Difference between revisions of "Dry Etching Recipes"

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| width="85" bgcolor="#DAF1FF" | [[Plasma Activation (EVG 810)|Plasma Activation<br>(EVG 810)]]
 
| width="85" bgcolor="#DAF1FF" | [[Plasma Activation (EVG 810)|Plasma Activation<br>(EVG 810)]]
 
| width="85" bgcolor="#DAF1FF" | [[XeF2 Etch (Xetch)|XeF2 Etch<br>(Xetch)]]
 
| width="85" bgcolor="#DAF1FF" | [[XeF2 Etch (Xetch)|XeF2 Etch<br>(Xetch)]]
| width="85" bgcolor="#DAF1FF" | [[Vapor HF Etch (uETCH)|Vapor HF Etch<br>(uETCH)]]
+
| width="85" bgcolor="#DAF1FF" | [[Vapor HF Etch |Vapor HF Etch<br>(uETCH)]]
 
|-bgcolor ="#EEFFFF"
 
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | Al
 
! bgcolor="#D0E7FF" align="center" | Al

Revision as of 17:07, 30 January 2014