Difference between revisions of "Dry Etching Recipes"
Jump to navigation
Jump to search
(156 intermediate revisions by 6 users not shown) | |||
Line 1: | Line 1: | ||
+ | {{Recipe Table Explanation}} |
||
− | {| border="1" class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center; font-size: 95%" |
||
+ | {| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center; font-size: 95%" border="1" |
||
− | |- bgcolor="#D0E7FF" |
||
+ | |- bgcolor="#d0e7ff" |
||
− | ! width="725" height="45" colspan="15" | <div style="font-size: 150%;">Dry Etching Recipes</div> |
||
+ | ! colspan="17" width="725" height="45" |<div style="font-size: 150%;">Dry Etching Recipes</div> |
||
− | |- bgcolor="#D0E7FF" |
||
+ | |- bgcolor="#d0e7ff" |
||
− | | <!-- INTENTIONALLY LEFT BLANK --> |
||
+ | |<!-- INTENTIONALLY LEFT BLANK --> |
||
− | ! width="300" bgcolor="#D0E7FF" align="center" height="35" colspan="4" | '''[[RIE Etching Recipes|RIE Etching]]''' |
||
− | ! |
+ | ! colspan="3" |'''[[RIE Etching Recipes|RIE Etching]]''' |
− | ! |
+ | ! colspan="5" |'''[[ICP Etching Recipes|ICP Etching]]''' |
− | ! bgcolor="# |
+ | ! colspan="5" bgcolor="#d0e7ff" align="center" |'''[[Oxygen Plasma System Recipes|Oxygen Plasma Systems]]''' |
+ | ! colspan="3" bgcolor="#d0e7ff" align="center" |'''[[Other Dry Etching Recipes|Other Dry Etchers]]''' |
||
|- |
|- |
||
− | ! width="65" bgcolor="# |
+ | ! width="65" bgcolor="#d0e7ff" align="center" |'''Material''' |
− | | width="65" bgcolor="# |
+ | | width="65" bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_2_.28MRC.29|RIE 2<br> (MRC)]] |
− | | width="65" bgcolor="# |
+ | | width="65" bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_3_.28MRC.29|RIE 3<br> (MRC)]] |
− | | width=" |
+ | | width="100" bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_5_.28PlasmaTherm.29|RIE 5<br>(PlasmaTherm)]] |
− | | width="100" bgcolor="# |
+ | | width="100" bgcolor="#daf1ff" |[[ICP_Etching_Recipes#DSEIII_.28PlasmaTherm.2FDeep_Silicon_Etcher.29|DSEIII<br>(PlasmaTherm)]] |
+ | | width="100" bgcolor="#daf1ff" |[https://wiki.nanotech.ucsb.edu/wiki/index.php/ICP_Etching_Recipes#PlasmaTherm.2FSLR_Fluorine_Etcher SLR Fluorine ICP (PlasmaTherm)] |
||
− | | width="160" bgcolor="#DAF1FF" | [[Si Deep RIE (PlasmaTherm/Bosch Etch)|Si Deep RIE<br>(PlasmaTherm/Bosch Etch)]] |
||
− | | width="120" bgcolor="# |
+ | | width="120" bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP_Etch_1_.28Panasonic_E626I.29|ICP Etch 1<br>(Panasonic 1)]] |
− | | width="120" bgcolor="# |
+ | | width="120" bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP_Etch_2_.28Panasonic_E640.29|ICP Etch 2<br>(Panasonic 2)]] |
− | | width="85" bgcolor="# |
+ | | width="85" bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP-Etch_.28Unaxis_VLR.29|ICP-Etch<br>(Unaxis VLR)]] |
− | | width="85" bgcolor="# |
+ | | width="85" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Ashers_.28Technics_PEII.29|Ashers<br>(Technics PEII)]] |
− | | width="95" bgcolor="# |
+ | | width="95" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Clean_.28Gasonics_2000.29|Plasma Clean<br>(Gasonics 2000)]] |
− | | width=" |
+ | | width="95" bgcolor="#daf1ff" |[[Oxygen Plasma System Recipes#Plasma Clean .28YES EcoClean.29|Plasma Clean (YES EcoClean)]] |
− | | width="85" bgcolor="# |
+ | | width="85" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]] |
− | | width="85" bgcolor="# |
+ | | width="85" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Activation_.28EVG_810.29|Plasma Activation<br>(EVG 810)]] |
+ | | width="85" bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#XeF2_Etch_.28Xetch.29|XeF2 Etch<br>(Xetch)]] |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | width="85" bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#Vapor_HF_Etch_.28uETCH.29|Vapor HF Etch<br>(uETCH)]] |
||
− | ! bgcolor="#D0E7FF" align="center" | Al |
||
+ | | width="85" bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29|CAIBE<br>(Oxford)]] |
||
− | | |
||
+ | |- bgcolor="#eeffff" |
||
− | | |
||
+ | ! bgcolor="#d0e7ff" align="center" |Ag |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
+ | |- bgcolor="#eeffff" |
||
+ | ! bgcolor="#d0e7ff" align="center" |Al |
||
+ | | |
||
+ | | |
||
+ | |[[RIE Etching Recipes|A]] |
||
+ | | |
||
+ | | |
||
+ | |{{rl|ICP Etching Recipes|Al Etch (Panasonic 1)}} |
||
+ | |{{rl|ICP Etching Recipes|Al Etch (Panasonic 2)}} |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
+ | |- bgcolor="#eeffff" |
||
+ | ! bgcolor="#d0e7ff" align="center" |Au |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}} |
||
+ | |- bgcolor="#eeffff" |
||
+ | ! bgcolor="#d0e7ff" align="center" |Cr |
||
+ | | |
||
+ | | |
||
+ | |A |
||
+ | | |
||
+ | | |
||
+ | |{{rl|ICP Etching Recipes|Cr Etch (Panasonic 1)}} |
||
+ | |A |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
+ | |- bgcolor="#eeffff" |
||
+ | ! bgcolor="#d0e7ff" align="center" |Cu |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |Ge |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | |A |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | Cr |
||
− | | |
+ | |A |
+ | |- bgcolor="#eeffff" |
||
− | | |
||
+ | ! bgcolor="#d0e7ff" align="center" |Mo |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |Ni |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | Ag |
||
+ | |{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}} |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |Pt |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | Mo |
||
+ | |{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}} |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |Ru |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | |A |
+ | |{{Rl|ICP Etching Recipes|Ru (Ruthenium) Etch (Panasonic 2)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | W |
||
− | | |
+ | |A |
+ | |- bgcolor="#eeffff" |
||
− | | |
||
+ | ! bgcolor="#d0e7ff" align="center" |Si |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | |{{rl|ICP Etching Recipes|DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)}} |
||
− | | |
||
+ | |{{Rl|ICP Etching Recipes|Si Etching}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
+ | | |
||
+ | | |
||
+ | |{{rl|Other Dry Etching Recipes|Other Dry Etch (XeF2 Etcher)}} |
||
+ | | |
||
+ | |A |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |Ta |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | HfO<sub>2</sub> |
||
− | | |
+ | |A |
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |Ti |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | |{{rl|ICP Etching Recipes|Ti Etch (Panasonic 1)}} |
||
− | | |
||
− | | |
+ | |A |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | SiO<sub>2</sub> |
||
− | | |
+ | |A |
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |Al<sub>2</sub>O<sub>3</sub> |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | |[https://wiki.nanotech.ucsb.edu/wiki/index.php/ICP_Etching_Recipes#Al2O3_Etching_.28Panasonic_2.29 R] |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | SiOxNy |
||
− | | |
+ | |A |
+ | |- bgcolor="#eeffff" |
||
− | | |
||
+ | ! bgcolor="#d0e7ff" align="center" |Al<sub>2</sub>O<sub>3 (Sapphire)</sub> |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | |{{rl|ICP Etching Recipes|Sapphire Etch (Panasonic 1)}} |
||
− | | |
||
− | | |
+ | |A |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |AlGaAs |
− | | |
+ | | |
− | | |
+ | | |
+ | |{{rl|RIE Etching Recipes|AlGaAs\GaAs Etching (RIE 5)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
+ | |{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}} |
||
− | | |
||
− | | |
+ | | |
+ | |{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|AlGaAs Etch (Unaxis VLR)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | TiO<sub>2</sub> |
||
− | | |
+ | |A |
+ | |- bgcolor="#eeffff" |
||
− | | |
||
+ | ! bgcolor="#d0e7ff" align="center" |AlGaN |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | |{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |AlN |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | |{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | ZnO<sub>2</sub> |
||
− | | |
+ | |A |
+ | |- bgcolor="#eeffff" |
||
− | | |
||
+ | ! bgcolor="#d0e7ff" align="center" |CdZnTe |
||
− | | |
||
+ | |{{rl|RIE Etching Recipes|CdZnTe Etch (RIE 2)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
+ | |- bgcolor="#eeffff" |
||
+ | ! bgcolor="#d0e7ff" align="center" |GaAs |
||
+ | | |
||
+ | | |
||
+ | |{{rl|RIE Etching Recipes|AlGaAs\GaAs Etching (RIE 5)}} |
||
+ | | |
||
+ | | |
||
+ | |{{rl|ICP Etching Recipes|GaAs-AlGaAs_Etch_.28Panasonic_1.29}} |
||
+ | |{{rl|ICP Etching Recipes|GaAs Etch (Panasonic 2)}} |
||
+ | |{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|GaAs Etch (Unaxis VLR)}} |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |GaN |
− | | |
+ | | |
− | | |
+ | | |
+ | |{{rl|RIE Etching Recipes|GaN Etching (RIE 5)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
+ | |{{rl|ICP Etching Recipes|GaN Etch (Panasonic 1)}} |
||
− | | |
||
− | | |
+ | | |
+ | |{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | GaAs |
||
− | | |
+ | |A |
+ | |- bgcolor="#eeffff" |
||
− | | |
||
+ | ! bgcolor="#d0e7ff" align="center" |GaSb |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | |A |
+ | |{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaSb Etch Unaxis VLR)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
+ | |- bgcolor="#eeffff" |
||
+ | ! bgcolor="#d0e7ff" align="center" |HfO<sub>2</sub> |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
+ | |- bgcolor="#eeffff" |
||
+ | ! bgcolor="#d0e7ff" align="center" |InGaAlAs |
||
+ | |{{rl|RIE Etching Recipes|RIE 2 (MRC)|InP-InGaAsP-InGaAlAs Etching (RIE 2)|InP Etch (RIE 2)}} |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}} |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |InGaAsP |
+ | |{{rl|RIE Etching Recipes|RIE 2 (MRC)|InP-InGaAsP-InGaAlAs Etching (RIE 2)|InP Etch (RIE 2)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | |{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | InGaAlAs |
||
− | | |
+ | |A |
+ | |- bgcolor="#eeffff" |
||
− | | |
||
+ | ! bgcolor="#d0e7ff" align="center" |InP |
||
− | | |
||
+ | |{{rl|RIE Etching Recipes|RIE 2 (MRC)|InP-InGaAsP-InGaAlAs Etching (RIE 2)|InP Etch (RIE 2)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | |A |
− | | |
+ | |A |
+ | |{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}} |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |ITO |
+ | |{{rl|RIE Etching Recipes|ITO Etch (RIE 2)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | InP |
||
− | | |
+ | |A |
+ | |- bgcolor="#eeffff" |
||
− | | |
||
+ | !Photoresist |
||
− | | |
||
+ | & ARC |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | |A |
+ | |[https://wiki.nanotech.ucsb.edu/wiki/index.php/RIE_Etching_Recipes#Photoresist_and_ARC R] |
||
− | | |
||
+ | | |
||
− | | {{rl|ICP Etching Recipes|InP Etch (Unaxis VLR)}} |
||
− | | |
+ | | |
+ | |[https://wiki.nanotech.ucsb.edu/wiki/index.php/ICP_Etching_Recipes#Photoresist_and_ARC_Etching R] |
||
− | | |
||
+ | |[https://wiki.nanotech.ucsb.edu/wiki/index.php/ICP_Etching_Recipes#Photoresist_and_ARC_etching_2 R] |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | |A |
+ | |A |
||
+ | |A |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |SiC |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | |{{rl|ICP Etching Recipes|SiC Etch (Panasonic 1)}} |
||
− | | |
||
− | | |
+ | |A |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | AlGaN |
||
− | | |
+ | |A |
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |SiN |
− | | |
+ | | |
+ | |{{rl|RIE Etching Recipes|RIE 3 (MRC)|SiN<sub>x</sub> Etching (RIE 3)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | |{{rl|ICP Etching Recipes|SiNx Etching (Panasonic 1)}} |
||
− | | |
||
+ | |{{rl|ICP Etching Recipes|SiNx Etching (Panasonic 2)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | |A |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | GaN |
||
− | | |
+ | |A |
+ | |- bgcolor="#eeffff" |
||
− | | |
||
+ | ! bgcolor="#d0e7ff" align="center" |SiO<sub>2</sub> |
||
− | | |
||
− | | |
+ | | |
+ | |{{rl|RIE Etching Recipes|RIE 3 (MRC)|SiO<sub>2</sub> Etching (RIE 3)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
+ | |{{rl|ICP Etching Recipes|SiO2 Etching (Fluorine ICP Etcher)}} |
||
− | | |
||
+ | |{{rl|ICP Etching Recipes|SiO2 Etching (Panasonic 1)}} |
||
− | | |
||
+ | |{{rl|ICP Etching Recipes|SiO2 Etching (Panasonic 2)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |{{rl|Other Dry Etching Recipes|Other Dry Etch (Vapor HF Etcher)}} |
||
+ | |A |
||
+ | |- bgcolor="#eeffff" |
||
+ | ! bgcolor="#d0e7ff" align="center" |SiOxNy |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
+ | |A |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |Ta<sub>2</sub>O<sub>5</sub> |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | |[https://www.osapublishing.org/optica/abstract.cfm?uri=optica-4-5-532 A] |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | AlN |
||
− | | |
+ | |A |
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |TiN |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | CdTe |
||
− | | |
+ | |A |
+ | |- bgcolor="#eeffff" |
||
− | | |
||
+ | ! bgcolor="#d0e7ff" align="center" |TiO<sub>2</sub> |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
+ | |- bgcolor="#eeffff" |
||
+ | ! bgcolor="#d0e7ff" align="center" |W-TiW |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |{{rl|ICP Etching Recipes|W-TiW Etch (Panasonic 1)}} |
||
+ | |A |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
+ | |- bgcolor="#eeffff" |
||
+ | ! bgcolor="#d0e7ff" align="center" |ZnO<sub>2</sub> |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | |A |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |ZnS |
+ | |{{rl|RIE Etching Recipes|ZnS Etching (RIE 2)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | Si |
||
− | | |
+ | |A |
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
− | | |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |ZnSe |
+ | |{{rl|RIE Etching Recipes|ZnS Etching (RIE 2)}} |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
− | |-bgcolor ="#EEFFFF" |
||
+ | | |
||
− | ! bgcolor="#D0E7FF" align="center" | Sapphire |
||
− | | |
+ | |A |
− | | |
+ | |- |
+ | ! bgcolor="#d0e7ff" align="center" |ZrO<sub>2</sub> |
||
− | | |
||
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
− | | |
+ | | |
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
+ | | |
||
| |
| |
||
+ | |A |
||
|- |
|- |
||
− | ! bgcolor="# |
+ | ! bgcolor="#d0e7ff" align="center" |'''Material''' |
− | | bgcolor="# |
+ | | bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_2_.28MRC.29|RIE 2<br> (MRC)]] |
− | | bgcolor="# |
+ | | bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_3_.28MRC.29|RIE 3<br> (MRC)]] |
− | | bgcolor="# |
+ | | bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_5_.28PlasmaTherm.29|RIE 5<br>(PlasmaTherm)]] |
− | | bgcolor="# |
+ | | bgcolor="#daf1ff" |[[ICP_Etching_Recipes#DSEIII_.28PlasmaTherm.2FDeep_Silicon_Etcher.29|DSEIII<br>(PlasmaTherm)]] |
− | | bgcolor="# |
+ | | bgcolor="#daf1ff" |[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|SLR Fluorine ICP (PlasmaTherm)]] |
− | | bgcolor="# |
+ | | bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP_Etch_1_.28Panasonic_E626I.29|ICP Etch 1<br>(Panasonic E626I)]] |
− | | bgcolor="# |
+ | | bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP_Etch_2_.28Panasonic_E640.29|ICP Etch 2<br>(Panasonic E640)]] |
− | | bgcolor="# |
+ | | bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP-Etch_.28Unaxis_VLR.29|ICP-Etch<br>(Unaxis VLR)]] |
− | | bgcolor="# |
+ | | bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Ashers_.28Technics_PEII.29|Ashers<br>(Technics PEII)]] |
− | | bgcolor="# |
+ | | bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Clean_.28Gasonics_2000.29|Plasma Clean<br>(Gasonics 2000)]] |
+ | | width="95" bgcolor="#daf1ff" |[[Oxygen Plasma System Recipes#Plasma Clean .28YES EcoClean.29|Plasma Clean (YES EcoClean)]] |
||
− | | bgcolor="#DAF1FF" | [[UV Ozone Reactor]] |
||
− | | bgcolor="# |
+ | | bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]] |
− | | bgcolor="# |
+ | | bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Activation_.28EVG_810.29|Plasma Activation<br>(EVG 810)]] |
+ | | bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#XeF2_Etch_.28Xetch.29|XeF2 Etch<br>(Xetch)]] |
||
+ | | bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#Vapor_HF_Etch_.28uETCH.29|Vapor HF Etch<br>(uETCH)]] |
||
+ | | bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29|CAIBE<br>(Oxford)]] |
||
|} |
|} |
||
+ | |||
+ | [[Category:Processing]] |
Revision as of 16:32, 4 February 2021
- R = Recipe is available. Clicking this link will take you to the recipe.
- A = Material is available for use, but no recipes are provided.