Difference between revisions of "Dry Etching Recipes"

Revision as of 15:34, 16 December 2015

R = Recipe is available. Clicking this link will take you to the recipe.

Dry Etching Recipes
	RIE Etching				ICP Etching				Oxygen Plasma Systems				Other Dry Etchers
Material	RIE 1 (Retired)	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	Si Deep RIE (PTI/Bosch)	ICP Etch 1 (Panasonic 1)	ICP Etch 2 (Panasonic 2)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)	Plasma Clean (Gasonics 2000)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)
Al				A		R	R
Ti						R	A
Cr				A		R	A
Ge
Ag
Pt															R
Au															R
Ni															R
Cu
Ru
Mo
Ta
W-TiW						R	A
Al₂O₃
HfO₂
ITO		R
SiO₂						R	R							R
SiN						R	R
SiOxNy
Ta₂O₅
TiO₂
TiN
ZnO₂
ZrO₂
GaAs				R		R	R	R
AlGaAs				R		R		R
InGaAlAs		R						R
InGaAsP		R
InP		R						R
GaN				R		R		R
AlGaN
AlN
GaN
AlGaN
AlN
GaSb
CdZnTe		R
ZnSe
Si					R								R
SiC						R	A
Sapphire						R	A
Material	RIE 1 (Retired)	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	Si Deep RIE (PlasmaTherm/Bosch Etch)	ICP Etch 1 (Panasonic E626I)	ICP Etch 2 (Panasonic E640)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)	Plasma Clean (Gasonics 2000)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)

@@ Line 22: / Line 22: @@
 | width="95" bgcolor="#DAF1FF" | [[Oxygen_Plasma_System_Recipes#Plasma_Clean_.28Gasonics_2000.29|Plasma Clean<br>(Gasonics 2000)]]
 | width="85" bgcolor="#DAF1FF" | [[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]]
-| width="85" bgcolor="#DAF1FF" | [[Plasma Activation (EVG 810)|Plasma Activation<br>(EVG 810)]]
+| width="85" bgcolor="#DAF1FF" | [[Oxygen_Plasma_System_Recipes#Plasma_Activation_.28EVG_810.29|Plasma Activation<br>(EVG 810)]]
 | width="85" bgcolor="#DAF1FF" | [[XeF2 Etch (Xetch)|XeF2 Etch<br>(Xetch)]]
 | width="85" bgcolor="#DAF1FF" | [[Vapor HF Etch|Vapor HF Etch<br>(uETCH)]]
@@ Line 737: / Line 737: @@
 | bgcolor="#DAF1FF" | [[Oxygen_Plasma_System_Recipes#Plasma_Clean_.28Gasonics_2000.29|Plasma Clean<br>(Gasonics 2000)]]
 | bgcolor="#DAF1FF" | [[Oxygen_Plasma_System_Recipes#UV_Ozone_Reactor|UV Ozone Reactor]]
-| bgcolor="#DAF1FF" | [[Plasma Activation (EVG 810)|Plasma Activation<br>(EVG 810)]]
+| bgcolor="#DAF1FF" | [[Oxygen_Plasma_System_Recipes#Plasma_Activation_.28EVG_810.29|Plasma Activation<br>(EVG 810)]]
 | bgcolor="#DAF1FF" | [[XeF2 Etch (Xetch)|XeF2 Etch<br>(Xetch)]]
 | bgcolor="#DAF1FF" | [[Vapor HF Etch|Vapor HF Etch<br>(uETCH)]]