Difference between revisions of "Dry Etching Recipes"

From UCSB Nanofab Wiki
Jump to: navigation, search
m (fix ICP1 GaAs link)
Line 2: Line 2:
 
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center; font-size: 95%" border="1"
 
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center; font-size: 95%" border="1"
 
|- bgcolor="#d0e7ff"
 
|- bgcolor="#d0e7ff"
! colspan="17" width="725" height="45" |<div style="font-size: 150%;">Dry Etching Recipes</div>
+
! colspan="18" width="725" height="45" |<div style="font-size: 150%;">Dry Etching Recipes</div>
 
|- bgcolor="#d0e7ff"
 
|- bgcolor="#d0e7ff"
 
|<!-- INTENTIONALLY LEFT BLANK -->
 
|<!-- INTENTIONALLY LEFT BLANK -->
 
! colspan="4" width="300" height="35" align="center" bgcolor="#d0e7ff" |'''[[RIE Etching Recipes|RIE Etching]]'''
 
! colspan="4" width="300" height="35" align="center" bgcolor="#d0e7ff" |'''[[RIE Etching Recipes|RIE Etching]]'''
 
! colspan="5" |'''[[ICP Etching Recipes|ICP Etching]]'''
 
! colspan="5" |'''[[ICP Etching Recipes|ICP Etching]]'''
! colspan="4" align="center" bgcolor="#d0e7ff" |'''[[Oxygen Plasma System Recipes|Oxygen Plasma Systems]]'''
+
! colspan="5" align="center" bgcolor="#d0e7ff" |'''[[Oxygen Plasma System Recipes|Oxygen Plasma Systems]]'''
 
! colspan="3" align="center" bgcolor="#d0e7ff" |'''[[Other Dry Etching Recipes|Other Dry Etchers]]'''
 
! colspan="3" align="center" bgcolor="#d0e7ff" |'''[[Other Dry Etching Recipes|Other Dry Etchers]]'''
 
|-
 
|-
Line 22: Line 22:
 
| width="85" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Ashers_.28Technics_PEII.29|Ashers<br>(Technics PEII)]]
 
| width="85" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Ashers_.28Technics_PEII.29|Ashers<br>(Technics PEII)]]
 
| width="95" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Clean_.28Gasonics_2000.29|Plasma Clean<br>(Gasonics 2000)]]
 
| width="95" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Clean_.28Gasonics_2000.29|Plasma Clean<br>(Gasonics 2000)]]
  +
| width="95" bgcolor="#daf1ff" |[[Plasma Clean (YES EcoClean)]]
 
| width="85" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]]
 
| width="85" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]]
 
| width="85" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Activation_.28EVG_810.29|Plasma Activation<br>(EVG 810)]]
 
| width="85" bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Activation_.28EVG_810.29|Plasma Activation<br>(EVG 810)]]
Line 29: Line 30:
 
|- bgcolor="#eeffff"
 
|- bgcolor="#eeffff"
 
! align="center" bgcolor="#d0e7ff" |Ag
 
! align="center" bgcolor="#d0e7ff" |Ag
  +
|
 
|
 
|
 
|
 
|
Line 55: Line 57:
 
|{{rl|ICP Etching Recipes|Al Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|Al Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|Al Etch (Panasonic 2)}}
 
|{{rl|ICP Etching Recipes|Al Etch (Panasonic 2)}}
  +
|
 
|
 
|
 
|
 
|
Line 65: Line 68:
 
|- bgcolor="#eeffff"
 
|- bgcolor="#eeffff"
 
! align="center" bgcolor="#d0e7ff" |Au
 
! align="center" bgcolor="#d0e7ff" |Au
  +
|
 
|
 
|
 
|
 
|
Line 91: Line 95:
 
|{{rl|ICP Etching Recipes|Cr Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|Cr Etch (Panasonic 1)}}
 
|A
 
|A
  +
|
 
|
 
|
 
|
 
|
Line 101: Line 106:
 
|- bgcolor="#eeffff"
 
|- bgcolor="#eeffff"
 
! align="center" bgcolor="#d0e7ff" |Cu
 
! align="center" bgcolor="#d0e7ff" |Cu
  +
|
 
|
 
|
 
|
 
|
Line 119: Line 125:
 
|-
 
|-
 
! align="center" bgcolor="#d0e7ff" |Ge
 
! align="center" bgcolor="#d0e7ff" |Ge
  +
|
 
|
 
|
 
|
 
|
Line 137: Line 144:
 
|- bgcolor="#eeffff"
 
|- bgcolor="#eeffff"
 
! align="center" bgcolor="#d0e7ff" |Mo
 
! align="center" bgcolor="#d0e7ff" |Mo
  +
|
 
|
 
|
 
|
 
|
Line 155: Line 163:
 
|-
 
|-
 
! align="center" bgcolor="#d0e7ff" |Ni
 
! align="center" bgcolor="#d0e7ff" |Ni
  +
|
 
|
 
|
 
|
 
|
Line 173: Line 182:
 
|-
 
|-
 
! align="center" bgcolor="#d0e7ff" |Pt
 
! align="center" bgcolor="#d0e7ff" |Pt
  +
|
 
|
 
|
 
|
 
|
Line 199: Line 209:
 
|A
 
|A
 
|{{Rl|ICP Etching Recipes|Ru (Ruthenium) Etch (Panasonic 2)}}
 
|{{Rl|ICP Etching Recipes|Ru (Ruthenium) Etch (Panasonic 2)}}
  +
|
 
|
 
|
 
|
 
|
Line 215: Line 226:
 
|{{rl|ICP Etching Recipes|DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)}}
 
|{{rl|ICP Etching Recipes|DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)}}
 
|{{Rl|ICP Etching Recipes|Si Etching}}
 
|{{Rl|ICP Etching Recipes|Si Etching}}
  +
|
 
|
 
|
 
|
 
|
Line 227: Line 239:
 
|-
 
|-
 
! align="center" bgcolor="#d0e7ff" |Ta
 
! align="center" bgcolor="#d0e7ff" |Ta
  +
|
 
|
 
|
 
|
 
|
Line 253: Line 266:
 
|{{rl|ICP Etching Recipes|Ti Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|Ti Etch (Panasonic 1)}}
 
|A
 
|A
  +
|
 
|
 
|
 
|
 
|
Line 271: Line 285:
 
|
 
|
 
|[https://www.nanotech.ucsb.edu/wiki/index.php/ICP_Etching_Recipes#Al2O3_Etching_.28Panasonic_2.29 R]
 
|[https://www.nanotech.ucsb.edu/wiki/index.php/ICP_Etching_Recipes#Al2O3_Etching_.28Panasonic_2.29 R]
  +
|
 
|
 
|
 
|
 
|
Line 289: Line 304:
 
|{{rl|ICP Etching Recipes|Sapphire Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|Sapphire Etch (Panasonic 1)}}
 
|A
 
|A
  +
|
 
|
 
|
 
|
 
|
Line 308: Line 324:
 
|
 
|
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|AlGaAs Etch (Unaxis VLR)}}
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|AlGaAs Etch (Unaxis VLR)}}
  +
|
 
|
 
|
 
|
 
|
Line 326: Line 343:
 
|
 
|
 
|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}}
 
|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}}
  +
|
 
|
 
|
 
|
 
|
Line 344: Line 362:
 
|
 
|
 
|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}}
 
|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}}
  +
|
 
|
 
|
 
|
 
|
Line 355: Line 374:
 
|
 
|
 
|{{rl|RIE Etching Recipes|CdZnTe Etch (RIE 2)}}
 
|{{rl|RIE Etching Recipes|CdZnTe Etch (RIE 2)}}
  +
|
 
|
 
|
 
|
 
|
Line 380: Line 400:
 
|{{rl|ICP Etching Recipes|GaAs Etch (Panasonic 2)}}
 
|{{rl|ICP Etching Recipes|GaAs Etch (Panasonic 2)}}
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|GaAs Etch (Unaxis VLR)}}
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|GaAs Etch (Unaxis VLR)}}
  +
|
 
|
 
|
 
|
 
|
Line 398: Line 419:
 
|
 
|
 
|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}}
 
|{{rl|ICP Etching Recipes|GaN Etch (Unaxis VLR)}}
  +
|
 
|
 
|
 
|
 
|
Line 416: Line 438:
 
|A
 
|A
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaSb Etch Unaxis VLR)}}
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaSb Etch Unaxis VLR)}}
  +
|
 
|
 
|
 
|
 
|
Line 425: Line 448:
 
|- bgcolor="#eeffff"
 
|- bgcolor="#eeffff"
 
! align="center" bgcolor="#d0e7ff" |HfO<sub>2</sub>
 
! align="center" bgcolor="#d0e7ff" |HfO<sub>2</sub>
  +
|
 
|
 
|
 
|
 
|
Line 452: Line 476:
 
|
 
|
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
  +
|
 
|
 
|
 
|
 
|
Line 470: Line 495:
 
|
 
|
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
  +
|
 
|
 
|
 
|
 
|
Line 488: Line 514:
 
|A
 
|A
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
 
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|InP-InGaAs-InAlAs Etch (Unaxis VLR)|InP Etch (Unaxis VLR)}}
  +
|
 
|
 
|
 
|
 
|
Line 499: Line 526:
 
|
 
|
 
|{{rl|RIE Etching Recipes|ITO Etch (RIE 2)}}
 
|{{rl|RIE Etching Recipes|ITO Etch (RIE 2)}}
  +
|
 
|
 
|
 
|
 
|
Line 527: Line 555:
 
|A
 
|A
 
|A
 
|A
  +
|
 
|
 
|
 
|
 
|
Line 542: Line 571:
 
|{{rl|ICP Etching Recipes|SiC Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|SiC Etch (Panasonic 1)}}
 
|A
 
|A
  +
|
 
|
 
|
 
|
 
|
Line 562: Line 592:
 
|
 
|
 
|A
 
|A
  +
|
 
|
 
|
 
|
 
|
Line 578: Line 609:
 
|{{rl|ICP Etching Recipes|SiO2 Etching (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|SiO2 Etching (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|SiO2 Etching (Panasonic 2)}}
 
|{{rl|ICP Etching Recipes|SiO2 Etching (Panasonic 2)}}
  +
|
 
|
 
|
 
|
 
|
Line 596: Line 628:
 
|A
 
|A
 
|A
 
|A
  +
|
 
|
 
|
 
|
 
|
Line 614: Line 647:
 
|
 
|
 
|[https://www.osapublishing.org/optica/abstract.cfm?uri=optica-4-5-532 A]
 
|[https://www.osapublishing.org/optica/abstract.cfm?uri=optica-4-5-532 A]
  +
|
 
|
 
|
 
|
 
|
Line 624: Line 658:
 
|-
 
|-
 
! align="center" bgcolor="#d0e7ff" |TiN
 
! align="center" bgcolor="#d0e7ff" |TiN
  +
|
 
|
 
|
 
|
 
|
Line 642: Line 677:
 
|- bgcolor="#eeffff"
 
|- bgcolor="#eeffff"
 
! align="center" bgcolor="#d0e7ff" |TiO<sub>2</sub>
 
! align="center" bgcolor="#d0e7ff" |TiO<sub>2</sub>
  +
|
 
|
 
|
 
|
 
|
Line 668: Line 704:
 
|{{rl|ICP Etching Recipes|W-TiW Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|W-TiW Etch (Panasonic 1)}}
 
|A
 
|A
  +
|
 
|
 
|
 
|
 
|
Line 678: Line 715:
 
|- bgcolor="#eeffff"
 
|- bgcolor="#eeffff"
 
! align="center" bgcolor="#d0e7ff" |ZnO<sub>2</sub>
 
! align="center" bgcolor="#d0e7ff" |ZnO<sub>2</sub>
  +
|
 
|
 
|
 
|
 
|
Line 698: Line 736:
 
|
 
|
 
|{{rl|RIE Etching Recipes|ZnS Etching (RIE 2)}}
 
|{{rl|RIE Etching Recipes|ZnS Etching (RIE 2)}}
  +
|
 
|
 
|
 
|
 
|
Line 716: Line 755:
 
|
 
|
 
|{{rl|RIE Etching Recipes|ZnS Etching (RIE 2)}}
 
|{{rl|RIE Etching Recipes|ZnS Etching (RIE 2)}}
  +
|
 
|
 
|
 
|
 
|
Line 732: Line 772:
 
|-
 
|-
 
! align="center" bgcolor="#d0e7ff" |ZrO<sub>2</sub>
 
! align="center" bgcolor="#d0e7ff" |ZrO<sub>2</sub>
  +
|
 
|
 
|
 
|
 
|
Line 761: Line 802:
 
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Ashers_.28Technics_PEII.29|Ashers<br>(Technics PEII)]]
 
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Ashers_.28Technics_PEII.29|Ashers<br>(Technics PEII)]]
 
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Clean_.28Gasonics_2000.29|Plasma Clean<br>(Gasonics 2000)]]
 
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Clean_.28Gasonics_2000.29|Plasma Clean<br>(Gasonics 2000)]]
  +
| bgcolor="#daf1ff" |[[Plasma Clean (YES EcoClean)]]
 
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]]
 
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]]
 
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Activation_.28EVG_810.29|Plasma Activation<br>(EVG 810)]]
 
| bgcolor="#daf1ff" |[[Oxygen_Plasma_System_Recipes#Plasma_Activation_.28EVG_810.29|Plasma Activation<br>(EVG 810)]]

Revision as of 21:11, 16 September 2019