Difference between revisions of "Dry Etching Recipes"

From UCSB Nanofab Wiki
Jump to: navigation, search
 
(76 intermediate revisions by 4 users not shown)
Line 1: Line 1:
 
{{Recipe Table Explanation}}
 
{{Recipe Table Explanation}}
{| border="1" class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center; font-size: 95%"
+
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center; font-size: 95%" border="1"
|- bgcolor="#D0E7FF"
+
|- bgcolor="#d0e7ff"
! width="725" height="45" colspan="16" | <div style="font-size: 150%;">Dry Etching Recipes</div>
+
! colspan="17" width="725" height="45" |<div style="font-size: 150%;">Dry Etching Recipes</div>
|- bgcolor="#D0E7FF"
+
|- bgcolor="#d0e7ff"
| <!-- INTENTIONALLY LEFT BLANK -->
+
|<!-- INTENTIONALLY LEFT BLANK -->
! width="300" bgcolor="#D0E7FF" align="center" height="35" colspan="4" | '''[[RIE Etching Recipes|RIE Etching]]'''
+
! colspan="3" |'''[[RIE Etching Recipes|RIE Etching]]'''
! width="300" bgcolor="#D0E7FF" align="center" colspan="4" | '''[[ICP Etching Recipes|ICP Etching]]'''
+
! colspan="5" |'''[[ICP Etching Recipes|ICP Etching]]'''
! bgcolor="#D0E7FF" align="center" colspan="4"|'''[[Oxygen Plasma System Recipes|Oxygen Plasma Systems]]'''
+
! colspan="5" bgcolor="#d0e7ff" align="center" |'''[[Oxygen Plasma System Recipes|Oxygen Plasma Systems]]'''
! bgcolor="#D0E7FF" align="center" colspan="3" |'''[[Other Dry Etching Recipes|Other Dry Etchers]]'''
+
! colspan="3" bgcolor="#d0e7ff" align="center" |'''[[Other Dry Etching Recipes|Other Dry Etchers]]'''
 
|-
 
|-
! width="65" bgcolor="#D0E7FF" align="center" | '''Material'''
+
! width="65" bgcolor="#d0e7ff" align="center" |'''Material'''
| width="65" bgcolor="#DAF1FF" | [[RIE 1 (Retired)|RIE 1<br>(Custom)]]
+
| width="65" bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_2_.28MRC.29|RIE 2<br> (MRC)]]
| width="65" bgcolor="#DAF1FF" | [[RIE 2 (MRC)|RIE 2<br> (MRC)]]
+
| width="65" bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_3_.28MRC.29|RIE 3<br> (MRC)]]
| width="65" bgcolor="#DAF1FF" | [[RIE 3 (MRC)|RIE 3<br> (MRC)]]
+
| width="100" bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_5_.28PlasmaTherm.29|RIE 5<br>(PlasmaTherm)]]
| width="100" bgcolor="#DAF1FF" | [[RIE 5 (PlasmaTherm)|RIE 5<br>(PlasmaTherm)]]
+
| width="100" bgcolor="#daf1ff" |[[ICP_Etching_Recipes#DSEIII_.28PlasmaTherm.2FDeep_Silicon_Etcher.29|DSEIII<br>(PlasmaTherm)]]
| width="100" bgcolor="#DAF1FF" | [[Si Deep RIE (PlasmaTherm/Bosch Etch)|Si Deep RIE<br>(PTI/Bosch)]]
+
| width="100" bgcolor="#daf1ff" |[https://wiki.nanotech.ucsb.edu/wiki/index.php/ICP_Etching_Recipes#PlasmaTherm.2FSLR_Fluorine_Etcher SLR Fluorine ICP (PlasmaTherm)]
| width="120" bgcolor="#DAF1FF" | [[ICP Etch 1 (Panasonic E626I)|ICP Etch 1<br>(Panasonic 1)]]
+
| width="120" bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP_Etch_1_.28Panasonic_E626I.29|ICP Etch 1<br>(Panasonic 1)]]
| width="120" bgcolor="#DAF1FF" | [[ICP Etch 2 (Panasonic E640)|ICP Etch 2<br>(Panasonic 2)]]
+
| width="120" bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP_Etch_2_.28Panasonic_E640.29|ICP Etch 2<br>(Panasonic 2)]]
| width="85" bgcolor="#DAF1FF" | [[ICP-Etch (Unaxis VLR)|ICP-Etch<br>(Unaxis VLR)]]
+
| width="85" bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP-Etch_.28Unaxis_VLR.29|ICP-Etch<br>(Unaxis VLR)]]
| width="85" bgcolor="#DAF1FF" | [[Ashers (Technics PEII)|Ashers<br>(Technics PEII)]]
+
| width="85" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Ashers_.28Technics_PEII.29|Ashers<br>(Technics PEII)]]
| width="95" bgcolor="#DAF1FF" | [[Plasma Clean (Gasonics 2000)|Plasma Clean<br>(Gasonics 2000)]]
+
| width="95" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Clean_.28Gasonics_2000.29|Plasma Clean<br>(Gasonics 2000)]]
| width="85" bgcolor="#DAF1FF" | [[UV Ozone Reactor]]
+
| width="95" bgcolor="#daf1ff" |[[Oxygen Plasma System Recipes#Plasma Clean .28YES EcoClean.29|Plasma Clean (YES EcoClean)]]
| width="85" bgcolor="#DAF1FF" | [[Plasma Activation (EVG 810)|Plasma Activation<br>(EVG 810)]]
+
| width="85" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]]
| width="85" bgcolor="#DAF1FF" | [[XeF2 Etch (Xetch)|XeF2 Etch<br>(Xetch)]]
+
| width="85" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Activation_.28EVG_810.29|Plasma Activation<br>(EVG 810)]]
| width="85" bgcolor="#DAF1FF" | [[Vapor HF Etch|Vapor HF Etch<br>(uETCH)]]
+
| width="85" bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#XeF2_Etch_.28Xetch.29|XeF2 Etch<br>(Xetch)]]
| width="85" bgcolor="#DAF1FF" | [[CAIBE (Oxford Ion Mill)|CAIBE<br>(Oxford)]]
+
| width="85" bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#Vapor_HF_Etch_.28uETCH.29|Vapor HF Etch<br>(uETCH)]]
  +
| width="85" bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29|CAIBE<br>(Oxford)]]
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | Al
+
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |Ag
|
 
|
 
|
 
| [[RIE Etching Recipes|A]]
 
|
 
| {{rl|ICP Etching Recipes|Al Etch(Panasonic 1)}}
 
| {{rl|ICP Etching Recipes|Al Etch(Panasonic 2)}}
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
|
 
|
 
|-
 
! bgcolor="#D0E7FF" align="center" | Ti
 
|
 
|
 
|
 
|
 
|
 
| {{rl|ICP Etching Recipes|Ti Etch(Panasonic 1)}}
 
| A
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
|
 
 
|
 
|
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | Cr
 
|
 
|
 
|
 
| A
 
|
 
| {{rl|ICP Etching Recipes|Cr Etch(Panasonic 1)}}
 
| A
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
 
|
 
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |Al
  +
|
  +
|
  +
|[[RIE Etching Recipes|A]]
  +
|
  +
|
  +
|{{rl|ICP Etching Recipes|Al Etch (Panasonic 1)}}
  +
|{{rl|ICP Etching Recipes|Al Etch (Panasonic 2)}}
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |Au
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}}
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |Cr
  +
|
  +
|
  +
|A
  +
|
  +
|
  +
|{{rl|ICP Etching Recipes|Cr Etch (Panasonic 1)}}
  +
|A
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |Cu
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | Ge
+
! bgcolor="#d0e7ff" align="center" |Ge
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
  +
|A
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |Mo
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
 
|
 
|
 
|
 
|
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | Ag
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
 
|
 
|
  +
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | Pt
+
! bgcolor="#d0e7ff" align="center" |Ni
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
 
|
 
|
|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}}
 
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | Au
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
 
|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}}
 
|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}}
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | Ni
+
! bgcolor="#d0e7ff" align="center" |Pt
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
  +
|
 
|
 
|
 
|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}}
 
|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}}
 
|-
 
|-
  +
! bgcolor="#d0e7ff" align="center" |Ru
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | Cu
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
 
|
 
|
|-
 
! bgcolor="#D0E7FF" align="center" | Ru
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
 
|
 
|
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | Mo
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
  +
|A
  +
|{{Rl|ICP Etching Recipes|Ru (Ruthenium) Etch (Panasonic 2)}}
 
|
 
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |Si
  +
|
  +
|
  +
|
  +
|{{rl|ICP Etching Recipes|DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)}}
  +
|{{Rl|ICP Etching Recipes|Si Etching}}
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|{{rl|Other Dry Etching Recipes|Other Dry Etch (XeF2 Etcher)}}
  +
|
  +
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | Ta
+
! bgcolor="#d0e7ff" align="center" |Ta
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
 
|
 
|
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | W-TiW
 
|
 
|
 
|
 
|
 
|
 
| {{rl|ICP Etching Recipes|W-TiW Etch(Panasonic 1)}}
 
| A
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
 
|
 
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | Al<sub>2</sub>O<sub>3</sub>
+
! bgcolor="#d0e7ff" align="center" |Ti
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
  +
|{{rl|ICP Etching Recipes|Ti Etch (Panasonic 1)}}
|
 
|
+
|A
|
+
|
|
+
|
|
+
|
|
+
|
|
 
|
 
 
|
 
|
 
|
 
|
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | HfO<sub>2</sub>
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
 
|
 
|
  +
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | ITO
+
! bgcolor="#d0e7ff" align="center" |Al<sub>2</sub>O<sub>3</sub>
|
 
| {{rl|RIE Etching Recipes|ITO Etch (RIE 2)}}
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
 
|
 
|
|
 
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | SiO<sub>2</sub>
 
|
 
|
 
|
 
|
 
|
 
| {{rl|ICP Etching Recipes|SIO2Etch(Panasonic 1)}}
 
| {{rl|ICP Etching Recipes|SIO2Etch(Panasonic 2)}}
 
|
 
|
 
|
 
 
|
 
|
|
 
 
|
 
|
| {{rl|Other Dry Etching Recipes|Other Dry Etch (Vapor HF Etcher)}}
 
 
|
 
|
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/index.php/ICP_Etching_Recipes#Al2O3_Etching_.28Panasonic_2.29 R]
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |Al<sub>2</sub>O<sub>3 (Sapphire)</sub>
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|{{rl|ICP Etching Recipes|Sapphire Etch (Panasonic 1)}}
  +
|A
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | SiN
+
! bgcolor="#d0e7ff" align="center" |AlGaAs
|
+
|
|
+
|
  +
|{{rl|RIE Etching Recipes|AlGaAs\GaAs Etching (RIE 5)}}
|
 
|
+
|
|
+
|
| {{rl|ICP Etching Recipes|SINxEtch(Panasonic 1)}}
+
|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
  +
|
| {{rl|ICP Etching Recipes|SINxEtch(Panasonic 2)}}
 
  +
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|AlGaAs Etch (Unaxis VLR)}}
|
 
|
+
|
|
+
|
|
+
|
|
+
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |AlGaN
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}}
  +
|
  +
|
  +
|
 
|
 
|
|
 
 
|
 
|
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | SiOxNy
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
|
 
 
|
 
|
  +
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | Ta<sub>2</sub>O<sub>5</sub>
+
! bgcolor="#d0e7ff" align="center" |AlN
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
 
|
 
|
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | TiO<sub>2</sub>
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
|
 
 
|
 
|
  +
|
  +
|
  +
|
  +
|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}}
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |CdZnTe
  +
|{{rl|RIE Etching Recipes|CdZnTe Etch (RIE 2)}}
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |GaAs
  +
|
  +
|
  +
|{{rl|RIE Etching Recipes|AlGaAs\GaAs Etching (RIE 5)}}
  +
|
  +
|
  +
|{{rl|ICP Etching Recipes|GaAs-AlGaAs_Etch_.28Panasonic_1.29}}
  +
|{{rl|ICP Etching Recipes|GaAs Etch (Panasonic 2)}}
  +
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|GaAs Etch (Unaxis VLR)}}
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | TiN
+
! bgcolor="#d0e7ff" align="center" |GaN
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
|
 
 
|
 
|
  +
|{{rl|RIE Etching Recipes|GaN Etching (RIE 5)}}
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | ZnO<sub>2</sub>
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
|
 
 
|
 
|
  +
|{{rl|ICP Etching Recipes|GaN Etch (Panasonic 1)}}
  +
|
  +
|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}}
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |GaSb
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaSb Etch Unaxis VLR)}}
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |HfO<sub>2</sub>
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |InGaAlAs
  +
|{{rl|RIE Etching Recipes|RIE 2 (MRC)|InP-InGaAsP-InGaAlAs Etching (RIE 2)|InP Etch (RIE 2)}}
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | ZrO<sub>2</sub>
+
! bgcolor="#d0e7ff" align="center" |InGaAsP
  +
|{{rl|RIE Etching Recipes|RIE 2 (MRC)|InP-InGaAsP-InGaAlAs Etching (RIE 2)|InP Etch (RIE 2)}}
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
|
 
 
|
 
|
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | GaAs
 
|
 
|
 
|
 
| {{rl|RIE Etching Recipes|AlGaAs Etch (RIE 5)}}
 
|
 
|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|GaAs Etch (Panasonic 2)}}
 
|{{rl|ICP Etching Recipes|GaAs Etch (Unaxis VLR)}}
 
|
 
|
 
|
 
|
 
 
|
 
|
|
 
 
|
 
|
  +
|
  +
|
  +
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |InP
  +
|{{rl|RIE Etching Recipes|RIE 2 (MRC)|InP-InGaAsP-InGaAlAs Etching (RIE 2)|InP Etch (RIE 2)}}
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|A
  +
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}}
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | AlGaAs
+
! bgcolor="#d0e7ff" align="center" |ITO
  +
|{{rl|RIE Etching Recipes|ITO Etch (RIE 2)}}
|
 
|
 
|
 
|{{rl|RIE Etching Recipes|AlGaAs Etch (RIE 5)}}
 
|
 
|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
 
|
 
|{{rl|ICP Etching Recipes|AlGaAs Etch (Unaxis VLR)}}
 
|
 
|
 
|
 
|
 
 
|
 
|
 
|
 
|
|
 
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | InGaAlAs
 
|
 
| {{rl|RIE Etching Recipes|InP Etch (RIE 2)}}
 
|
 
|
 
|
 
|
 
|
 
| {{rl|ICP Etching Recipes|InP Etch (Unaxis VLR)}}
 
|
 
|
 
|
 
|
 
 
|
 
|
|
 
 
|
 
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
!Photoresist
  +
& ARC
  +
|
  +
|A
  +
|[https://wiki.nanotech.ucsb.edu/wiki/index.php/RIE_Etching_Recipes#Photoresist_and_ARC R]
  +
|
  +
|
  +
|[https://wiki.nanotech.ucsb.edu/wiki/index.php/ICP_Etching_Recipes#Photoresist_and_ARC_Etching R]
  +
|[https://wiki.nanotech.ucsb.edu/wiki/index.php/ICP_Etching_Recipes#Photoresist_and_ARC_etching_2 R]
  +
|
  +
|A
  +
|A
  +
|A
  +
|
  +
|
  +
|
  +
|
  +
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | InGaAsP
+
! bgcolor="#d0e7ff" align="center" |SiC
|
+
|
  +
|
| {{rl|RIE Etching Recipes|InP Etch (RIE 2)}}
 
|
+
|
|
+
|
|
+
|
  +
|{{rl|ICP Etching Recipes|SiC Etch (Panasonic 1)}}
|
 
|
+
|A
|
+
|
|
+
|
|
+
|
|
+
|
|
 
 
|
 
|
|
 
 
|
 
|
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | InP
 
|
 
| {{rl|RIE Etching Recipes|InP Etch (RIE 2)}}
 
|
 
|
 
|
 
|
 
|
 
| {{rl|ICP Etching Recipes|InP Etch (Unaxis VLR)}}
 
|
 
|
 
|
 
|
 
 
|
 
|
|
 
 
|
 
|
  +
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | GaN
+
! bgcolor="#d0e7ff" align="center" |SiN
|
 
|
 
|
 
|{{rl|RIE Etching Recipes|GaN Etch (RIE 5)}}
 
|
 
| {{rl|ICP Etching Recipes|GaN Etch (Panasonic 1)}}
 
|
 
| {{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}}
 
|
 
|
 
|
 
|
 
 
|
 
|
  +
|{{rl|RIE Etching Recipes|RIE 3 (MRC)|SiN<sub>x</sub> Etching (RIE 3)}}
|
 
 
|
 
|
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | AlGaN
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
|
 
 
|
 
|
  +
|{{rl|ICP Etching Recipes|SiNx Etching (Panasonic 1)}}
  +
|{{rl|ICP Etching Recipes|SiNx Etching (Panasonic 2)}}
  +
|
  +
|A
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |SiO<sub>2</sub>
  +
|
  +
|{{rl|RIE Etching Recipes|RIE 3 (MRC)|SiO<sub>2</sub> Etching (RIE 3)}}
  +
|
  +
|
  +
|{{rl|ICP Etching Recipes|SiO2 Etching (Fluorine ICP Etcher)}}
  +
|{{rl|ICP Etching Recipes|SiO2 Etching (Panasonic 1)}}
  +
|{{rl|ICP Etching Recipes|SiO2 Etching (Panasonic 2)}}
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|{{rl|Other Dry Etching Recipes|Other Dry Etch (Vapor HF Etcher)}}
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |SiOxNy
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|A
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | AlN
+
! bgcolor="#d0e7ff" align="center" |Ta<sub>2</sub>O<sub>5</sub>
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
  +
|[https://www.osapublishing.org/optica/abstract.cfm?uri=optica-4-5-532 A]
|
 
|
+
|
|
+
|
|
+
|
|
+
|
|
 
 
|
 
|
 
|
 
|
|
 
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | GaN
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
 
|
 
|
|
+
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | AlGaN
+
! bgcolor="#d0e7ff" align="center" |TiN
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
 
|
 
|
|
 
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | AlN
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
|
 
 
|
 
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |TiO<sub>2</sub>
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |W-TiW
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|{{rl|ICP Etching Recipes|W-TiW Etch (Panasonic 1)}}
  +
|A
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
  +
|- bgcolor="#eeffff"
  +
! bgcolor="#d0e7ff" align="center" |ZnO<sub>2</sub>
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | GaSb
+
! bgcolor="#d0e7ff" align="center" |ZnS
  +
|{{rl|RIE Etching Recipes|ZnS Etching (RIE 2)}}
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
 
|
 
|
|
 
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | CdZnTe
 
|
 
| {{rl|RIE Etching Recipes|CdZnTe Etch (RIE 2)}}
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
 
|
 
|
|
+
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | ZnSe
+
! bgcolor="#d0e7ff" align="center" |ZnSe
  +
|{{rl|RIE Etching Recipes|ZnS Etching (RIE 2)}}
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
|
 
 
|
 
|
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | Si
 
|
 
|
 
|
 
|
 
| {{rl|ICP Etching Recipes|Si Etch (PlasmaTherm/Bosch Etch)}}
 
|
 
|
 
|
 
|
 
|
 
|
 
|
 
| {{rl|Other Dry Etching Recipes|Other Dry Etch (XeF2 Etcher)}}
 
 
|
 
|
 
|
 
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|
  +
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | SiC
+
! bgcolor="#d0e7ff" align="center" |ZrO<sub>2</sub>
|
+
|
|
+
|
|
+
|
|
+
|
|
+
|
  +
|
| {{rl|ICP Etching Recipes|SiC Etch(Panasonic 1)}}
 
| A
+
|
|
+
|
|
+
|
|
+
|
|
 
|
 
 
|
 
|
|
 
 
|
 
|
|-bgcolor ="#EEFFFF"
 
! bgcolor="#D0E7FF" align="center" | Sapphire
 
|
 
|
 
|
 
|
 
|
 
| {{rl|ICP Etching Recipes|Sapphire Etch(Panasonic 1)}}
 
| A
 
|
 
|
 
|
 
|
 
|
 
 
|
 
|
 
|
 
|
 
|
 
|
  +
|A
 
|-
 
|-
! bgcolor="#D0E7FF" align="center" | '''Material'''
+
! bgcolor="#d0e7ff" align="center" |'''Material'''
| bgcolor="#DAF1FF" | [[RIE 1 (Retired)|RIE 1<br>(Custom)]]
+
| bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_2_.28MRC.29|RIE 2<br> (MRC)]]
| bgcolor="#DAF1FF" | [[RIE 2 (MRC)|RIE 2<br> (MRC)]]
+
| bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_3_.28MRC.29|RIE 3<br> (MRC)]]
| bgcolor="#DAF1FF" | [[RIE 3 (MRC)|RIE 3<br> (MRC)]]
+
| bgcolor="#daf1ff" |[[RIE_Etching_Recipes#RIE_5_.28PlasmaTherm.29|RIE 5<br>(PlasmaTherm)]]
| bgcolor="#DAF1FF" | [[RIE 5 (PlasmaTherm)|RIE 5<br>(PlasmaTherm)]]
+
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#DSEIII_.28PlasmaTherm.2FDeep_Silicon_Etcher.29|DSEIII<br>(PlasmaTherm)]]
| bgcolor="#DAF1FF" | [[Si Deep RIE (PlasmaTherm/Bosch Etch)|Si Deep RIE<br>(PlasmaTherm/Bosch Etch)]]
+
| bgcolor="#daf1ff" |[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|SLR Fluorine ICP (PlasmaTherm)]]
| bgcolor="#DAF1FF" | [[ICP Etch 1 (Panasonic E626I)|ICP Etch 1<br>(Panasonic E626I)]]
+
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP_Etch_1_.28Panasonic_E626I.29|ICP Etch 1<br>(Panasonic E626I)]]
| bgcolor="#DAF1FF" | [[ICP Etch 2 (Panasonic E640)|ICP Etch 2<br>(Panasonic E640)]]
+
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP_Etch_2_.28Panasonic_E640.29|ICP Etch 2<br>(Panasonic E640)]]
| bgcolor="#DAF1FF" | [[ICP-Etch (Unaxis VLR)|ICP-Etch<br>(Unaxis VLR)]]
+
| bgcolor="#daf1ff" |[[ICP_Etching_Recipes#ICP-Etch_.28Unaxis_VLR.29|ICP-Etch<br>(Unaxis VLR)]]
| bgcolor="#DAF1FF" | [[Ashers (Technics PEII)|Ashers<br>(Technics PEII)]]
+
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Ashers_.28Technics_PEII.29|Ashers<br>(Technics PEII)]]
| bgcolor="#DAF1FF" | [[Plasma Clean (Gasonics 2000)|Plasma Clean<br>(Gasonics 2000)]]
+
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Clean_.28Gasonics_2000.29|Plasma Clean<br>(Gasonics 2000)]]
  +
| width="95" bgcolor="#daf1ff" |[[Oxygen Plasma System Recipes#Plasma Clean .28YES EcoClean.29|Plasma Clean (YES EcoClean)]]
| bgcolor="#DAF1FF" | [[UV Ozone Reactor]]
 
| bgcolor="#DAF1FF" | [[Plasma Activation (EVG 810)|Plasma Activation<br>(EVG 810)]]
+
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]]
| bgcolor="#DAF1FF" | [[XeF2 Etch (Xetch)|XeF2 Etch<br>(Xetch)]]
+
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Activation_.28EVG_810.29|Plasma Activation<br>(EVG 810)]]
| bgcolor="#DAF1FF" | [[Vapor HF Etch|Vapor HF Etch<br>(uETCH)]]
+
| bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#XeF2_Etch_.28Xetch.29|XeF2 Etch<br>(Xetch)]]
| bgcolor="#DAF1FF" | [[CAIBE (Oxford Ion Mill)|CAIBE<br>(Oxford)]]
+
| bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#Vapor_HF_Etch_.28uETCH.29|Vapor HF Etch<br>(uETCH)]]
  +
| bgcolor="#daf1ff" |[[Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29|CAIBE<br>(Oxford)]]
 
|}
 
|}
   

Latest revision as of 16:32, 4 February 2021

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.
Dry Etching Recipes
RIE Etching ICP Etching Oxygen Plasma Systems Other Dry Etchers
Material RIE 2
(MRC)
RIE 3
(MRC)
RIE 5
(PlasmaTherm)
DSEIII
(PlasmaTherm)
SLR Fluorine ICP (PlasmaTherm) ICP Etch 1
(Panasonic 1)
ICP Etch 2
(Panasonic 2)
ICP-Etch
(Unaxis VLR)
Ashers
(Technics PEII)
Plasma Clean
(Gasonics 2000)
Plasma Clean (YES EcoClean) UV Ozone Reactor Plasma Activation
(EVG 810)
XeF2 Etch
(Xetch)
Vapor HF Etch
(uETCH)
CAIBE
(Oxford)
Ag A
Al A R R A
Au R
Cr A R A A
Cu A
Ge A A
Mo A
Ni R
Pt R
Ru A R A
Si R R R A
Ta A
Ti R A A
Al2O3 R A
Al2O3 (Sapphire) R A A
AlGaAs R R R A
AlGaN R A
AlN R A
CdZnTe R A
GaAs R R R R A
GaN R R R A
GaSb A R A
HfO2 A
InGaAlAs R R A
InGaAsP R R A
InP R A A R R
ITO R A
Photoresist

& ARC

A R R R A A A A
SiC R A A
SiN R R R A A
SiO2 R R R R R A
SiOxNy A A A
Ta2O5 A A
TiN A
TiO2 A
W-TiW R A A
ZnO2 A
ZnS R A
ZnSe R A
ZrO2 A
Material RIE 2
(MRC)
RIE 3
(MRC)
RIE 5
(PlasmaTherm)
DSEIII
(PlasmaTherm)
SLR Fluorine ICP (PlasmaTherm) ICP Etch 1
(Panasonic E626I)
ICP Etch 2
(Panasonic E640)
ICP-Etch
(Unaxis VLR)
Ashers
(Technics PEII)
Plasma Clean
(Gasonics 2000)
Plasma Clean (YES EcoClean) UV Ozone Reactor Plasma Activation
(EVG 810)
XeF2 Etch
(Xetch)
Vapor HF Etch
(uETCH)
CAIBE
(Oxford)