ta A
Ti R A A
Al2O3 R A
Al2O3 (Sapphire) R A A
AlGaAs R R R A
AlGaN R A
AlN R A
CdZnTe R A
GaAs R R R A R A
GaN R R A R A
GaSb A R A
HfO2 A
InGaAlAs R A R A
InGaAsP R R R A
InP R A A R R R
ITO R A
Photoresist

& ARC

A R R R R A A A A
SiC R A A
SiN R A R R A A
SiO2 R R R R R A
SiOxNy A A A
Ta2O5 A A
TiN A
TiO2 A
W-TiW R A A
ZnO2 A
ZnS R A
ZnSe R A
ZrO2 A
Material RIE 2
(MRC)
RIE 3
(MRC)
RIE 5
(PlasmaTherm)
DSEIII
(PlasmaTherm)
Fluorine ICP (PlasmaTherm) ICP Etch 1
(Panasonic E626I)
ICP Etch 2
(Panasonic E640)
Oxford ICP (PlasmaPro 100) ICP-Etch
(Unaxis VLR)
Ashers
(Technics PEII)
Plasma Clean
(Gasonics 2000)
Plasma Clean (YES EcoClean) UV Ozone Reactor Plasma Activation
(EVG 810)
XeF2 Etch
(Xetch)
Vapor HF Etch
(uETCH)
CAIBE
(Oxford)